Patents by Inventor Shunichi TATEMATSU

Shunichi TATEMATSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230333177
    Abstract: A magneto-impedance sensor element includes a magneto-sensitive body having electromagnetic properties that vary by a magnetic field externally acting thereon; and a detection coil wound around the magneto-sensitive body, in which a voltage corresponding to the intensity of the magnetic field acting on the magneto-sensitive body is output from the detection coil by applying a pulse current or a high-frequency current to the magneto-sensitive body. The magneto-sensitive body includes a first magneto-sensitive section and a second magneto-sensitive section that are configured to carry a pulse current or a high-frequency current in opposite directions to each other.
    Type: Application
    Filed: September 10, 2021
    Publication date: October 19, 2023
    Applicant: AICHI STEEL CORPORATION
    Inventors: Michiharu YAMAMOTO, Ryusuke YAMASHITA, Shiori ITABUCHI, Shunichi TATEMATSU
  • Publication number: 20230019018
    Abstract: A magneto-sensitive wire for a magnetic sensor with both measurement range expansion and environment resistance performance improvement, includes a Co-based alloy containing more Fe than a reference composition that is amorphous overall and exhibits zero magnetostriction. The Co-based alloy may have an Fe ratio (Fe/(Co+Fe+Ni)) of 6.1% to 9.5%. The Fe ratio is an atomic fraction of the Fe amount with respect to the total amount of a magnetic element group consisting of Co, Fe, and Ni. By heating an amorphous wire of a Co-based alloy at a temperate at least equal to a crystallization start temperature and lower than a crystallization end temperature, allows the magneto-sensitive wire to have a composite structure in which crystal grains are dispersed in the amorphous phase. The magneto-sensitive wire's anisotropy field is, for example, 5 to 70 Oe and the stress sensitivity, indicative of magnetostriction, is ?30 to 30 mOe/MPa.
    Type: Application
    Filed: February 24, 2021
    Publication date: January 19, 2023
    Applicant: AICHI STEEL CORPORATION
    Inventors: Akihiro SHIMODE, Shunichi TATEMATSU
  • Publication number: 20210190886
    Abstract: An object is to provide a magneto-sensitive wire that exhibits a stable anisotropic magnetic field even under a high-temperature environment and can achieve expansion of the measurement range of an MI sensor, etc. The present invention provides a magneto-sensitive wire for magnetic sensors that comprises a Co-based alloy having a composite structure in which crystal grains are dispersed in an amorphous phase. The Co-based alloy contains 0.05 to 0.80 at %, preferably 0.10 to 0.60 at %, of Cu with respect to 100 at % of the Co-based alloy as a whole. The Co-based alloy may further contain 65 to 90 at % of the group of magnetic elements consisting of Co, Fe, and Ni as the total, 15 to 27 at % of Si and/or B as the total, and 0.5 to 2.5 at % of Mo. Such a magneto-sensitive wire is excellent in the heat resistance and exhibits a stable anisotropic magnetic field even under a high-temperature environment.
    Type: Application
    Filed: October 2, 2019
    Publication date: June 24, 2021
    Applicant: AICHI STEEL CORPORATION
    Inventors: Shunichi TATEMATSU, Akihiro SHIMODE
  • Patent number: 9376748
    Abstract: A method for etching an organic film 1 having a surface selectively protected by a hard mask layer 2, includes a partial etching process of etching the organic film 1 partly in a thickness direction of the organic film 1 by using a mixed gas containing a gas that anisotropically etches a silicon oxide film and a gas that isotropically etches the organic film without etching the silicon oxide film; and a deposition process of depositing a protective film 3 made of the silicon oxide film on side surfaces 12 and a bottom surface 11 of a recess 10 formed in the organic film in the partial etching process. The partial etching process and the deposition process is alternately performed multiple times.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 28, 2016
    Assignee: AICHI STEEL CORPORATION
    Inventors: Michiharu Yamamoto, Shunichi Tatematsu, Ryusuke Yamashita, Norihiko Hamada, Koei Gemba
  • Publication number: 20150232984
    Abstract: A method for etching an organic film 1 having a surface selectively protected by a hard mask layer 2, includes a partial etching process of etching the organic film 1 partly in a thickness direction of the organic film 1 by using a mixed gas containing a gas that anisotropically etches a silicon oxide film and a gas that isotropically etches the organic film without etching the silicon oxide film; and a deposition process of depositing a protective film 3 made of the silicon oxide film on side surfaces 12 and a bottom surface 11 of a recess 10 formed in the organic film in the partial etching process. The partial etching process and the deposition process is alternately performed multiple times.
    Type: Application
    Filed: February 18, 2015
    Publication date: August 20, 2015
    Applicant: AICHI STEEL CORPORATION
    Inventors: Michiharu YAMAMOTO, Shunichi TATEMATSU, Ryusuke YAMASHITA, Norihiko HAMADA, Koei GEMBA