Patents by Inventor Shun Chen
Shun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11894238Abstract: A method includes forming a material layer over a substrate, forming a first hard mask (HM) layer over the material layer, forming a first trench, along a first direction, in the first HM layer. The method also includes forming first spacers along sidewalls of the first trench, forming a second trench in the first HM layer parallel to the first trench, by using the first spacers to guard the first trench. The method also includes etching the material layer through the first trench and the second trench, removing the first HM layer and the first spacers, forming a second HM layer over the material layer, forming a third trench in the second HM layer. The third trench extends along a second direction that is perpendicular to the first direction and overlaps with the first trench. The method also includes etching the material layer through the third trench.Type: GrantFiled: July 11, 2022Date of Patent: February 6, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yung-Sung Yen, Chung-Ju Lee, Chun-Kuang Chen, Chia-Tien Wu, Ta-Ching Yu, Kuei-Shun Chen, Ru-Gun Liu, Shau-Lin Shue, Tsai-Sheng Gau, Yung-Hsu Wu
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Patent number: 11890805Abstract: A three-dimensional printing apparatus includes a container and a projecting structure. The container is configured to contain a liquid photosensitive material. The projecting structure is configured to provide a variety of molding beams to irradiate the liquid photosensitive material. The photoinitiator is suitable for polymerizing with a monomer after receiving the first molding beam with the first wavelength to form a solidified layer with a first color, and the photoinitiator is suitable for polymerizing with the monomer after receiving the second molding beam with the second wavelength to form a solidified layer with a second color, wherein the first color is different from the second color. The projecting structure comprises a light combiner module, disposed on the transmission paths of a variety of light beams. The wavelengths of the first molding beam and the second molding beam are between 355 nm to 415 nm.Type: GrantFiled: March 13, 2020Date of Patent: February 6, 2024Assignee: YOUNG OPTICS INC.Inventors: Chao-Shun Chen, Keng-Han Chuang
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Publication number: 20240018313Abstract: A silica aerogel-containing polyester masterbatch includes a polyethylene terephthalate resin, a silica aerogel powder, and a dispersing agent. The silica aerogel powder is dispersed in the polyethylene terephthalate resin, and is present in an amount ranging from 5 wt % to 30 wt % based on 100 wt % of the silica aerogel-containing polyester masterbatch. The dispersing agent is dispersed in the polyethylene terephthalate resin, is selected from the group consisting of a paraffin oil, a silane compound, a wax including C28-C32 straight chain monoacids, and combinations thereof, and is present in an amount ranging from 0.1 wt % to 4.0 wt % based on 100 wt % of the silica aerogel-containing polyester masterbatch. A method for preparing the silica aerogel-containing polyester masterbatch, and a silica aerogel-containing polyester fiber made from the same are also disclosed.Type: ApplicationFiled: December 16, 2022Publication date: January 18, 2024Applicant: KCI MASTER INDUSTRIES CORP.Inventors: Yu-Shun Chen, Hsiao-Chi Tsai, Chun-Ping Cheng, Chien-Ming Lin, Hsu-Yeh Huang
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Patent number: 11875872Abstract: A computer device, a setting method for a memory module, and a mainboard are provided. The computer device includes a memory module, a processor, and the mainboard. A basic input output system (BIOS) of the mainboard stores an extreme memory profile (XMP). When the processor performs the BIOS so that the computer device displays a user interface (UI), the BIOS displays an overclocking option corresponding to the XMP in a selection list of the UI. When the BIOS receives a selection request corresponding to the overclocking option of the selection list, the BIOS reads multiple memory setting parameters corresponding to the XMP, and configures the memory module according to the memory setting parameters.Type: GrantFiled: March 22, 2022Date of Patent: January 16, 2024Assignee: GIGA-BYTE TECHNOLOGY CO., LTD.Inventors: Chia-Chih Chien, Sheng-Liang Kao, Chen-Shun Chen
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Patent number: 11867188Abstract: A fan includes a fan frame and a driving device. The fan frame includes a base, a frame shell and static blades arranged on the periphery of the base. The driving device includes a stator structure and a rotor structure. The stator structure includes a stator magnetic pole group and a bushing. The rotor structure includes a bearing, a shaft, a rotor shell, a magnetic structure and blades. The shaft is connected with the rotor shell and disposed through the bearing. The stator magnetic pole group magnetically drives the magnetic structure to rotate the rotor shell. The blades are arranged on the periphery of the rotor shell. Two ends of the frame shell are configured with two turning portions, respectively. The two turning portions are disposed between parts of the frame shell with different curvatures.Type: GrantFiled: June 28, 2018Date of Patent: January 9, 2024Assignee: DELTA ELECTRONICS, INC.Inventors: Shun-Chen Chang, Chao-Fu Yang
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Publication number: 20230414613Abstract: Provided are pharmaceutical compositions which include a mixture of a lipophilic active pharmaceutical ingredient such as nilotinib, a hydrophilic polymer, one or more surfactants, and optionally an adsorbent. Also described are methods for preparing and using such pharmaceutical compositions. In one aspect, disclosed herein is an amorphous solid dispersion comprising the active pharmaceutical ingredient.Type: ApplicationFiled: March 28, 2023Publication date: December 28, 2023Inventors: Zeren WANG, Shun CHEN, Jiqian PENG, Longwei Sun, Yanxin Zhao
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Patent number: 11852927Abstract: A display device includes: a gate line having an extension direction; a switch unit electrically connecting to the gate line; a pixel electrode electrically connecting to the switch unit; and a slit in the pixel electrode, wherein a virtual line parallel to the extension direction passes through an end point of the slit which is closest to the gate line, the pixel electrode is divided into a first portion and a second portion by the virtual line, and the first portion is closer to the gate line than the second portion, and wherein -the slit has a first width in the extension direction and a second width in the extension direction, the second width is closer to the first portion than the first width, and the first width is less than the second width.Type: GrantFiled: November 9, 2022Date of Patent: December 26, 2023Assignee: INNOLUX CORPORATIONInventors: Shun-Chen Yang, Ying-Tong Lin
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Publication number: 20230408299Abstract: A flexible capacitive touch sensing device comprising a first, a second sensing region and a capacitance detection circuit. Each of the first, second sensing region comprises: flexible material; and electrodes, in or on the flexible material. Capacitance sensed by the capacitance detection circuit is used for detecting if an object causes capacitance variation to the first sensing region and the second sensing region. The first sensing region comprises a first side region with a first side which is adjacent to a second side of the second sensing region Shapes of the electrodes are changeable after provided on the flexible material. The electrodes are overlapped in normal directions of the first side region and the second side region. An angle which is not 0 degree exists between the electrodes which are overlapped. Such flexible capacitive touch sensing device can be applied to generate a HOD device with different sizes.Type: ApplicationFiled: June 21, 2022Publication date: December 21, 2023Applicant: PixArt Imaging Inc.Inventor: Ching-Shun Chen
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Patent number: 11848476Abstract: A power divider includes an input capacitor, and first and second transmission lines (TLs). The first TL includes an input portion (IP), a transmission portion (TP) and an output portion (OP). The second TL includes a TP and an OP. The IP is for receiving an input signal, and is connected to the TPs of the first and second TLs. For each of the first and second TLs, the TP has a length that is one-twelfth of a target wavelength, and is connected to the OP. The OPs of the first and second TLs are for cooperatively outputting a pair of output signals which are in-phase and each of which has a frequency equal to that of the input signal. The input capacitor is connected between ground and the IP.Type: GrantFiled: September 22, 2021Date of Patent: December 19, 2023Assignee: National Chi Nan UniversityInventors: Yo-Sheng Lin, Kai-Siang Lan, Bo-Shun Chen
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Publication number: 20230378628Abstract: A power divider includes first to third transmission lines (TLs) and first to third capacitors. The second TL includes a first transmission portion (TP) and a first output portion (OP). The first TP is connected between the first TL and the first OP. The third TL includes a second TP and a second OP. The second TP is connected between the first TL and the second OP. The first capacitor is connected between ground and a common node of the first TL and the first and second TPs. The second capacitor is connected between ground and a terminal of the first OP distal from the first TP. The third capacitor is connected between ground and a terminal of the second OP distal from the second TP.Type: ApplicationFiled: September 16, 2022Publication date: November 23, 2023Applicant: National Chi Nan UniversityInventors: Yo-Sheng LIN, Bo-Shun CHEN, Yu-Cian PENG
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Publication number: 20230369047Abstract: The present disclosure provides a method for semiconductor manufacturing in accordance with some embodiments. The method includes forming a hard mask layer over a substrate, the substrate having one or more regions to receive a treatment process, forming a resist layer over the hard mask layer, patterning the resist layer to form a plurality of openings in the resist layer, each of the openings free of concave corners, performing an opening expanding process to enlarge at least one of the openings in the resist layer, transferring the openings in the resist layer to the hard mask layer, and performing the treatment process to the one or more regions in the substrate through the openings in the hard mask layer.Type: ApplicationFiled: July 30, 2023Publication date: November 16, 2023Inventors: Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Wei-Hao Wu, Li-Te Lin, Ru-Gun Liu, Kuei-Shun Chen
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Publication number: 20230338371Abstract: Proteolysis Targeting Chimeras (PROTACs) are heterobifunctional degraders that specifically eliminate targeted proteins by hijacking the ubiquitin-proteasome system (UPS). Provided are pharmaceutical compositions which include a mixture of a PROTAC, a hydrophilic polymer, a surfactant, and optionally an acid and an adsorbent. Also described are methods for preparing and using such pharmaceutical compositions. In one aspect, disclosed herein is an amorphous solid dispersion comprising PROTAC.Type: ApplicationFiled: June 28, 2023Publication date: October 26, 2023Inventors: Zeren WANG, Shun CHEN
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Publication number: 20230340370Abstract: Disclosed herein is a composition for removing post-etch residues in the presence of a layer comprising silicon and a dielectric layer including a silicon oxide, the composition including: (a) 0.005 to 0.3 % by weight HF; (b) 0.01 to 1 % by weight of an ammonium fluoride of formula NRE4F, where RE is H or a C1 to C4 alkyl group; (c) 5 to 30 % by weight of an organic solvent selected from the group consisting of a sulfoxide and a sulfone; (d) 70 % by weight or more water, and (e) optionally 0.01 to 1 % by weight of an ammonium compound selected from the group consisting of ammonia and a C4 to C20 quaternized aliphatic ammonium.Type: ApplicationFiled: August 16, 2021Publication date: October 26, 2023Inventors: Andreas KLIPP, Chia Wei CHANG, Meng Ju YU, Jhih Jheng KE, Cheng Shun CHEN
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Patent number: 11791161Abstract: The present disclosure provides a method for semiconductor manufacturing in accordance with some embodiments. The method includes providing a substrate and a patterning layer over the substrate and forming a plurality of openings in the patterning layer. The substrate includes a plurality of features to receive a treatment process. The openings partially overlap with the features from a top view while a portion of the features remains covered by the patterning layer. Each of the openings is free of concave corners. The method further includes performing an opening expanding process to enlarge each of the openings and performing a treatment process to the features through the openings. After the opening expanding process, the openings fully overlap with the features from the top view.Type: GrantFiled: December 7, 2020Date of Patent: October 17, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yu-Tien Shen, Ya-Wen Yeh, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Wei-Hao Wu, Li-Te Lin, Ru-Gun Liu, Kuei-Shun Chen
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Patent number: 11766830Abstract: A three-dimensional printer includes a projector, a tank, and a platform. The projector includes a light source, a digital micromirror device, and a controller. The digital micromirror device includes a micromirror, and the micromirror may be switched between an on state and an off state according to a control signal. The controller is electrically connected to the digital micromirror device and the light source. The controller further includes a judgement unit. The judgement unit may output the control signal to switch the micromirror to the off state when the light source is in the off state. The platform is adjacent to the tank. In addition, a manufacturing method for a three-dimensional printer is provided.Type: GrantFiled: March 3, 2021Date of Patent: September 26, 2023Assignee: Young Optics Inc.Inventors: Chao-Shun Chen, Jia-Bin Huang, Kai-Yun Cheng
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Patent number: 11747609Abstract: An optical path adjusting mechanism including a rotating base, an optical element, a coil, a first spring and a second spring is provided. The rotating base includes a first corner and a second corner opposite to the first corner. A first area and a second area are disposed along a line passing through the first corner and the second corner on the rotating base. The optical element is disposed on the rotating base. The coil is disposed around a periphery of the rotating base. One terminal of the first spring is connected to the first area of the rotating base. One terminal of the second spring is connected to the second area of the rotating base.Type: GrantFiled: March 22, 2022Date of Patent: September 5, 2023Assignee: YOUNG OPTICS INC.Inventors: Wei-Szu Lin, Chao-Shun Chen, Chia-Chen Liao, Yu-Chen Chang, Chien-Hsing Tsai
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Patent number: 11746798Abstract: A centrifugal fan is disclosed and includes a lower case, an impeller and an upper case. The lower case includes a bottom plate and a sidewall. The impeller is disposed on the bottom plate. The upper case is assembled with the sidewall to form an outlet. The upper case is formed by stamping and includes a first plane, an inlet and a grille. When the impeller is rotated, an airflow flowing from the inlet to the outlet is formed. The grille is protruded outwardly from the first plane, and includes a connecting frame and plural ribs. A spacing height is formed between the connecting frame and the inlet. Each rib has a first end connected to the connecting frame and a second end connected to the first plane. A pair of notches are disposed adjacent to two opposite lateral edges of the second end of the corresponding rib, respectively.Type: GrantFiled: November 23, 2021Date of Patent: September 5, 2023Assignee: DELTA ELECTRONICS, INC.Inventors: Kuo-Tung Hsu, Shun-Chen Chang, Wen-Chun Hsu, Chao-Fu Yang, Shuo-Sheng Hsu
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Patent number: 11748540Abstract: A method includes forming a first mandrel pattern and a second mandrel pattern. The first mandrel pattern includes at least first and second mandrels for a mandrel-spacer double patterning process. The second mandrel pattern includes at least a third mandrel inserted between the first and second mandrels. The first mandrel pattern and the second mandrel pattern include a same material. The first and second mandrels are merged together with the third mandrel to form a single pattern.Type: GrantFiled: April 13, 2021Date of Patent: September 5, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chung-Ming Wang, Chih-Hsiung Peng, Chi-Kang Chang, Kuei-Shun Chen, Shih-Chi Fu
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Patent number: D995114Type: GrantFiled: October 22, 2020Date of Patent: August 15, 2023Assignee: MING SHIN TOOLS CO., LTD.Inventor: Yung-Shun Chen
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Patent number: D996057Type: GrantFiled: June 11, 2021Date of Patent: August 22, 2023Assignee: MING SHIN TOOLS CO., LTD.Inventor: Yung-Shun Chen