Patents by Inventor Shunya Watanabe

Shunya Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9443694
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 13, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Patent number: 9355817
    Abstract: The sample 3 is tilted/oscillated with respect to the optical axis (Z-axis) of the ion beam 2 to repeat tilt and tilt/restoration of a processing target surface 3a of the sample 3 between a surface state in which the processing target surface 3a of the sample 3 faces a tilt axis direction (Y-axis direction) and a tilted surface state in which a portion of the processing target surface 3a on the sample stage side protrudes in the tilt axis direction (Y-axis direction) than does a portion of the processing target surface 3 on the mask side, so that the processing target surface 3a is irradiated with the ion beam 2 at a low angle, and projections/recesses 63 derived from a void 61 or a dissimilar material 62 are suppressed. Accordingly, it is possible to suppress generation of projections/recesses derived from a void or dissimilar material in fabrication of a cross section sample, and thus fabricate a sample cross section suitable for observation/analysis.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: May 31, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shunya Watanabe, Mami Konomi, Hisayuki Takasu, Atsushi Kamino
  • Patent number: 9202668
    Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: December 1, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takafumi Miwa, Yoichi Ose, Eiko Nakazawa, Mami Konomi, Shunya Watanabe, Yoshinobu Kimura, Natsuki Tsuno
  • Patent number: 9058957
    Abstract: A charged particle beam apparatus is provided with a parameter adjustment practice function for allowing any user to easily learn manual focus adjustment and stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.
    Type: Grant
    Filed: May 28, 2012
    Date of Patent: June 16, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi
  • Publication number: 20150076348
    Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.
    Type: Application
    Filed: March 15, 2013
    Publication date: March 19, 2015
    Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
  • Publication number: 20140264018
    Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.
    Type: Application
    Filed: October 16, 2012
    Publication date: September 18, 2014
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takafumi Miwa, Yoichi Ose, Eiko Nakazawa, Mami Konomi, Shunya Watanabe, Yoshinobu Kimura, Natsuki Tsuno
  • Publication number: 20140131590
    Abstract: In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology. In order to solve the above-described problem, there is provided means for practicing a focus adjustment and a stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation.
    Type: Application
    Filed: May 28, 2012
    Publication date: May 15, 2014
    Inventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi
  • Publication number: 20130240353
    Abstract: The sample 3 is tilted/oscillated with respect to the optical axis (Z-axis) of the ion beam 2 to repeat tilt and tilt/restoration of a processing target surface 3a of the sample 3 between a surface state in which the processing target surface 3a of the sample 3 faces a tilt axis direction (Y-axis direction) and a tilted surface state in which a portion of the processing target surface 3a on the sample stage side protrudes in the tilt axis direction (Y-axis direction) than does a portion of the processing target surface 3 on the mask side, so that the processing target surface 3a is irradiated with the ion beam 2 at a low angle, and projections/recesses 63 derived from a void 61 or a dissimilar material 62 are suppressed. Accordingly, it is possible to suppress generation of projections/recesses derived from a void or dissimilar material in fabrication of a cross section sample, and thus fabricate a sample cross section suitable for observation/analysis.
    Type: Application
    Filed: November 21, 2011
    Publication date: September 19, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shunya Watanabe, Mami Konomi, Hisayuki Takasu, Atsushi Kamino
  • Patent number: 7964845
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Grant
    Filed: October 20, 2008
    Date of Patent: June 21, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
  • Publication number: 20090050803
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Application
    Filed: October 20, 2008
    Publication date: February 26, 2009
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
  • Patent number: 7459683
    Abstract: There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: December 2, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Mine Araki, Shunya Watanabe, Chisato Kamiya, Mitsugu Sato, Atsushi Takane, Akinari Morikawa, Atsushi Miyaki, Toru Ishitani
  • Patent number: 7456403
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Grant
    Filed: October 3, 2005
    Date of Patent: November 25, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto
  • Publication number: 20070235645
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Application
    Filed: October 3, 2005
    Publication date: October 11, 2007
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto
  • Publication number: 20070085007
    Abstract: There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.
    Type: Application
    Filed: October 19, 2006
    Publication date: April 19, 2007
    Inventors: Mine Araki, Shunya Watanabe, Chisato Kamiya, Mitsugu Sato, Atsushi Takane, Akinari Morikawa, Atsushi Miyaki, Toru Ishitani
  • Patent number: 6963069
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: November 8, 2005
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
  • Publication number: 20040238752
    Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
    Type: Application
    Filed: January 30, 2004
    Publication date: December 2, 2004
    Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa