Abstract: A wearable device according to an embodiment includes a detection unit, a first layer, a second layer, and a third layer. The detection unit detects the living body information. The first layer is flexible and disposed in a first direction relative to the detection unit and includes a conductor electrically connected to the detection unit. The second layer is disposed in the first direction relative to the first layer and is harder than the first layer. The third layer is disposed in the first direction relative to the second layer and includes an electronic component electrically connected to the conductor.

Abstract: A vehicle capable of operating in a self-driving mode includes a self-driving indicator lamp and a controller. The self-driving indicator lamp can turn on so as to be visually recognized from an outside of the vehicle in the self-driving mode. The controller controls a lighting state of the self-driving indicator lamp. The self-driving indicator lamp includes a right indicator lamp and a left indicator lamp respectively disposed in right and left parts of the vehicle. Lighting states of the right indicator lamp and the left indicator lamp can be controlled independently. When the vehicle starts to move in the self-driving mode from a parked or stopped state, the lighting states of the right indicator lamp and the left indicator lamp which have turned off during when the vehicle has been parked or stopped, in a manner similar to each other so as to indicate a frontward or rearward starting direction.

Abstract: A composition for cleaning a semiconductor substrate contains: a novolak resin; an organic acid not being a polymeric compound; and a solvent. A solid content concentration of the composition is no greater than 20% by mass. The organic acid is preferably a carboxylic acid. The carboxylic acid is preferably a monocarboxylic acid, polycarboxylic acid or a combination thereof. The molecular weight of the organic acid is preferably from 50 to 500. The content of the organic acid with respect to 10 parts by mass of the novolak resin is preferably from 0.001 parts by mass to 10 parts by mass. The solvent includes preferably an ether solvent, an alcohol solvent, or a combination thereof. The proportion of the ether solvent, the alcohol solvent, or the combination thereof in the solvent is preferably no less than 50% by mass.

Abstract: A composition enables particles to be removed from a surface of a substrate by: applying the composition on the surface of the substrate to form a substrate treatment film on the surface; and bringing a liquid into contact with the substrate treatment film to remove the substrate treatment film from the surface. The composition includes a resin; and a solvent. The solvent includes a first solvent component having a normal boiling point of no less than 175° C. A content of the first solvent component with respect to 100 parts by mass of the resin is no less than 1 part by mass.

Abstract: A vehicle capable of operating in a self-driving mode includes a self-driving indicator lamp and a controller. The self-driving indicator lamp can turn on so as to be visually recognized from an outside of the vehicle in the self-driving mode. The controller controls a lighting state of the self-driving indicator lamp. The self-driving indicator lamp includes a right indicator lamp and a left indicator lamp respectively disposed in right and left parts of the vehicle. Lighting states of the right indicator lamp and the left indicator lamp can be controlled independently. When the vehicle starts to move in the self-driving mode from a parked or stopped state, the lighting states of the right indicator lamp and the left indicator lamp which have turned off during when the vehicle has been parked or stopped, in a manner similar to each other so as to indicate a frontward or rearward starting direction.

Abstract: A composition for cleaning a semiconductor substrate contains: a novolak resin; an organic acid not being a polymeric compound; and a solvent. A solid content concentration of the composition is no greater than 20% by mass. The organic acid is preferably a carboxylic acid. The carboxylic acid is preferably a monocarboxylic acid, polycarboxylic acid or a combination thereof. The molecular weight of the organic acid is preferably from 50 to 500. The content of the organic acid with respect to 10 parts by mass of the novolak resin is preferably from 0.001 parts by mass to 10 parts by mass. The solvent includes preferably an ether solvent, an alcohol solvent, or a combination thereof. The proportion of the ether solvent, the alcohol solvent, or the combination thereof in the solvent is preferably no less than 50% by mass.

Abstract: A substrate-treating method includes applying a treatment agent directly or indirectly on one face of a substrate to form a substrate pattern collapse-inhibitory film. The substrate includes a pattern on the one face. The substrate pattern collapse-inhibitory film is removed by dry etching after forming the substrate pattern collapse-inhibitory film. The treatment agent includes a compound including an aromatic ring, and a hetero atom-containing group that bonds to the aromatic ring; and a solvent.

Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.

Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.

Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.

Abstract: An apparatus comprises an endless conveyor formed in its conveying surface with slit-like dropping openings for permitting soft panels to pass therethrough, suction means disposed above a downstream portion of the conveying surface to attract and halt a traveling soft panel on the conveying surface, and a table positioned close to and below the conveying surface in opposed relation to the suction means. When the soft panel is held to the suction means by suction, continuous travel of the conveyor surface causes the rear end of the halted panel to enter the dropping opening, permitting the panel to project from the rear side of the conveying surface with the advance of the dropping opening and to be transferred onto the table in its standby position therebelow.