Patents by Inventor Shunsuke Hosaka

Shunsuke Hosaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11905499
    Abstract: Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: February 20, 2024
    Assignee: TOKUYAMA CORPORATION
    Inventors: Shunsuke Hosaka, Masanari Ishizuki
  • Patent number: 11807836
    Abstract: Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: November 7, 2023
    Assignee: TOKUYAMA CORPORATION
    Inventors: Shunsuke Hosaka, Masanari Ishizuki
  • Publication number: 20230121726
    Abstract: Provided are: a semiconductor treatment liquid comprising high-purity isopropyl alcohol, wherein the concentration of the oxolane compound expressed in formula (1) below when held for 60 days in a nitrogen atmosphere at 50° C. in a SUS304 container is 25 ppb or less on a mass basis in relation to the isopropyl alcohol; and a method for manufacturing said semiconductor treatment liquid. In the formula, R1 and R2 each independently represent a hydrogen atom or a C1-3 alkyl group, and the total number of carbon atoms in R1 and R2 is 3 or less. R3 represents a hydrogen atom or an isopropyl group.
    Type: Application
    Filed: March 30, 2021
    Publication date: April 20, 2023
    Applicant: TOKUYAMA CORPORATION
    Inventors: Masashi Shinagawa, Takashi Tokunaga, Yuu Mishima, Shunsuke Hosaka
  • Publication number: 20220002641
    Abstract: Provided is a high-purity isopropyl alcohol in which the concentration of a C7-12 acetal compound is 100 ppb or less on a mass basis, the concentration of the acetal compound in an accelerated test involving heating for 4 hours at 80° C. in a nitrogen atmosphere is increased by a factor of 30 or less with respect to the value thereof prior to heating, and the concentration of the acetal compound is maintained at a value of 100 ppb or less on a mass basis. Also provided is a method for manufacturing said high-purity isopropyl alcohol.
    Type: Application
    Filed: September 30, 2019
    Publication date: January 6, 2022
    Applicant: TOKUYAMA CORPORATION
    Inventors: Shunsuke Hosaka, Masanari Ishizuki
  • Patent number: 8912371
    Abstract: A method of producing a chlorinated hydrocarbon having 3 carbon atoms, comprising a conversion step for converting a chloropropane represented by the following formula (1) into a chloropropane represented by the following formula (2) by reacting it with chlorine in the presence of anhydrous aluminum chloride. CCl3—CCl(2-m)Hm—CCl(3-n)Hn??(1) (In the above formula (1), m is 1 or 2, and n is an integer of 0 to 3.) CCl3—CCl(3-m)H(m-1)—CCl(3-n)Hn??(2) (In the above formula (2), m and n are the same integers as in the formula (1), respectively.
    Type: Grant
    Filed: December 1, 2011
    Date of Patent: December 16, 2014
    Assignee: Tokuyama Corporation
    Inventors: Shunsuke Hosaka, Yasutaka Komatsu, Masayuki Moriwaki, Kikuo Yamamoto, Naoya Okada
  • Patent number: 8877990
    Abstract: A process of making a chlorinated hydrocarbon through a thermal dehydrochlorination step in which an unsaturated compound represented by the following general formula (2) is obtained by thermally decomposing a saturated compound represented by the following general formula (1). CCl3—CCl2-mHm—CCl3-nHn??(1) CCl2?CCl2-mHm-1—CCl3-nHn??(2) (in the above formulas, m is 1 or 2, and n is an integer of 0 to 3.
    Type: Grant
    Filed: June 17, 2010
    Date of Patent: November 4, 2014
    Assignee: Tokuyama Corporation
    Inventors: Tadahiro Fukuju, Kikuo Yamamoto, Masayuki Moriwaki, Yasutaka Komatsu, Akihiro Saito, Shunsuke Hosaka, Dai Tsunoda, Jun Kawakami
  • Publication number: 20130165705
    Abstract: A method of producing a chlorinated hydrocarbon having 3 carbon atoms, comprising a conversion step for converting a chloropropane represented by the following formula (1) into a chloropropane represented by the following formula (2) by reacting it with chlorine in the presence of anhydrous aluminum chloride. CCl3—CCl(2-m)Hm—CCl(3-n)Hn??(1) (In the above formula (1), m is 1 or 2, and n is an integer of 0 to 3.) CCl3—CCl(3-m)H(m-1)—CCl(3-n)Hn??(2) (In the above formula (2), m and n are the same integers as in the formula (1), respectively.
    Type: Application
    Filed: December 1, 2011
    Publication date: June 27, 2013
    Applicant: TOKUYAMA CORPORATION
    Inventors: Shunsuke Hosaka, Yasutaka Komatsu, Masayuki Moriwaki, Kikuo Yamamoto, Naoya Okada
  • Patent number: 8304589
    Abstract: A process of making a chlorinated hydrocarbon through a thermal dehydrochlorination step in which an unsaturated compound represented by the following general formula (2) is obtained by thermally decomposing a saturated compound represented by the following general formula (1). CCl3—CCl2-mHm—CCl3-nHn??(1) CCl2?CCl2-mHm-1—CCl3-nHn??(2) (in the above formulas, m is 1 or 2, and n is an integer of 0 to 3.).
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: November 6, 2012
    Assignee: Tokuyama Corporation
    Inventors: Tadahiro Fukuju, Kikuo Yamamoto, Masayuki Moriwaki, Yasutaka Komatsu, Akihiro Saito, Shunsuke Hosaka, Dai Tsunoda, Jun Kawakami
  • Publication number: 20120157723
    Abstract: A process of making a chlorinated hydrocarbon through a thermal dehydrochlorination step in which an unsaturated compound represented by the following general formula (2) is obtained by thermally decomposing a saturated compound represented by the following general formula (1). CCl3—CCl2-mHm—CCl3-nHn??(1) CCl2?CCl2-mHm-1—CCl3-nHn??(2) (in the above formulas, m is 1 or 2, and n is an integer of 0 to 3.
    Type: Application
    Filed: February 27, 2012
    Publication date: June 21, 2012
    Inventors: Tadahiro FUKUJU, Kikuo YAMAMOTO, Masayuki MORIWAKI, Yasutaka KOMATSU, Akihiro SAITO, Shunsuke HOSAKA, Dai TSUNODA, Jun KAWAKAMI
  • Publication number: 20120053374
    Abstract: A process of making a chlorinated hydrocarbon through a thermal dehydrochlorination step in which an unsaturated compound represented by the following general formula (2) is obtained by thermally decomposing a saturated compound represented by the following general formula (1). CCl3—CCl2-mHm—CCl3-nHn??(1) CCl2?CCl2-mHm-1—CCl3-nHn??(2) (in the above formulas, m is 1 or 2, and n is an integer of 0 to 3.
    Type: Application
    Filed: June 17, 2010
    Publication date: March 1, 2012
    Inventors: Tadahiro Fukuju, Kikuo Yamamoto, Masayuki Moriwaki, Yasutaka Komatsu, Akihiro Saito, Shunsuke Hosaka, Dai Tsunoda, Jun Kawakami