Abstract: A lamp structure of an umbrella contains a body, an illumination device, and a control pusher. The body includes a shaft, a notch, a runner slidably, and multiple stretchers. The illumination device includes at least one lighting element, a circuit board, and a battery. The circuit board has a control switch, when the runner is moved upward to push the illumination device, the umbrella is opened. The control pusher is connected to the runner and includes a controlling element. The control pusher is slid vertically with respect to the shaft and is switched in three-section positions, such that the control pusher is slid to a first position, a second position, and a third position relative to the shaft to drive the control switch to be conducted or not so that the circuit board controls the at least one lighting element to power on or off.

Abstract: An illuminating umbrella includes an umbrella body and an illuminating device. An illuminating body of the illuminating device is fitted to a shaft of the umbrella body. A lower hub of the umbrella body movably presses a main switch of the illuminating device for controlling the illuminating body to illuminate or not to illuminate. The illuminating umbrella provides an illuminating function for the user to view the surrounding environment and articles in an environment with insufficient light. The illuminating body is automatically turned on when the umbrella is unfolded, and the illuminating body is automatically turned off when the umbrella is folded. It is convenient to use.

Abstract: A method for performing a lithographic process over a semiconductor wafer is provided. The method includes coating a photoresist layer over a material layer which is formed on the semiconductor wafer in a track apparatus. The method further includes transferring the semiconductor wafer from the track apparatus to an exposure apparatus. The method also includes measuring a height of the photoresist layer before the removal of the semiconductor wafer from the track apparatus. In addition, the method includes measuring height of the material layer in the exposure apparatus. The method also includes determining a focal length for exposing the semiconductor wafer according to the height of the photoresist layer and the height of the material layer.