Patents by Inventor Si Wen LIN

Si Wen LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11508648
    Abstract: Techniques directed to forming and using coupling mechanisms for substrates, semiconductor packages, and/or printed circuit boards are described. One technique includes forming a substrate (205) comprising: first and second interconnect pads (213A, 213B) in or on a build-up layer (203); and first and second interconnects (211A, 211B) on the first and second interconnect pads (213A, 213B). The first interconnect pad (213A) can be located at a lower position than the second interconnect pad (213B) with regard to a z-position. The techniques described herein can assist with minimizing or eliminating solder ball bridge defects (SBBDs) that may be creating during performance of coupling technique (e.g., a reflow process, etc.).
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: November 22, 2022
    Assignee: Intel Corporation
    Inventor: Si Wen Lin
  • Publication number: 20210118785
    Abstract: Techniques directed to forming and using coupling mechanisms for substrates, semiconductor packages, and/or printed circuit boards are described. One technique includes forming a substrate (205) comprising: first and second interconnect pads (213A, 213B) in or on a build-up layer (203); and first and second interconnects (211A, 211B) on the first and second interconnect pads (213A, 213B). The first interconnect pad (213A) can be located at a lower position than the second interconnect pad (213B) with regard to a z-position. The techniques described herein can assist with minimizing or eliminating solder ball bridge defects (SBBDs) that may be creating during performance of coupling technique (e.g., a reflow process, etc.).
    Type: Application
    Filed: June 29, 2018
    Publication date: April 22, 2021
    Inventor: Si Wen LIN
  • Publication number: 20210057323
    Abstract: Systems, apparatuses, processing (1400), and techniques related to applying a plurality of grooves in a portion of a surface of a first substrate (1402) and coupling a surface of a second substrate to the surface of the first substrate, wherein a selected design of the grooves is to facilitate a flow of a material to fill a volume between the first substrate surface and a second substrate surface (1404).
    Type: Application
    Filed: September 28, 2018
    Publication date: February 25, 2021
    Inventor: Si Wen LIN