Abstract: Provided is an apparatus that includes a molding die for producing a sintered body. The molding die is configured for cold isostatic pressing and includes a knockdown mold frame comprised of plural frame members and a bottom plate provided in contact with the knockdown mold frame. An upper punch is provided to be movable along the inner surface of the knockdown mold frame. The frame members configured to be movable relative to each other to accommodate an expansion of a green body which takes place at the time of reducing the pressure after the completion of pressing.

Abstract: Provided is an apparatus that includes a molding die for producing a sintered body. The molding die is configured for cold isostatic pressing and includes a knockdown mold frame comprised of plural frame members and a bottom plate provided in contact with the knockdown mold frame. An upper punch is provided to be movable along the inner surface of the knockdown mold frame. The frame members configured to be movable relative to each other to accommodate an expansion of a green body which takes place at the time of reducing the pressure after the completion of pressing.

Abstract: Provided is an apparatus that includes a molding die for producing a sintered body. The molding die is configured for cold isostatic pressing and includes a knockdown mold frame comprised of plural frame members and a bottom plate provided in contact with the knockdown mold frame. An upper punch is provided to be movable along the inner surface of the knockdown mold frame. The frame members configured to be movable relative to each other to accommodate an expansion of a green body which takes place at the time of reducing the pressure after the completion of pressing.

Abstract: Provided is an apparatus that includes a molding die for producing a sintered body. The molding die is configured for cold isostatic pressing and includes a knockdown mold frame comprised of plural frame members and a bottom plate provided in contact with the knockdown mold frame. An upper punch is provided to be movable along the inner surface of the knockdown mold frame. The frame members configured to be movable relative to each other to accommodate an expansion of a green body which takes place at the time of reducing the pressure after the completion of pressing.

Abstract: To provide a large sputtering target excellent in discharge characteristics during sputtering and in characteristics of a thin film thereby obtainable. Further, a process for producing a sintered body is provided, whereby a large green body excellent in shape accuracy can be obtained by means of cold isostatic pressing directly without preforming, and a sintered body capable of providing the above-mentioned excellent sputtering target, can be produced efficiently at a low cost. The sputtering target is produced by using a sintered body having the content of carbon contained as an impurity reduced to less than 0.005 wt %. Such a sintered body is obtainable by molding a raw material powder by cold isostatic pressing directly without adding a binder containing an organic substance or a molding aid, followed by firing.

Abstract: A novel heat-resistant low-silica zeolite, an industrial production process, and uses of the low-silica zeolite are provided. The heat-resistant low-silica zeolite contains Si and Al in a molar ratio of SiO.sub.2 /Al.sub.2 O.sub.3 ranging from 1.9 to 2.1, and has sodium and/or potassium as metal cation, wherein the low-silica zeolite contains low-silica faujasite type zeolite at a content of not lower than 88%, and has a thermal decomposition temperature ranging from 870.degree. C. to 900.degree. C. in the air. The process for producing the heat-resistant low-silica zeolite comprises mixing a solution containing an aluminate with another solution containing a silicate, allowing the resulting mixture to gel, and aging the resulting gel, at the temperature of from 0.degree. C. to 60.degree. C., to prepare a slurry having a viscosity ranging from 10 to 10000 cp and containing amorphous aluminosilicate having a specific surface area of not less than 10 m.sup.2 /g with an SiO.sub.2 /Al.sub.2 O.sub.