Patents by Inventor SHUN KIKUCHI
SHUN KIKUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240116958Abstract: A compound for forming a metal-containing film to be contained in a composition for forming a metal-containing film used in manufacturing a semiconductor, where the compound for forming a metal-containing film is represented by the following general formula (M-1) or (M-2). This provides: a compound for forming a metal-containing film having better dry etching resistance than conventional resist underlayer film materials and also having high filling and planarizing properties; a composition for forming a metal-containing film containing the compound; a patterning process in which the composition is used as a resist underlayer film material; a patterning process in which the composition is used as a resist material; and a semiconductor photoresist material containing the composition.Type: ApplicationFiled: September 6, 2023Publication date: April 11, 2024Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Naoki KOBAYASHI, Shohei IWAMORI, Daisuke KORI, Shun KIKUCHI, Ryunosuke HANDA, Seiichiro TACHIBANA
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Publication number: 20240103425Abstract: A collecting device includes a collecting path for a developer, at least one transport member that is disposed in the collecting path and that transports the developer by rotating, a driving unit that drives, by receiving electric power, the transport member in such a manner that the transport member rotates, a detecting unit that detects a load applied to the driving unit due to transportation of the developer, and a control unit that controls the driving unit based on the load detected by the detecting unit.Type: ApplicationFiled: March 7, 2023Publication date: March 28, 2024Applicant: FUJIFILM Business Innovation Corp.Inventors: Shinya MAKIURA, Yuji Kikuchi, Yu Tsuda, Yusuke Kitagawa, Shun Ida, Takaki Saiki
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Patent number: 11940728Abstract: A molecular resist composition and a pattern forming process. A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography. The molecular resist composition does not contain a base polymer. The molecular resist composition comprising a sulfonium salt having a cation of specific partial structure has a high sensitivity and forms a resist film with improved resolution and LWR, so that the resist composition is quite useful for precise micropatterning.Type: GrantFiled: September 24, 2021Date of Patent: March 26, 2024Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masaki Ohashi, Kazuhiro Katayama, Masahiro Fukushima, Shun Kikuchi
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Publication number: 20230367211Abstract: A resist composition comprising a hypervalent iodine compound having at least two acyloxy groups, a carboxylic acid, and a solvent is provided. When processed by lithography using high-energy radiation, the resist composition exhibits a high sensitivity and resolution.Type: ApplicationFiled: May 4, 2023Publication date: November 16, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Ohashi, Shun Kikuchi, Seiichiro Tachibana
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Publication number: 20230161255Abstract: A positive resist composition is provided comprising a base polymer end-capped with an ammonium salt of an iodized acid, linked to a sulfide group. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.Type: ApplicationFiled: November 16, 2022Publication date: May 25, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Shun Kikuchi, Kousuke Ohyama
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Publication number: 20230161252Abstract: A positive resist composition is provided comprising a base polymer end-capped with a salt consisting of an ammonium cation linked to a sulfide group and a fluorinated anion. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.Type: ApplicationFiled: November 16, 2022Publication date: May 25, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Shun Kikuchi, Kousuke Ohyama
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Publication number: 20230152696Abstract: A positive resist composition is provided comprising a base polymer end-capped with a sulfonium salt containing a carboxylate anion having a sulfide group linked thereto. Because of controlled acid diffusion, a resist film of the composition forms a pattern of good profile with a high resolution and reduced edge roughness or dimensional variation.Type: ApplicationFiled: November 14, 2022Publication date: May 18, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Kousuke Ohyama, Shun Kikuchi
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Publication number: 20230132653Abstract: A molecular resist composition comprising a sulfonium salt having formula (1) or (2) and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography.Type: ApplicationFiled: November 1, 2022Publication date: May 4, 2023Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masahiro Fukushima, Shun Kikuchi, Masaki Ohashi, Kazuhiro Katayama
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Patent number: 11567392Abstract: Provided is an imaging apparatus including a mode setting unit that sets a diaphragm driving mode out of a plurality of diaphragm driving modes including a first diaphragm driving mode and a second diaphragm driving mode in which diaphragm driving is more limited than in the first diaphragm driving mode, and a diaphragm control unit that controls diaphragm driving in accordance with brightness of an imaging target in a case where the mode setting unit sets the second diaphragm driving mode.Type: GrantFiled: August 23, 2019Date of Patent: January 31, 2023Assignee: SONY CORPORATIONInventors: Nobuhiro Doi, Jun Aoyama, Kazunari Konishi, Shun Kikuchi
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Patent number: 11451702Abstract: The present technique relates to a lens apparatus, a driving method, an image capturing apparatus, and an image capturing system that allow reduction of possible noise in a captured image caused by a magnetic field generated when an actuator of the lens apparatus is driven, without any change in image capturing processing of the image capturing apparatus. A lens apparatus is enabled to be mounted on an image capturing apparatus and includes an actuator, a communication section configured to receive, from the image capturing apparatus, drive frequency information used to set a drive frequency for the actuator, a control section configured to set the drive frequency for the actuator on the basis of the drive frequency information, and a driving section configured to drive the actuator at the drive frequency set. The present technique can be applied to, for example, a lens apparatus mounted on a single-lens reflex camera.Type: GrantFiled: May 16, 2019Date of Patent: September 20, 2022Assignee: SONY CORPORATIONInventors: Keiji Kunitomo, Jun Aoyama, Shohei Kosugi, Shun Kikuchi
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Publication number: 20220107559Abstract: A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.Type: ApplicationFiled: September 24, 2021Publication date: April 7, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Takeshi Nagata, Chuanwen Lin, Shun Kikuchi
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Publication number: 20220100089Abstract: A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography.Type: ApplicationFiled: September 24, 2021Publication date: March 31, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Ohashi, Kazuhiro Katayama, Masahiro Fukushima, Shun Kikuchi
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Publication number: 20210215995Abstract: There is provided an imaging apparatus (60) including: a mode setting unit (72) configured to set a diaphragm driving mode out of a plurality of diaphragm driving modes including a first diaphragm driving mode and a second diaphragm driving mode in which diaphragm driving is more limited than in the first diaphragm driving mode; and a diaphragm control unit (72) configured to control diaphragm driving in accordance with brightness of an imaging target in a case where the mode setting unit sets the second diaphragm driving mode.Type: ApplicationFiled: August 23, 2019Publication date: July 15, 2021Inventors: NOBUHIRO DOI, JUN AOYAMA, KAZUNARI KONISHI, SHUN KIKUCHI
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Publication number: 20210211570Abstract: The present technique relates to a lens apparatus, a driving method, an image capturing apparatus, and an image capturing system that allow reduction of possible noise in a captured image caused by a magnetic field generated when an actuator of the lens apparatus is driven, without any change in image capturing processing of the image capturing apparatus. A lens apparatus is enabled to be mounted on an image capturing apparatus and includes an actuator, a communication section configured to receive, from the image capturing apparatus, drive frequency information used to set a drive frequency for the actuator, a control section configured to set the drive frequency for the actuator on the basis of the drive frequency information, and a driving section configured to drive the actuator at the drive frequency set. The present technique can be applied to, for example, a lens apparatus mounted on a single-lens reflex camera.Type: ApplicationFiled: May 16, 2019Publication date: July 8, 2021Inventors: KEIJI KUNITOMO, JUN AOYAMA, SHOHEI KOSUGI, SHUN KIKUCHI