Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2—Q—CR3?CHR4 ??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract: To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1?CR2-Q-CR3?CHR4 ??(1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

Abstract: To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C): CF2═CR1—Q—CR2═CH2  (1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.

Abstract: A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.

Abstract: The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having —CF2—OR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Abstract: To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc.

Abstract: A resist composition comprising the following fluoropolymer (A), an acid-generating compound (B) which generates an acid under irradiation with light and an organic solvent (C):

Abstract: The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented.

Abstract: The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc.

Abstract: A method for treating an outdoor article, wherein a surface treating agent comprising a medium (B) containing a tetraalkoxysilane or a silane compound having a silanol group obtained by hydrolyzing an oligomer of such a tetraalkoxy silane (A), wherein the content of (A) is from 0.01 to 100 parts by weight per 100 parts by weight of (B), is used, and a thin film is formed by treating a hydrophobic synthetic resin coating film surface of the outdoor article with such a surface treating agent. It is thereby possible to prevent formation of a streak soils which are likely to form at a portion where rain water collects and runs down, such as below a window frame of a building.

Abstract: A resin composition for coating comprising a functional group-containing fluoropolymer (a), a curing agent (b) capable of crosslinking the functional group-containing fluoropolymer (a), and an oligomer (c) of a tetrafunctional hydrolyzable silane compound.It is thereby possible to prevent formation of streak soils which form at a portion where rain water collects and runs down, such as below a window frame of a building.

Abstract: A fluorine-containing coating composition comprising from 30 to 90 wt % of a fluorine-containing copolymer containing units derived from a fluoroolefin and units derived from a vinyl ether and having a hydroxyl value of from 30 to 150 (mgKOH/g) and an epoxy equivalent of from 300 to 2,000 (g/eq) and from 10 to 70 wt % of a curing agent having carboxylic acid groups or a derivative thereof.

Abstract: This invention relates to a fluorine-containing copolymer which contains a fluoroolefin unit, a vinyl ester or vinyl ether unit, and a hydroxyl group-containing vinyl ether unit in amounts of from 40 to 60 mol%, from 25 to 55 mol% and from 5 to 25 mol%, respectively, and has an intrinsic viscosity of from 0.01 to 0.05 d.lambda./g as measured in an uncured state at 30.degree. C. in tetrahydrofuran, and the ratio of a weight-average molecular weight and a number-average molecular weight measured by a gel permeation chromatography being not more than 2.0, and a process for its production. The fluorine-containing copolymer of the present invention is excellent in weatherability, retains good coatability even if used as a high solid coating, and provide a coating film excellent in clarity.

Abstract: A fluorine-containing elastomer having excellent low temperature resistance and oil resistance comprises ethylene units (E) and fluorovinyl ether units (FV) having the formula CF.sub.2 .dbd.CFOX (X represents a C.sub.1 -C.sub.9 perfluoroalkyl group which can have one or more ether bond) at a molar ratio of (E) to (FV) of 95:5 to 30:70 and at a total content of (E) and (FV) of at least 70 mole %.

Abstract: A copolymer for an fluorine-containing elastomer having excellent low temperature resistance and alcohol resistance comprises vinylidene fluoride units and fluorovinyl ether units having the formula CF.sub.2 =CFOX (X represents a C.sub.3 -C.sub.9 perfluoroalkyl group which has ether bond having 1-3 oxygen atom) at a molar ratio of vinylidene fluoride units to fluorovinyl ether units of 95:5 to 50:50 and at a total content of the units of at least 80 mole %.

Abstract: A copolymer for a fluorine-containing elastomer having excellent low temperature resistance and alcohol resistance comprises vinylidene fluoride units and fluorovinyl ether units having the formula CF.sub.2 =CFOX (X represents a C.sub.3 -C.sub.9 perfluoroalkyl group which has ether bond having 1-3 oxygen atom) at a molar ratio of vinylidene fluoride units to fluorovinyl ether units of 95:5 to 50:50 and at a total content of the units of at least 80 mole %.

Abstract: An anticorrosive coating composition comprising (i) an aqueous medium, and dispersed therein, (ii) a water-soluble, film-forming and crosslinkable resin having a hydroxyl group and a proton-free onium salt radical and (iii) a chelate compound of titanium or zirconium.