Patents by Inventor Shuuichi Towata

Shuuichi Towata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming thick film pattern, method for manufacturing electronic component, and photolithography photosensitive paste
    Patent number: 8298754
    Abstract: A method for forming a thick film pattern forms a thick film pattern having a large thickness, a high hardness, and a high aspect ratio and exhibiting high dimension precision and high shape precision. In the method, a photosensitive paste including an inorganic powder, a photosensitive monomer, and a photopolymerization initiator and containing substantially no polymer is applied to a support so as to form a photosensitive paste film. The resulting photosensitive paste film is subjected to an exposure treatment and, thereafter, development is conducted so as to form a predetermined thick film pattern. Alternatively, a photolithography photosensitive paste including an inorganic powder, a photosensitive monomer, a photopolymerization initiator, and a polymer is used, wherein a ratio (weight ratio) of the photosensitive monomer to a total amount of the photosensitive monomer and the polymer is about 0.86 or more.
    Type: Grant
    Filed: October 21, 2004
    Date of Patent: October 30, 2012
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Hiroyuki Kanbara, Shuuichi Towata, Michiaki Iha
  • Method for Forming Thick Film Pattern, Method for Manufacturing Electronic Component, and Photolithography Photosensitive Paste
    Publication number: 20070224534
    Abstract: A method for forming a thick film pattern forms a thick film pattern having a large thickness, a high hardness, and a high aspect ratio and exhibiting high dimension precision and high shape precision. In the method, a photosensitive paste including an inorganic powder, a photosensitive monomer, and a photopolymerization initiator and containing substantially no polymer is applied to a support so as to form a photosensitive paste film. The resulting photosensitive paste film is subjected to an exposure treatment and, thereafter, development is conducted so as to form a predetermined thick film pattern. Alternatively, a photolithography photosensitive paste including an inorganic powder, a photosensitive monomer, a photopolymerization initiator, and a polymer is used, wherein a ratio (weight ratio) of the photosensitive monomer to a total amount of the photosensitive monomer and the polymer is about 0.86 or more.
    Type: Application
    Filed: October 21, 2004
    Publication date: September 27, 2007
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Hiroyuki Kanbara, Shuuichi Towata, Michiaki Iha