Patents by Inventor Shunichi Iwamaru

Shunichi Iwamaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9130183
    Abstract: This invention provides an organic electroluminescent element comprising a substrate and an electrode and one or more organic layers provided on the substrate. The organic electroluminescent element is characterized in that the layer density of at least one of the organic layers is 1.10 to 1.25 g/cm3. The organic electroluminescent element exhibits good luminescence brightness, causes no significant voltage rise and dark spot in the constant-current driving, and has good temporal stability under high temperature and high humidity conditions. There are also provided a display device and a lighting device using the organic EL element.
    Type: Grant
    Filed: January 24, 2006
    Date of Patent: September 8, 2015
    Assignee: KONICA MINOLTA, INC.
    Inventors: Shuichi Sugita, Shunichi Iwamaru, Hiroshi Kita
  • Publication number: 20090033213
    Abstract: This invention provides an organic electroluminescent element comprising a substrate and an electrode and one or more organic layers provided on the substrate. The organic electroluminescent element is characterized in that the layer density of at least one of the organic layers is 1.10 to 1.25 g/cm3. The organic electroluminescent element exhibits good luminescence brightness, causes no significant voltage rise and dark spot in the constant-current driving, and has good temporal stability under high temperature and high humidity conditions. There are also provided a display device and a lighting device using the organic EL element.
    Type: Application
    Filed: January 24, 2006
    Publication date: February 5, 2009
    Applicant: KONICA MINOLTA HOLDINGS, INC.
    Inventors: Shuichi Sugita, Shunichi Iwamaru, Hiroshi Kita
  • Patent number: 7462379
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: December 9, 2008
    Assignee: Konica Corporation
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Publication number: 20080268172
    Abstract: A layer forming method is disclosed which relies on reactive gas in a plasma state. The method includes steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Application
    Filed: May 30, 2008
    Publication date: October 30, 2008
    Applicant: KONICA CORPORATION
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Patent number: 7421974
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: September 9, 2008
    Assignee: Konica Corporation
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Patent number: 7281491
    Abstract: A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic strength of the first metal atom and an ionic strength of the second metal atom according to a dynamic SIMS measurement, the ionic strength of the second metal atom is larger than the ionic strength of the first metal atom from the most surface of the dielectric toward a predetermined depth of the dielectric, and the ionic strength of the first metal atom is larger than the ionic strength of the second metal atom from the predetermined depth toward the surface of the conductive base material.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: October 16, 2007
    Assignee: Konica Corporation
    Inventor: Shunichi Iwamaru
  • Patent number: 7044078
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Grant
    Filed: November 22, 2002
    Date of Patent: May 16, 2006
    Assignee: Konica Corporation
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Publication number: 20050181606
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Application
    Filed: March 25, 2005
    Publication date: August 18, 2005
    Applicant: KONICA CORPORATION
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Publication number: 20050172899
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Application
    Filed: March 4, 2005
    Publication date: August 11, 2005
    Applicant: KONICA CORPORATION
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Patent number: 6835425
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: December 28, 2004
    Assignee: Konica Corporation
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Publication number: 20030228416
    Abstract: A dielectric-coated electrode having a conductive base material coated with a dielectric on a surface thereof, the dielectric including a first metal atom and a second metal atom. As for an ionic strength of the first metal atom and an ionic strength of the second metal atom according to a dynamic SIMS measurement, the ionic strength of the second metal atom is larger than the ionic strength of the first metal atom from the most surface of the dielectric toward a predetermined depth of the dielectric, and the ionic strength of the first metal atom is larger than the ionic strength of the second metal atom from the predetermined depth toward the surface of the conductive base material.
    Type: Application
    Filed: June 5, 2003
    Publication date: December 11, 2003
    Inventor: Shunichi Iwamaru
  • Publication number: 20030170472
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Application
    Filed: November 22, 2002
    Publication date: September 11, 2003
    Applicant: KONICA CORPORATION
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Publication number: 20030082412
    Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
    Type: Application
    Filed: July 22, 2002
    Publication date: May 1, 2003
    Inventors: Kazuhiro Fukuda, Yoshikazu Kondo, Takashi Murakami, Shunichi Iwamaru, Yumi Muramatsu, Toshio Tsuji
  • Patent number: 5744216
    Abstract: A magnetic recording medium is disclosed, comprising a support having thereon a non-magnetic layer overcoated with a magnetic layer, in which the non-magnetic layer contains a metal oxide or metal hydroxide containing Co. The magnetic layer is overcoated by wet on wet coating.
    Type: Grant
    Filed: February 15, 1996
    Date of Patent: April 28, 1998
    Assignee: Konica Corporation
    Inventors: Narito Goto, Yasunobu Kobayashi, Hideaki Wakamatsu, Shunichi Iwamaru