Abstract: A serial communication bus system with a dynamic address table and its control method allows the master device to detect the removal of slave devices from the serial communication bus using allocated addresses and a common initial address through interactive polling. Additionally, when new slave devices connect to the bus, they can be directly detected, and non-conflicting new addresses can be assigned, eliminating the need to reassign addresses for all connected slave devices, as required in the conventional approach.

Abstract: Methods and systems for dry cleaning a semiconductor processing reaction chamber are disclosed herein. In some embodiments, a method for cleaning a semiconductor processing reaction chamber includes: performing a plasma-assisted cleaning process to clean tube deposits formed on an inner surface of the deposition reaction chamber, the plasma-assisted cleaning process comprises: providing a first reactant gas to a remote plasma source chamber to generate a plasma, wherein the plasma comprising a fluorine-containing radical; and providing the plasma from the remote plasma source chamber to the deposition reaction chamber to clean the tube deposits, and performing a chemical cleaning process by providing a second reactant gas to the deposition reaction chamber after performing the plasma dry cleaning process.

Abstract: Methods and systems for dry cleaning a semiconductor processing reaction chamber are disclosed herein. In some embodiments, a method for cleaning a semiconductor processing reaction chamber includes: performing a plasma-assisted cleaning process to clean tube deposits formed on an inner surface of the deposition reaction chamber, the plasma-assisted cleaning process comprises: providing a first reactant gas to a remote plasma source chamber to generate a plasma, wherein the plasma comprising a fluorine-containing radical; and providing the plasma from the remote plasma source chamber to the deposition reaction chamber to clean the tube deposits, and performing a chemical cleaning process by providing a second reactant gas to the deposition reaction chamber after performing the plasma dry cleaning process.

Abstract: A wafer boat includes a base, a plurality of support rods and a plurality of cantilever arms. The support rods are carried by the base. The support rods are disposed around a space above the base. The cantilever arms are carried by the support rods. At least two of the cantilever arms carried by at least one of the support rods are vertically spaced apart to define at least one slot for a wafer.