Patents by Inventor Shuo-Chun LIN

Shuo-Chun LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240036484
    Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
    Type: Application
    Filed: December 2, 2021
    Publication date: February 1, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Timothy Dugan DAVIS, Simon Gijsbert Josephus MATHIJSSEN, Kaustuve BHATTACHARYYA, Sebastianus Adrianus GOORDEN, Armand Eugene Albert KOOLEN, Sera JEON, Shuo-Chun LIN