Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.

Abstract: A high-molecular-weight compound having a plurality of polymer chains linked through a divalent or higher-valent linking group, in which the divalent or higher-valent linking group has a thiol group and at least one of a thioether structure and a thiourethane structure, and a ratio of an absolute weight-average molecular weight to a relative weight-average molecular weight (absolute Mw/relative Mw) of the high-molecular-weight compound is 1.25 or more; and a method for producing the same are provided.

Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.

Abstract: The present invention relates to a curable composition containing a thiol compound (A) having at least two thiol groups in a molecule thereof, an isocyanate compound (B) having at least two isocyanate groups in a molecule thereof, a phosphine compound (C), an acid (D) having an acid dissociation constant (pKa) of 3 or less relative to water, and a Michael acceptor (E); wherein, the content of the phosphine compound (C) is 1.3% by mass or less based on 100% by mass of the curable composition.

Abstract: The present invention relates to a curable composition containing a thiol compound (A) having at least two thiol groups in a molecule thereof, an epoxy compound (B2) having at least two epoxy groups in a molecule thereof, a phosphine compound (C), and an acid (D); and, a curable composition containing the thiol compound (A), an epoxy compound (B1) having at least one epoxy group in a molecule thereof, an isocyanate compound (E2) having at least two isocyanate groups in a molecule thereof, a phosphine compound (C), and an acid (D).

Abstract: The present invention relates to a curable composition containing a thiol compound (A) having at least two thiol groups in a molecule thereof, an isocyanate compound (B) having at least two isocyanate groups in a molecule thereof, a phosphine compound (C), an acid (D) having an acid dissociation constant (pKa) of 3 or less relative to water, and a Michael acceptor (E); wherein, the content of the phosphine compound (C) is 1.3% by mass or less based on 100% by mass of the curable composition.

Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer, and optionally an isocyanate monomer. The invention further includes a composition comprising a composition comprising the tetra(2-mercapto)silane (SiTSH) monomer and at least one selected from the group consisting of (a) a Michael acceptor, optionally an isocyanate monomer, and optionally at least one catalyst selected from the group consisting of a base, nucleophile, photolabile base, photolabile nucleophile, and mixtures thereof; (b) an ene monomer, and optionally a polymerization photoinitiator. In certain embodiments, once the composition is polymerized, the polymerized system is suitable for use as a dental composite system. In other embodiments, the polymerized system is stable to acidic and basic conditions. In yet other embodiments, the polymerized system forms microparticles. The invention further includes a method of generating a dental polymeric material.

Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer and an acrylate monomer. In one embodiment, the thiol monomer reacts with the vinyl sulfone monomer preferentially over the acrylate monomer, and this differential selectivity allows for the control of the architecture of crosslinking polymer network. The invention further includes a composition comprising an electrophilic monomer, a nucleophilic monomer, a nucleophilic catalyst and an acid, wherein the concentrations of the nucleophilic catalyst and acid are selected as to provide a specific induction time for the polymerization reaction of the composition.

Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer, and optionally an isocyanate monomer. The invention further includes a composition comprising a composition comprising the tetra(2-mercapto)silane (SiTSH) monomer and at least one selected from the group consisting of (a) a Michael acceptor, optionally an isocyanate monomer, and optionally at least one catalyst selected from the group consisting of a base, nucleophile, photolabile base, photolabile nucleophile, and mixtures thereof; (b) an ene monomer, and optionally a polymerization photoinitiator. In certain embodiments, once the composition is polymerized, the polymerized system is suitable for use as a dental composite system. In other embodiments, the polymerized system is stable to acidic and basic conditions. In yet other embodiments, the polymerized system forms microparticles. The invention further includes a method of generating a dental polymeric material.

Abstract: The invention includes a composition comprising a vinyl sulfone monomer, a thiol monomer and an acrylate monomer. In one embodiment, the thiol monomer reacts with the vinyl sulfone monomer preferentially over the acrylate monomer, and this differential selectivity allows for the control of the architecture of crosslinking polymer network. The invention further includes a composition comprising an electrophilic monomer, a nucleophilic monomer, a nucleophilic catalyst and an acid, wherein the concentrations of the nucleophilic catalyst and acid are selected as to provide a specific induction time for the polymerization reaction of the composition.

Abstract: A molded product having a phase separation structure formed by photopolymerization of a photopomerizable composition and imparting a sharp diffraction spot at a high diffraction efficiency, and a method for manufacturing same are provided. The molded product (1) comprises a matrix (2) and a multiple columnar structures (3) disposed within the matrix (2) and having an index of refraction different from the matrix (2), wherein the half width of a diffraction spot is 0.6° or less and diffraction efficiency is 10% or greater in an angular spectrum obtained by irradiation with a laser beam having an intensity distribution of standard normal distribution and a half width of the intensity distribution of 0.5°. The multiple columnar structures (3) are oriented in approximately the same direction, and are aligned in a regular lattice on a plane perpendicular to said orientation direction.

Abstract: A molded product having a phase separation structure formed by photopolymerization of a photopolymerizable composition and imparting a sharp diffraction spot at a high diffraction efficiency, and a method for manufacturing same are provided. The molded product (1) comprises a matrix (2) and a multiple columnar structures (3) disposed within the matrix (2) and having an index of refraction different from the matrix (2), wherein the half width of a diffraction spot is 0.6° or less and diffraction efficiency is 10% or greater in an angular spectrum obtained by irradiation with a laser beam having an intensity distribution of standard normal distribution and a half width of the intensity distribution of 0.5°. The multiple columnar structures (3) are oriented in approximately the same direction, and are aligned in a regular lattice on a plane perpendicular to said orientation direction.

Abstract: A molded product having a phase separation structure formed by photopolymerization of a photopomerizable composition and imparting a sharp diffraction spot at a high diffraction efficiency, and a method for manufacturing same are provided. The molded product (1) comprises a matrix (2) and a multiple columnar structures (3) disposed within the matrix (2) and having an index of refraction different from the matrix (2), wherein the half width of a diffraction spot is 0.6° or less and diffraction efficiency is 10% or greater in an angular spectrum obtained by irradiation with a laser beam having an intensity distribution of standard normal distribution and a half width of the intensity distribution of 0.5°. The multiple columnar structures (3) are oriented in approximately the same direction, and are aligned in a regular lattice on a plane perpendicular to said orientation direction.

Abstract: A molded product having a phase separation structure formed by photopolymerization of a photopolymerizable composition and imparting a sharp diffraction spot at a high diffraction efficiency, and a method for manufacturing same are provided. The molded product (1) comprises a matrix (2) and a multiple columnar structures (3) disposed within the matrix (2) and having an index of refraction different from the matrix (2), wherein the half width of a diffraction spot is 0.6° or less and diffraction efficiency is 10% or greater in an angular spectrum obtained by irradiation with a laser beam having an intensity distribution of standard normal distribution and a half width of the intensity distribution of 0.5°. The multiple columnar structures (3) are oriented in approximately the same direction, and are aligned in a regular lattice on a plane perpendicular to said orientation direction.