Patents by Inventor Shunji Katai

Shunji Katai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition and method for manufacturing semiconductor device using the resist composition
    Patent number: 6803170
    Abstract: A resist composition comprises: at least one type of a first compound having two or more intramolecular adamantyl structures represented by the chemical formula 1 below; a base resin; and a second compound which generates an acid by active beam irradiation. wherein X is —(OCO)m—(CH2)n—(COO)m—, where m=0 or 1 and n=0, 1, 2 or 3 provided when n=0, m=0; and Y and Z are H, OH, F, Cl, Br, R or COOR, where Y may be Z, or Y and Z may be introduced in a single adamantyl structure and R represents a straight or branched alkyl group having 1 to 8 carbon atoms.
    Type: Grant
    Filed: August 10, 2001
    Date of Patent: October 12, 2004
    Assignees: Semiconductor Leading Edge Technologies, Inc., Idemitsu Petrochemical Co., Ltd.
    Inventors: Minoru Toriumi, Isao Satou, Hiroyuki Watanabe, Shunji Katai, Shintaro Suzuki
  • Resist composition and method for manufacturing semiconductor device using the resist composition
    Publication number: 20020022193
    Abstract: A resist composition comprises: at least one type of a first compound having two or more intramolecular adamantyl structures represented by the chemical formula 1 below; a base resin; and a second compound which generates an acid by active beam irradiation.
    Type: Application
    Filed: August 10, 2001
    Publication date: February 21, 2002
    Applicant: Semiconductor Leading Edge Technologies, Inc.
    Inventors: Minoru Toriumi, Isao Satou, Hiroyuki Watanabe, Shunji Katai, Shintaro Suzuki