Patents by Inventor Shuzo Hattori

Shuzo Hattori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5249032
    Abstract: An optical position-detecting apparatus includes an optical block capable of causing interference light having interference fringes perpendicular to a diffraction grating on a subject of measurement to be all the time projected onto the diffraction grating. The apparatus detects the position of a subject of measurement by receiving either light transmitted through a diffraction grating on said subject of measurement or light reflected from said diffraction grating. The apparatus includes an optical block for causing collimated rays generated from a coherent light source to be diffracted, for causing only the ".+-.1" order diffracted light to be extracted and to interfere with each other, and for causing an interference light field area having interference fringes perpendicular to said diffraction grating to be generated and to be projected onto said diffraction grating. Thus, it is possible, with a simple construction, to assure stable outputting of a displacement signal.
    Type: Grant
    Filed: November 5, 1991
    Date of Patent: September 28, 1993
    Assignee: Okuma Corporation
    Inventors: Keiji Matsui, Shuzo Hattori
  • Patent number: 5064711
    Abstract: A hybrid IC substrate has a substrate body and a retaining film which is formed on a surface of the substrate body. The retaining film enables a solution containing a circuit-element-forming material to permeate therethrough and retains the solution on the substrate body. The solution, which is expelled onto the hybrid IC substrate in the form of liquid drops, permeates the above-mentioned retaining film and becomes attached to the surface of the substrate body. Then, the hybrid IC substrate is baked. The retaining film is thus backed off, thereby forming a film of the circuit-element-forming material as a circuit pattern on the substrate body.
    Type: Grant
    Filed: October 17, 1989
    Date of Patent: November 12, 1991
    Assignees: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho, Shuzo Hattori
    Inventors: Takatoshi Ito, Akihiro Yoshida, Kazunori Shimazaki, Shuzo Hattori
  • Patent number: 4974227
    Abstract: A low-pressure mercury resonance radiation source includes a discharge lamp containing mercury vapor and producing broad band radiation directly emitted from the mercury vapor through excitation of same by electric discharge, and a resonance cell containing mercury vapor and disposed adjacent the discharge lamp for absorbing the broad band radiation and reemitting narrow band mercury resonance radiation. The pressure of the mercury vapor within the resonance cell is controlled to a first predetermined value by controlling the temperature of a first mercury sump arranged within the resonance cell, and the pressure of the mercury vapor within the discharge lamp is controlled to a second predetermined value, preferably by controlling the temperature of a second mercury sump arranged in a side tube communicating with the discharge lamp.
    Type: Grant
    Filed: October 16, 1989
    Date of Patent: November 27, 1990
    Assignee: Nippon Seiko Kabushiki Kaisha
    Inventors: Masahiro Saita, Dai Sugimoto, Masami Eishima, Shuzo Hattori, Yoshiyuki Uchida, George J. Collins
  • Patent number: 4937489
    Abstract: An electrostrictive actuator which comprises one or more electrostrictive elements and a rigid supporting member which may be formed of a metal plate for accommodating and supporting said electrostrictive elements, the supporting member being intended for amplification of an initial displacement of the electrostrictive elements caused by applying a voltage thereto. The actuator may be conveniently used for controlling fine angular adjustments of specimens and IC chips under microscopic scrutiny.
    Type: Grant
    Filed: September 9, 1988
    Date of Patent: June 26, 1990
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Shuzo Hattori, Naomasa Wakita, Makoto Okuda
  • Patent number: 4891242
    Abstract: A hybrid IC substrate has a substrate body and a retaining film which is formed on a surface of the substrate body. The retaining film enables a solution containing a circuit-element-forming material to permeate therethrough and retains the solution on the substrate body. The solution, which is expelled onto the hybrid IC substrate in the form of liquid drops, permeates the above-mentioned retaining film and becomes attached to the surface of the substrate body. Then, the hybrid IC substrate is baked. The retaining film is thus baked off, thereby forming a film of the circuit-element-forming material as a circuit pattern on the substrate body.
    Type: Grant
    Filed: July 1, 1987
    Date of Patent: January 2, 1990
    Assignees: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho, Shuzo Hattori
    Inventors: Takatoshi Ito, Akihiro Yoshida, Kazunori Shimazaki, Shuzo Hattori
  • Patent number: 4873709
    Abstract: An X-ray generator includes a vacuum vessel; a cathode disposed in the vacuum vessel for emitting an electron beam; a plurality of stators constituting an electric motor and disposed within the vacuum vessel for generating rotating magnetic fields; a drum-shaped anode adapted to rotate upon reception of the rotating magnetic fields generated from the stators and radiate an X-ray upon reception of the electron beam emitted from the cathode, the drum-shaped anode having a circumferentially extending narrow groove formed at the position where the electron beam from the cathode is focused; a plurality of rotary fins mounted on the drum-shaped anode for dissipating the heat generated in the groove upon radiation of an X-ray; and a plurality of fixed fins mounted within the vacuum vessel in opposed relation to the rotary fins and adapted to receive the heat transferred from the rotary fins and dissipate the heat to the outside of the vacuum vessel.
    Type: Grant
    Filed: July 18, 1988
    Date of Patent: October 10, 1989
    Assignees: Meitec Corporation, Shuzo Hattori
    Inventors: Shuzo Hattori, Takashi Tagawa, Motomu Asano
  • Patent number: 4870865
    Abstract: A first laser beam is modulated at a modulation frequency and focused on a first point in the proximity of a connection being tested so as to generate a photothermo elastic wave thereat, and a second laser beam is focused on a second point in the proximity of the connection, which second point is separated from the first point. The second laser beam is scattered at the second point. A detector detects a modulation-frequency component of the scattered second laser beam, so as to detect a propagated level at the second point of the photo-thermo elastic wave from said first point based on the detected modulation-frequency component of the scattered second laser beam. The propagation of the elastic wave depends on the strength of the connection and the detected level of the elastic wave indicates strength of the connection.
    Type: Grant
    Filed: August 24, 1988
    Date of Patent: October 3, 1989
    Assignee: Nagoya University
    Inventors: Kazuhiro Hane, Shuzo Hattori
  • Patent number: 4773218
    Abstract: A pulse-actuated hydraulic pump includes a hydraulic chamber with a bellows having a volume increased or decreased by the selective application a force in an axial direction thereof by a piezoelectric actuator. Control means control electrically-driven valves to selective discharge fluid from the bellows in precisely controllable volumes through a first pumping port or a second pumping port.
    Type: Grant
    Filed: June 18, 1986
    Date of Patent: September 27, 1988
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Naomasa Wakita, Kanji Ohya, Masatoshi Kuwata, Shuzo Hattori, Makoto Okuda
  • Patent number: 4760265
    Abstract: An inspecting method and device for inspecting an object or objects such as photomasks having a plurality of identical patterns, to detect defects of the patterns, wherein the object is placed such that the patterns lie in the same plane, and an inspection mask having a plurality of translucent apertures is placed such that the inspection mask is adjacent and parallel to the object. The inspection mask and the object are moved relative to each other whereby each aperture is positioned opposite to mutually corresponding portions of the patterns. The object and inspection mask are irradiated with rays of light emitted in a direction substantially normal to the plane of relative movements thereof. The rays of light transmitted through the apertures and the object are converted into electric signals, and the electric signals associated with the corresponding portions of the patterns are compared with each other, prior to obtaining the electric signals of all of the plurality of patterns.
    Type: Grant
    Filed: January 15, 1987
    Date of Patent: July 26, 1988
    Assignees: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho, Shuzo Hattori
    Inventors: Akihiro Yoshida, Takahide Iida, Hiroshi Miyake, Shuzo Hattori
  • Patent number: 4664524
    Abstract: An optical self-alignment system comprises a laser source, a substrate with a first diffraction grating for receiving laser beams from the laser source, a substrate with a second diffraction grating disposed within Fresnel zone of the first diffraction grating, and a photoelectric detector for detecting Fraunhofer diffraction ray of 0th order by the second diffraction grating. In order to adjust the relative position between the two substrates in orthogonal directions to the laser beams at high accuracy, the first and second diffraction gratings are provided with two groups of combined diffraction gratings so that phase difference of 180.degree. is produced in the Moire signals, maximum displacement point of Moire signal is detected with respect to relative position displacement of the diffraction gratings, and the substrates are positioned at maximum intensity displacement of two groups of the Moire signals.
    Type: Grant
    Filed: September 19, 1984
    Date of Patent: May 12, 1987
    Assignee: The President of Nagoya University
    Inventors: Shuzo Hattori, Yoshiyuki Uchida
  • Patent number: 4660941
    Abstract: A light deflection apparatus is disclosed, which comprises a tiltable member supported by point support and having a reflecting mirror surface provided at the top, and piezoelectric stacks respectively provided on perpendicular x- and y-axes intersecting at the support point and at positions spaced apart therefrom and capable of being elongated and contracted in vertical directions with application of voltage, the displaceable end of each of the piezoelectric stacks being coupled to the tiltable member to permit tilting of the reflecting mirror surface in a desired direction and to a desired extent about the support point with an elongation or contraction of the piezoelectric stacks.
    Type: Grant
    Filed: February 25, 1985
    Date of Patent: April 28, 1987
    Inventors: Shuzo Hattori, Naomasa Wakita, Makoto Okuda
  • Patent number: 4421843
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: January 6, 1983
    Date of Patent: December 20, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: 4421842
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: January 6, 1983
    Date of Patent: December 20, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: 4420835
    Abstract: A hollow cathode laser comprises a cathode body which constitutes a part of a discharge envelope. The cathode body has a cathode hole coaxial with the body. It further has three anode holes which are through holes extending parallel to the axis of the cathode body and communicating with the cathode hole through slits, respectively. Three cylindrical anodes extend respectively through the anode holes and are spaced by a given distance from the inner surfaces defining the respective anode holes. The anodes have portions which protrude through the respective slits and which are positioned flush with the inner surface defining the cathode hole in the circumferential direction thereof.
    Type: Grant
    Filed: May 28, 1981
    Date of Patent: December 13, 1983
    Assignee: Kimmon Electric Co., Ltd.
    Inventors: Shuzo Hattori, Noboru Kamide, Katsumi Tokudome, Michio Ishikawa, Yuji Hayashi
  • Patent number: 4382985
    Abstract: A process for forming a fluoroalkyl acrylate polymer film on a substrate by plasma polymerization. The fluoroalkyl acrylate polymer film has a high sensitivity to high energy rays and an excellent resolving power, and is very useful as a resist film. The plasma polymerized film of the invention has little pinholes, and is endurable to dry etching. A patterned resist film is prepared by irradiating the film with high energy rays to form a latent pattern and developing the latent pattern by either a wet process using a solvent or an oxygen or oxygen-containing gas plasma etching. Also, a pattern can be formed in the film by only electron beam irradiation. The pattern formation can be attained by electron beam delineation without development treatment.
    Type: Grant
    Filed: October 9, 1981
    Date of Patent: May 10, 1983
    Assignee: Daikin Kogyo Co., Ltd.
    Inventors: Shuzo Hattori, Shinzo Morita, Tsuneo Fujii
  • Patent number: 4283482
    Abstract: A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.
    Type: Grant
    Filed: March 25, 1980
    Date of Patent: August 11, 1981
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Shuzo Hattori, Shinzo Morita
  • Patent number: 4264206
    Abstract: This invention provides a dust particle analyzer comprising:A laser producing a light beam polarized in a first plane including said light beam;Means to convert said light beam into a cone light beam of a first small angle;Means to convey a volume of sample air containing dust particles under surveillance onto a highly illuminated region at the apex of said cone light beam;Means to collect light beams scattered forward from said dust particles in a first solid angle surrounded by the inner cone of a second small angle larger than said first small angle and the outer cone of a third small angle, the cosine of which is substantially equal to unity;Means to collect light beams scattered backward from said dust particle in a second solid angle surrounded by the inner cone of said second small angle and the outer cone of said third small angle;Means to produce a first signal which is proportional to the component of said forward scattered light beams polarized in said first plane and in said first solid angle;Mean
    Type: Grant
    Filed: January 3, 1979
    Date of Patent: April 28, 1981
    Assignee: The Kimmon Electric Co., Ltd.
    Inventor: Shuzo Hattori
  • Patent number: 4257014
    Abstract: A gas laser discharge tube comprises a discharge vessel containing a discharge gas, a rod-shaped anode, a corrugated cathode and a voltage source connected between the anode and cathode. The corrugated cathode comprises a metal hollow cylinder arranged coaxially with the optical axis of the laser and a plurality of metal discs arranged coaxially with the optical axis of the laser at regular intervals in the axial direction of the metal hollow cylinder. The discs have their peripheries secured to the inner periphery of the metal hollow cylinder. Each disc has a central hole and another hole through which the anode extends parallel to the optical axis of the laser.
    Type: Grant
    Filed: December 6, 1978
    Date of Patent: March 17, 1981
    Assignee: Kimmon Electric Co., Ltd.
    Inventors: Shuzo Hattori, Noboru Kamide, Katumi Tokudome, Michio Ishikawa, Yuzi Hayashi
  • Patent number: 4232274
    Abstract: A metal vapor laser discharge system includes a metal vapor laser and its associated circuit. The metal vapor laser discharge system is provided with a laser vessel which includes a discharge narrow tube filled with ionizable helium gas, the Brewster windows attached to both ends of the laser discharge narrow tube, and cathode and anode electrodes disposed in two branch tubes communicating with the discharge narrow tube. A metal reservoir is provided near the anode electrode and metal such as cadmium (Cd) is placed in the metal receiver. A helium supplemental container is coupled with the laser discharge narrow tube, through a helium passing wall. A high voltage circuit is connected between the anode and cathode electrodes. A heater provided around the metal reservoir is connected to a metal vapor supply circuit which controls current supplied to the heater to maintain the concentration of the ionizable metal vapor in the discharge narrow tube constant in the laser discharge narrow tube.
    Type: Grant
    Filed: May 30, 1978
    Date of Patent: November 4, 1980
    Assignee: Kimmon Electric Co., Ltd.
    Inventors: Katumi Tokudome, Michio Ishikawa, Shuzo Hattori
  • Patent number: 4075516
    Abstract: In a bulk piezoelectric crystal an arbitrary wavefront of an acoustic wave is reconstructed from an array of wavelets generated subjacent a set of interdigital electrodes on a surface of the crystal.
    Type: Grant
    Filed: May 20, 1976
    Date of Patent: February 21, 1978
    Assignee: Hagiwara Denki Kabushiki Kaisha
    Inventors: Shuzo Hattori, Tadao Hiramatsu