Patents by Inventor Shunroku Taya

Shunroku Taya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7928376
    Abstract: There is provided an element mapping unit, scanning transmission electron microscope, and element mapping method that enable to acquire an element mapping image very easily. On the scanning transmission electron microscope, the electron beam transmitted through an object to be analyzed enters into the element mapping unit. The electron beam is analyzed of its energy into spectrum by an electron spectrometer and an electron energy loss spectrum is acquired. Because the acceleration voltage data for each element and window data for 2-window method, 3-window method or contrast tuning method are already stored in a database and accordingly the spectrum measurement is carried out immediately even when an element to be analyzed is changed to another, the operator can confirm a two-dimensional element distribution map immediately.
    Type: Grant
    Filed: September 23, 2005
    Date of Patent: April 19, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Kazutoshi Kaji, Kazuhiro Ueda, Koji Kimoto, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 7838827
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Grant
    Filed: November 26, 2007
    Date of Patent: November 23, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Publication number: 20080237463
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Application
    Filed: November 26, 2007
    Publication date: October 2, 2008
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Patent number: 7315024
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: January 1, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Patent number: 7250601
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: July 31, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Publication number: 20060219910
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Application
    Filed: February 1, 2006
    Publication date: October 5, 2006
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Publication number: 20060163479
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Application
    Filed: March 10, 2006
    Publication date: July 27, 2006
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 7067805
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Grant
    Filed: February 17, 2004
    Date of Patent: June 27, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazutoshi Kajl, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 7022983
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Grant
    Filed: January 7, 2004
    Date of Patent: April 4, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Publication number: 20060011836
    Abstract: There is provided an element mapping unit, scanning transmission electron microscope, and element mapping method that enable to acquire an element mapping image very easily. On the scanning transmission electron microscope, the electron beam transmitted through an object to be analyzed enters into the element mapping unit. The electron beam is analyzed of its energy into spectrum by an electron spectrometer and an electron energy loss spectrum is acquired. Because the acceleration voltage data for each element and window data for 2-window method, 3-window method or contrast tuning method are already stored in a database and accordingly the spectrum measurement is carried out immediately even when an element to be analyzed is changed to another, the operator can confirm a two-dimensional element distribution map immediately.
    Type: Application
    Filed: September 23, 2005
    Publication date: January 19, 2006
    Inventors: Kazutoshi Kaji, Kazuhiro Ueda, Koji Kimoto, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 6933501
    Abstract: The present invention provides an ultimate analyzer which displays an element distribution image of an object with high contrast and high accuracy. A scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer is also provided. The ultimate analyzer comprises a scattered electron beam detector for detecting an electron beam scattered by an object; an electron spectrometer for energy dispersing an electron beam transmitted through the object; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: August 23, 2005
    Assignee: Hitachi, Ltd.
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Publication number: 20040188607
    Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
    Type: Application
    Filed: January 7, 2004
    Publication date: September 30, 2004
    Inventors: Yoichi Ose, Shunroku Taya, Hideo Todokoro, Tadashi Otaka, Mitsugu Sato, Makoto Ezumi
  • Publication number: 20040183011
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Application
    Filed: February 17, 2004
    Publication date: September 23, 2004
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 6794648
    Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer. The present invention exists in an ultimate analyzer comprising a scattered electron beam detector for detecting an electron beam scattered by an object to be analyzed; an electron spectrometer for energy dispersing an electron beam transmitted through the object to be analyzed; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements of the object to be analyzed based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: September 21, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Publication number: 20040169143
    Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer. The present invention exists in an ultimate analyzer comprising a scattered electron beam detector for detecting an electron beam scattered by an object to be analyzed; an electron spectrometer for energy dispersing an electron beam transmitted through the object to be analyzed; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements of the object to be analyzed based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 2, 2004
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Patent number: 6703613
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: March 9, 2004
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Publication number: 20030085356
    Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer. The present invention exists in an ultimate analyzer comprising a scattered electron beam detector for detecting an electron beam scattered by an object to be analyzed; an electron spectrometer for energy dispersing an electron beam transmitted through the object to be analyzed; an electron beam detector for detecting said dispersed electron beam; and a control unit for analyzing elements of the object to be analyzed based on an output signal of the electron beam detected by the electron beam detector and an output signal of the electron beam detected by the scattered electron beam detector.
    Type: Application
    Filed: July 17, 2002
    Publication date: May 8, 2003
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Publication number: 20030085350
    Abstract: An object of the present invention is to provide an ultimate analyzer which can display an element distribution image of an object to be analyzed with high contrast to determine the positions of the element distribution with high accuracy, and a scanning transmission electron microscope and a method of analyzing elements using the ultimate analyzer.
    Type: Application
    Filed: April 3, 2002
    Publication date: May 8, 2003
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Hiroyuki Tanaka, Shigeto Isakozawa
  • Publication number: 20020096632
    Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.
    Type: Application
    Filed: November 19, 2001
    Publication date: July 25, 2002
    Inventors: Kazutoshi Kaji, Takashi Aoyama, Shunroku Taya, Shigeto Isakozawa
  • Patent number: 6310341
    Abstract: An irradiation electron beam emitted from an electron gun is deflected by an energy filter, and passes through a first projective lens and an objective lens, and then irradiated onto a sample to produce secondary electrons. The secondary electron beam accelerated by a negative voltage applied to the sample passes through the objective lens and the first projective lens, and deflected by the energy filter to be energy dispersed. Only the secondary electrons having a specified energy pass through energy selecting aperture, and further pass through a second projective lens to form a projected image of the secondary electrons on an imager. Such an electron-optical system may be used for dimension evaluation or inspection of semiconductor substrates.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: October 30, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Todokoro, Tohru Ishitani, Yasutsugu Usami, Shunroku Taya, Hiroyuki Shinada, Taku Ninomiya, Tsuyoshi Ohnishi