Patents by Inventor Shuzo Ohshio

Shuzo Ohshio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern forming method employing electron beam lithography
    Patent number: 4968583
    Abstract: Multilayer resist materials containing a lowermost layer having a high resistance to dry etching and made from polymers or copolymers of haloalkylated aromatic vinyl compound possessing a molecular weight and haloalkylation degree sufficient not to cause charging up therein during electron beam exposure, and pattern forming methods using these materials. According to the present invention, fine resist patterns with a high resistance to dry etching and high accuracy and suitable for the production of semiconductor devices can be produced.
    Type: Grant
    Filed: October 31, 1988
    Date of Patent: November 6, 1990
    Assignee: Fujitsu Limited
    Inventors: Shuzo Ohshio, Koichi Kobayashi