Patents by Inventor Shunya Watanabe
Shunya Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9443694Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.Type: GrantFiled: March 15, 2013Date of Patent: September 13, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
-
Patent number: 9355817Abstract: The sample 3 is tilted/oscillated with respect to the optical axis (Z-axis) of the ion beam 2 to repeat tilt and tilt/restoration of a processing target surface 3a of the sample 3 between a surface state in which the processing target surface 3a of the sample 3 faces a tilt axis direction (Y-axis direction) and a tilted surface state in which a portion of the processing target surface 3a on the sample stage side protrudes in the tilt axis direction (Y-axis direction) than does a portion of the processing target surface 3 on the mask side, so that the processing target surface 3a is irradiated with the ion beam 2 at a low angle, and projections/recesses 63 derived from a void 61 or a dissimilar material 62 are suppressed. Accordingly, it is possible to suppress generation of projections/recesses derived from a void or dissimilar material in fabrication of a cross section sample, and thus fabricate a sample cross section suitable for observation/analysis.Type: GrantFiled: November 21, 2011Date of Patent: May 31, 2016Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Shunya Watanabe, Mami Konomi, Hisayuki Takasu, Atsushi Kamino
-
Patent number: 9202668Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.Type: GrantFiled: October 16, 2012Date of Patent: December 1, 2015Assignee: Hitachi High-Technologies CorporationInventors: Takafumi Miwa, Yoichi Ose, Eiko Nakazawa, Mami Konomi, Shunya Watanabe, Yoshinobu Kimura, Natsuki Tsuno
-
Patent number: 9058957Abstract: A charged particle beam apparatus is provided with a parameter adjustment practice function for allowing any user to easily learn manual focus adjustment and stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.Type: GrantFiled: May 28, 2012Date of Patent: June 16, 2015Assignee: Hitachi High-Technologies CorporationInventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi
-
Publication number: 20150076348Abstract: For a novice user to easily recognize a difference between imaging results caused by a difference between observation conditions, a computer has an operation screen display observation target setting buttons for changing an observation condition for a specimen including a combination of parameter setting values of a charged particle beam apparatus. The processing unit has the operation screen display a radar chart including a characteristic, indicated by three or more incompatible items, of an observation condition for each of the observation target setting buttons. The radar chart indicates at least items of high resolution, emphasis on surface structure and emphasis on material difference.Type: ApplicationFiled: March 15, 2013Publication date: March 19, 2015Inventors: Yayoi Konishi, Mitsugu Sato, Masaki Takano, Shotaro Tamayama, Masako Nishimura, Shunya Watanabe, Mami Konomi
-
Publication number: 20140264018Abstract: The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.Type: ApplicationFiled: October 16, 2012Publication date: September 18, 2014Applicant: Hitachi High-Technologies CorporationInventors: Takafumi Miwa, Yoichi Ose, Eiko Nakazawa, Mami Konomi, Shunya Watanabe, Yoshinobu Kimura, Natsuki Tsuno
-
Publication number: 20140131590Abstract: In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology. In order to solve the above-described problem, there is provided means for practicing a focus adjustment and a stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation.Type: ApplicationFiled: May 28, 2012Publication date: May 15, 2014Inventors: Kunji Shigeto, Mitsugu Sato, Noriko Iizumi, Hiroyuki Noda, Masako Nishimura, Shunya Watanabe, Mami Konomi, Shinichi Tomita, Ryuichiro Tamochi
-
Publication number: 20130240353Abstract: The sample 3 is tilted/oscillated with respect to the optical axis (Z-axis) of the ion beam 2 to repeat tilt and tilt/restoration of a processing target surface 3a of the sample 3 between a surface state in which the processing target surface 3a of the sample 3 faces a tilt axis direction (Y-axis direction) and a tilted surface state in which a portion of the processing target surface 3a on the sample stage side protrudes in the tilt axis direction (Y-axis direction) than does a portion of the processing target surface 3 on the mask side, so that the processing target surface 3a is irradiated with the ion beam 2 at a low angle, and projections/recesses 63 derived from a void 61 or a dissimilar material 62 are suppressed. Accordingly, it is possible to suppress generation of projections/recesses derived from a void or dissimilar material in fabrication of a cross section sample, and thus fabricate a sample cross section suitable for observation/analysis.Type: ApplicationFiled: November 21, 2011Publication date: September 19, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Shunya Watanabe, Mami Konomi, Hisayuki Takasu, Atsushi Kamino
-
Patent number: 7964845Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: GrantFiled: October 20, 2008Date of Patent: June 21, 2011Assignee: Hitachi High-Technologies CorporationInventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
-
Publication number: 20090050803Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: ApplicationFiled: October 20, 2008Publication date: February 26, 2009Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
-
Patent number: 7459683Abstract: There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.Type: GrantFiled: October 19, 2006Date of Patent: December 2, 2008Assignee: Hitachi High-Technologies CorporationInventors: Mine Araki, Shunya Watanabe, Chisato Kamiya, Mitsugu Sato, Atsushi Takane, Akinari Morikawa, Atsushi Miyaki, Toru Ishitani
-
Patent number: 7456403Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: GrantFiled: October 3, 2005Date of Patent: November 25, 2008Assignee: Hitachi High-Technologies CorporationInventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto
-
Publication number: 20070235645Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: ApplicationFiled: October 3, 2005Publication date: October 11, 2007Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto
-
Publication number: 20070085007Abstract: There is disclosed a charged particle beam device which judges whether or not an image based on a dark-field signal has an appropriate atomic number contrast. Input reference information, a bright-field image or a back-scattered electron image is compared with a dark-field image, and it is judged whether or not a correlation value between them or the dark-field image has a predetermined contrast. According to such a constitution, it is possible to obtain information by which it is judged whether or not the dark-field image has an appropriate atomic number contrast.Type: ApplicationFiled: October 19, 2006Publication date: April 19, 2007Inventors: Mine Araki, Shunya Watanabe, Chisato Kamiya, Mitsugu Sato, Atsushi Takane, Akinari Morikawa, Atsushi Miyaki, Toru Ishitani
-
Patent number: 6963069Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: GrantFiled: January 30, 2004Date of Patent: November 8, 2005Assignee: Hitachi High-Technologies CorporationInventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa
-
Publication number: 20040238752Abstract: The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.Type: ApplicationFiled: January 30, 2004Publication date: December 2, 2004Inventors: Yuusuke Tanba, Mitsugu Sato, Kaname Takahashi, Shunya Watanabe, Mine Nakagawa, Atsushi Muto, Akinari Morikawa