Patents by Inventor Si-Yi Yi Li

Si-Yi Yi Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Atomic layer deposition and etch for reducing roughness
    Patent number: 11170997
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: November 9, 2021
    Assignee: Lam Research Corporation
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
    Publication number: 20200243326
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Application
    Filed: April 10, 2020
    Publication date: July 30, 2020
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • Atomic layer deposition and etch for reducing roughness
    Patent number: 10658174
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: May 19, 2020
    Assignee: Lam Research Corporation
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya
  • ATOMIC LAYER DEPOSITION AND ETCH FOR REDUCING ROUGHNESS
    Publication number: 20190157066
    Abstract: Methods and apparatuses for reducing roughness using integrated atomic layer deposition (ALD) and etch processes are described herein. In some implementations, after a mask is provided on a substrate, methods include depositing a conformal layer on the mask by ALD to reduce roughness and etching a layer underlying the mask to form patterned features having a reduced roughness. In some implementations, after a substrate is etched to a first depth to form features at the first depth in the substrate, methods include depositing a conformal layer by ALD on sidewalls of the features to protect sidewalls and reduce roughness during a subsequent etch process. The ALD and etch processes may be performed in a plasma chamber.
    Type: Application
    Filed: November 21, 2017
    Publication date: May 23, 2019
    Inventors: Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si-Yi Yi Li, Kazi Sultana, Radhika Mani, Duming Zhang, Haseeb Kazi, Chen Xu, Mitchell Brooks, Ganesh Upadhyaya