Abstract: The present invention relates to an optical waveguide containing: a core formed by curing (A) a fluorine-containing polyarylene prepolymer having a crosslinkable functional group; and a cladding formed by curing (I) a curable composition containing (B) a compound having a molecular weight of 140 to 5,000, having a crosslinkable functional group and having no fluorine atom, and (A) a fluorine-containing polyarylene prepolymer.

Abstract: To provide a prepolymer which is excellent in heat resistance and which can form a cured product excellent in oil repellency and water repellency. A crosslinkable prepolymer having a polyaryl ether structure on its main chain, which has a crosslinkable functional group and a side chain represented by “Rf-CH2—O—” wherein Rf is a C3-50 fluorinated alkyl group (which may contain an oxygen atom forming an ether bond).

Abstract: To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses.

Abstract: The present invention relates to an optical waveguide containing: a core formed by curing (A) a fluorine-containing polyarylene prepolymer having a crosslinkable functional group; and a cladding formed by curing (I) a curable composition containing (B) a compound having a molecular weight of 140 to 5,000, having a crosslinkable functional group and having no fluorine atom, and (A) a fluorine-containing polyarylene prepolymer.

Abstract: To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses.

Abstract: To provide a prepolymer which is excellent in heat resistance and which can form a cured product excellent in oil repellency and water repellency. A crosslinkable prepolymer having a polyaryl ether structure on its main chain, which has a crosslinkable functional group and a side chain represented by “Rf—CH2—O—” wherein Rf is a C3-50 fluorinated alkyl group (which may contain an oxygen atom forming an ether bond)).

Abstract: To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses.

Abstract: To provide a fluorinated aromatic polymer having excellent heat resistance and a low relative permittivity; and an insulating film for electronic devices and an insulating film for multilayered wiring boards, which are made of the polymer. A fluorinated aromatic polymer which contains two or more crosslinkable functional groups (A) per molecule and has a number average molecular weight of from 1×103 to 5×105 and an ether linkage and which is produced by e.g.

Abstract: To provide a fluorinated aromatic polymer having excellent heat resistance and a low relative permittivity; and an insulating film for electronic devices and an insulating film for multilayered wiring boards, which are made of the polymer. A fluorinated aromatic polymer which contains two or more crosslinkable functional groups (A) per molecule and has a number average molecular weight of from 1×103 to 5×105 and an ether linkage and which is produced by e.g.

Abstract: The present invention provides a low dielectric insulating film having low relative dielectric constant, high mechanical strength and high adhesion to substrates, i.e. a low dielectric constant insulating film having one-dimensional through channels from one surface to the other surface and having a relative dielectric constant between the relative dielectric constant of a matrix phase and 1, thus suitable for use as an interlayer film, wherein the film is formed by removing columnar phases from a composite film comprising many columnar phases one-dimensionally grown on the substrate and a matrix phase surrounding them.

Abstract: A fluorine-containing resin composition comprising at least one fluorine-containing polycyclic compound (A) selected from the group consisting of the following compounds (A1), (A2) and (A3), and a polymer (B) having a fluorine-containing alicyclic structure: (A1) a fluorine-containing non-condensed polycyclic compound having at least two fluorine-containing rings bonded by a bond containing at least one member selected from the group consisting of a triazine ring, an oxygen atom, a sulfur atom, a phosphorus atom and a metal atom, each of said fluorine-containing rings being a carbon ring or a heterocyclic ring, (A2) a fluorine-containing non-condensed polycyclic compound having at least three fluorine-containing rings bonded directly or by a bond containing a carbon atom, each of said fluorine-containing rings being a carbon ring or a heterocyclic ring, (A3) a fluorine-containing condensed polycyclic compound which is a condensed polycyclic compound composed of at least three carbon rings or heterocyclic r

Abstract: A low dielectric resin composition comprising the following components (a) and (b), and the dielectric constant of a coating film formed by this composition being at most 3:(a) a resin having functional groups in its molecule and being soluble in a solvent; and(b) a partially hydrolyzed condensate of alkoxysilanes of the formula R.sup.1.sub.m R.sup.2.sub.n Si(OR.sup.3).sub.4-m-n, wherein each of R.sup.1 and R.sup.2 which may be the same or different, is a non-hydrolyzable group, R.sup.3 is an alkyl group, and m and n are integers of from 0 to 3 satisfying 0.ltoreq.m+n.ltoreq.3.

Abstract: A fluoropolymer composition for coating, which comprises a polymer having a fluorine-containing cycloaliphatic structure and at least one coupling group in its molecule and a solvent for dissolving said polymer.

Abstract: A fluorine-containing polymer composition comprising a polymer having a functional group and a fluorine-containing aliphatic cyclic structure dissolved in a solvent mixture of an aprotic fluorine-containing solvent and a protic fluorine-containing solvent.

Abstract: A process for producing a semiconductor having a thin film of a fluorine resin as a protective film, which comprises coating on the surface of a fluorine resin a photoresist solution containing a surfactant, followed by exposure, development and etching for fine processing of the fluorine resin.

Abstract: A fluorine-containing polymer composition comprising a solvent containing a block compound composed of a polyfluorinated segment and a hydrocarbon segment and a fluorine-containing polymer having a fluorine-containing aliphatic cyclic structure dissolved in the solvent.

Abstract: A fluorine-containing polymer composition comprising a polymer having a functional group and a fluorine-containing aliphatic cyclic structure dissolved in a solvent mixture of an aprotic fluorine-containing solvent and a protic fluorine-containing solvent.