Patents by Inventor Shuzo Waki

Shuzo Waki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11569508
    Abstract: Provided are a binder resin for an electrode of a lithium secondary battery containing a solvent-soluble polyimide having a repeating unit represented by the following Formula [I], and a method of producing the binder resin for an electrode. (In the formula, Z represents an aromatic or alicyclic tetracarboxylic dianhydride residue, and Ar is an aromatic diamine residue having a carboxyl group and an aromatic diamine residue having an aromatic ether bond, or an aromatic diamine residue having a phenylindan structure).
    Type: Grant
    Filed: February 1, 2016
    Date of Patent: January 31, 2023
    Assignees: PI R&D CO., LTD., TOP MATERIAL CO., LTD.
    Inventors: Tetsuaki Suzuki, Shuzo Waki, Whan Jin Roh, Seung Joon Hong
  • Publication number: 20180034057
    Abstract: Provided are a binder resin for an electrode of a lithium secondary battery containing a solvent-soluble polyimide having a repeating unit represented by the following Formula [I], and a method of producing the binder resin for an electrode.
    Type: Application
    Filed: February 1, 2016
    Publication date: February 1, 2018
    Applicants: PI R&D CO., LTD., TOP BATTERY CO., LTD.
    Inventors: Tetsuaki SUZUKI, Shuzo WAKI, Whan Jin ROH, Seung Joon HONG
  • Patent number: 8349537
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: January 8, 2013
    Assignee: PI R&D Co., Ltd.
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
  • Publication number: 20110111351
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Application
    Filed: January 14, 2011
    Publication date: May 12, 2011
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki
  • Publication number: 20090267239
    Abstract: A photosensitive resin composition comprising parts by mass of polycondensate (A) having a structure resulting from dehydration condensation between one or two or more tetracarboxylic acid dianhydride and one or two or more armatic diamines having mutually ortho-positioned amino and phenolic hydroxyl groups and 1 to 100 parts by mass of photosensitive diazonaphthoquinone compound (B), wherein the polycondensate (A) has a weight average molecular weight of 3000 to 70,000.
    Type: Application
    Filed: September 1, 2006
    Publication date: October 29, 2009
    Applicants: ASAHI KASEI EMD CORPORATION, PI R&D CO., LTD.
    Inventors: Takayuki Kanada, Hiroyuki Hanahata, Xingzhou Jin, Shuzo Waki
  • Publication number: 20090186295
    Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
    Type: Application
    Filed: March 2, 2007
    Publication date: July 23, 2009
    Inventors: Maw Soe Win, Toshiyuki Goshima, Sigemasa Segawa, Shintaro Nakajima, Eika Kyo, Yoshikazu Nishikawa, Shuzo Waki