Abstract: A cover glass (10) includes a glass layer (16), a viscoelastic layer (12), and an acoustic impedance adjusting layer (14) disposed between the glass layer (16) and the viscoelastic layer (12). When acoustic impedance of the glass layer (16) is Zg, acoustic impedance of the acoustic impedance adjusting layer (14) is Zm, and acoustic impedance of the viscoelastic layer (12) is Zd, the cover glass (10) satisfies a relationship of Zg>Zm>Zd.

Abstract: A cover glass (10) includes a glass layer (16), a viscoelastic layer (12), and an acoustic impedance adjusting layer (14) disposed between the glass layer (16) and the viscoelastic layer (12). When acoustic impedance of the glass layer (16) is Zg, acoustic impedance of the acoustic impedance adjusting layer (14) is Zm, and acoustic impedance of the viscoelastic layer (12) is Zd, the cover glass (10) satisfies a relationship of Zg>Zm>Zd.

Abstract: An organic EL device 10 is comprised of an ITO film-formed substrate 4 that is comprised of a glass substrate 1, an SiO2 film 2 that is formed on a surface of the glass substrate 1 and is for alkaline passivation, and an ITO film 3 that is formed on the surface of the SiO2 film 2, a hole transport layer 5 that is formed on the surface of the ITO film 3 and is for efficiently injecting holes into a light-emitting layer 6, a thin metallic film layer 7 that is formed on the light-emitting layer 6 and is for injecting electrons into the light-emitting layer 6, and the light-emitting layer 6 which emits light upon recombination of the injected holes and electrons. The surface smoothness of the glass substrate 1 is controlled to satisfy 0 nm≦Rz≦4 nm. As a result, non-luminescent spots do not occur and hence durability can be improved.

Abstract: A substrate with a transparent condcutive film is provided, which has a high work function and an excellent surface smoothness as well as a reduced specific resistance to thereby ensure a reduced power consumption and enhanced display quality. An ITO film 2 is formed on a glass substrate 1 by an ion plating method by using an ITO sintered compact with an SnO2 content of 4 to 6 wt %. The ITO film 2 obtained as above has a surface having a work function of 4.9 to 5.5 eV, a surface roughness of 1 to 10 nm, and a specific resistance of 1.6×10−4 &OHgr;·cm or less. An organic EL device using the substrate is provided, in which an organic multilayer film (hole transport layer 5, light-emitting layer 7, and electron transport layer 6) is laminated on the surface of the ITO film 2, and further a metal thin film layer 4 is laminated on the surface of the organic multilayer film.

Abstract: There is provided an apparatus for manufacturing substrates with transparent conductive films, which is capable of preventing occurrence of abnormal discharge and making feed rollers thereof durable. A carrier supports a tray holding an insulated substrate via support members each formed by a hollow cylindrical member (separator element) and a hollow cylindrical member (support element). The carrier is transported by feed rollers 38 whose axles are not made of a ceramic material but made of a metal higher in rigidity, in an atmosphere of vaporized particles of an ITO sintered body. The hollow cylindrical members (separators) separate the atmosphere of vaporized particles from outer surfaces of the hollow cylindrical members (support elements) to form a labyrinth in a path of migration and attachment of the vaporized particles.

Abstract: A correction mechanism including a magnetic body (51) is placed at a position between a vacuum chamber (21) and a steering coil (23) and where line of magnetic force generated from the steering coil is present, to correct torsion and/or bias of a plasma beam.

Abstract: A substrate with a transparent condcutive film is provided, which has a high work function and an excellent surface smoothness as well as a reduced specific resistance to thereby ensure a reduced power consumption and enhanced display quality. An ITO film 2 is formed on a glass substrate 1 by an ion plating method by using an ITO sintered compact with an SnO2 content of 4 to 6 wt %. The ITO film 2 obtained as above has a surface having a work function of 4.9 to 5.5 eV, a surface roughness of 1 to 10 nm, and a specific resistance of 1.6×10−4 &OHgr;·cm or less. An organic EL device using the substrate is provided, in which an organic multilayer film (hole transport layer 5, light-emitting layer 7, and electron transport layer 6) is laminated on the surface of the ITO film 2, and further a metal thin film layer 4 is laminated on the surface of the organic multilayer film.