Patents by Inventor Shuyao HSU

Shuyao HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11498994
    Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: November 15, 2022
    Assignees: Mitsubishi Chemical Corporation, Nanyang Technological University
    Inventors: Hiroshi Niino, Shunsuke Chatani, Shuyao Hsu, Atsushi Goto, Longqiang Xiao, Jun Jie Chang
  • Publication number: 20200377638
    Abstract: Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.
    Type: Application
    Filed: November 22, 2018
    Publication date: December 3, 2020
    Applicants: Mitsubishi Chemical Corporation, Nanyang Technological University
    Inventors: Hiroshi NIINO, Shunsuke CHATANI, Shuyao HSU, Atsushi GOTO, Longqiang XIAO, Jun Jie CHANG