Patents by Inventor Shuntaro Ibuki

Shuntaro Ibuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060210727
    Abstract: An antireflection film comprising: a transparent support; at least one functional layer; and a low-refractive layer, wherein at least one of said at least one functional layer comprises a hydrolyzate and/or a partial condensate of an organosilane compound represented by formula (1), and the antireflection film has an inner haze of from 1 to 50%: where R1 represents a hydrogen atom, a methyl group, a methoxy group, an alkoxycarbonyl group, a cyano group, a fluorine atom, or a chlorine atom; Y represents a single bond, *—COO—**, *—CONH—**, or *—O—**; L represents a divalent linking group; R2 to R4 each independently represents a halogen atom, a hydroxyl group, an unsubstituted alkoxy group, or an unsubstituted alkyl group; R5 represents a hydrogen atom or an unsubstituted alkyl group; R6 represents a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group; and l indicates a number that satisfies a numerical formula of l=100-m, and m indicates a number of from 0 to 50.
    Type: Application
    Filed: March 17, 2006
    Publication date: September 21, 2006
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Shuntaro Ibuki, Masataka Yoshizawa
  • Publication number: 20060153979
    Abstract: An anti-glare and anti-reflection film comprising: a transparent support; an anti-glare layer; and a low refractive index layer, wherein a value of haze which is caused due to internal scattering of the anti-glare and anti-reflection film is 0 to 35%, and a center line average roughness Ra of the anti-reflection film is 0.08 to 0.30 ?m.
    Type: Application
    Filed: November 28, 2005
    Publication date: July 13, 2006
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Tetsuya Asakura, Kazuhiro Nakamura, Shuntaro Ibuki
  • Publication number: 20060141243
    Abstract: An optical film comprises: a transparent support; and at least one functional layer provided the transparent support, wherein an unevenness in thickness of the transparent support is not greater than ±5% from an average thickness, and an unevenness in an amount of surface plasticizer on the transparent support on the functional layer side thereof is not greater than ±20% from an average residual amount of surface plasticizer.
    Type: Application
    Filed: December 27, 2005
    Publication date: June 29, 2006
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Shuntaro Ibuki
  • Publication number: 20060057307
    Abstract: The present invention can provide an antireflection film improved in the scratch resistance while having a sufficiently high antireflection property, and a polarizing plate and a display device using the antireflection film, the antireflection film antireflection film comprising: a transparent support; and as an outermost layer, a low refractive index layer containing a fluorine-containing polymer, wherein the low refractive index layer comprises at least one inorganic fine particle having an average particle size of 30 to 100% of the thickness of the low refractive index layer; the polarizing plate using the antireflection film for one of two protective films of a polarizer in the polarizing plate; and the image display device using the antireflection film or polarizing plate for the outermost surface of the display.
    Type: Application
    Filed: August 14, 2003
    Publication date: March 16, 2006
    Applicant: Fuji Photo Film Co., Ltd.
    Inventors: Naohiro Matsunaga, Shuntaro Ibuki
  • Publication number: 20040070041
    Abstract: An anti-reflection film that is an optical film, at least has a hard coat layer, and a low-refractive-index layer containing a binder polymer, on a transparent support, wherein said hard coat layer and/or said low-refractive-index layer contains: (a) a hydrolysate of an organosilane in which a hydroxyl group or a hydrolysable group is directly bonded to silicon, and/or a partial condensation product thereof; and (b) at least one metal chelate compound of an alkylalcohol, and a compound of R4COCH2COR5, in which R4 is an alkyl group, and R5 is an alkyl or alkoxy group, as ligands, and a metal selected from Zr, Ti and Al, as a central metal.
    Type: Application
    Filed: July 3, 2003
    Publication date: April 15, 2004
    Applicant: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuhiko Obayashi, Takahiro Ishizuka, Shuntaro Ibuki, Yuuzou Muramatsu