Patents by Inventor Sia Tan
Sia Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230231070Abstract: An isolation system and isolation device are disclosed. An illustrative isolation device is disclosed to include a transmitter circuit to generate a first current in accordance with a first signal, a first elongated conducting element to generate a magnetic field when the first current flows through the first elongated conducting element, a second elongated conducting element adjacent to the first elongated conducting element so as to receive the magnetic field. The second elongated conducting element is configured to generate an induced current when the magnetic field is received. The receiver circuit is configured to receive the induced current as an input, and configured to generate a reproduced first signal as an output of the receiver circuit.Type: ApplicationFiled: March 29, 2023Publication date: July 20, 2023Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Patent number: 11621364Abstract: An isolation system and isolation device are disclosed. An illustrative isolation device is disclosed to include a transmitter circuit, a detector circuit, a first wire bond, and a second wire bond. The detector circuit is configured to generate a first current in accordance with a first signal. The first wire bond is configured to receive the first current from the transmitter circuit to generate a magnetic flux. The second wire bond is configured to receive the magnetic flux. An induced current in the second wire bond is then detected in the detector circuit. The detector circuit is configured to generate a reproduced first signal, as an output of the detector circuit.Type: GrantFiled: July 22, 2020Date of Patent: April 4, 2023Assignee: MPICS INNOVATIONS PTE. LTDInventors: Kok Keong Richard Lum, Hong Sia Tan
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Publication number: 20220375327Abstract: Devices and methods for detecting a disinfecting state are described. An example of a sensor device is disclosed to include: a housing; a radiation sensitive material disposed on one or more portions of an external surface of the housing; a sensor configured to measure intensity information associated with ultraviolet (UV) radiation of a first frequency band; a controller configured to record the intensity information, temporal information associated with measuring the intensity information, or both; and a transceiver device configured to transmit and receive radio frequency (RF) signals.Type: ApplicationFiled: June 14, 2022Publication date: November 24, 2022Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Publication number: 20220370670Abstract: Disinfecting systems, methods, and devices are described. An example of a disinfecting system is disclosed to include: a radiation source configured to emit a disinfecting radiation; a source wireless communication device coupled to the radiation source; a plurality of receiver wireless communication devices; and a plurality of disinfecting radiation sensors configured to detect the disinfecting radiation, wherein each of the plurality of disinfecting radiation sensors is configured to record an intensity level information of the disinfecting radiation and configured to transmit the intensity level information through one of the plurality of receiver wireless communication devices to a center controller.Type: ApplicationFiled: May 24, 2021Publication date: November 24, 2022Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Publication number: 20220375324Abstract: Devices and methods for detecting a disinfecting state are described. An example of a sensor device is disclosed to include: a housing; a radiation sensitive material disposed on one or more portions of an external surface of the housing; a sensor configured to measure intensity information associated with ultraviolet (UV) radiation of a first frequency band; a controller configured to record the intensity information, temporal information associated with measuring the intensity information, or both; and a transceiver device configured to transmit and receive radio frequency (RF) signals.Type: ApplicationFiled: May 24, 2021Publication date: November 24, 2022Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Publication number: 20220375325Abstract: Devices and methods for detecting a disinfecting state are described. An example of a sensor device is disclosed to include: a housing; a radiation sensitive material disposed on one or more portions of an external surface of the housing; a sensor configured to measure intensity information associated with ultraviolet (UV) radiation of a first frequency band; a controller configured to record the intensity information, temporal information associated with measuring the intensity information, or both; and a transceiver device configured to transmit and receive radio frequency (RF) signals.Type: ApplicationFiled: July 14, 2021Publication date: November 24, 2022Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Publication number: 20220029043Abstract: An isolation system and isolation device are disclosed. An illustrative isolation device is disclosed to include a transmitter circuit, a detector circuit, a first wire bond, and a second wire bond. The detector circuit is configured to generate a first current in accordance with a first signal. The first wire bond is configured to receive the first current from the transmitter circuit to generate a magnetic flux. The second wire bond is configured to receive the magnetic flux. An induced current in the second wire bond is then detected in the detector circuit. The detector circuit is configured to generate a reproduced first signal, as an output of the detector circuit.Type: ApplicationFiled: July 22, 2020Publication date: January 27, 2022Inventors: Kok Keong Richard LUM, Hong Sia TAN
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Publication number: 20130170936Abstract: Various embodiments of methods and devices are provided for a self-aligning pick and place collet having proximal and distal ends configured for use with a tape and reel machine. A suction area is located at a distal end of the collet. A pick and place collet contact area is located adjacent to and outwardly from the suction area, and comprises tapered sidewalls that depend downwardly and outwardly away from the outer periphery of the suction area. The tapered sidewalls and the outer periphery of the suction area are configured and dimensioned to cause an electronic device to substantially self-align and center itself with respect to the collet when engaged thereby.Type: ApplicationFiled: January 3, 2012Publication date: July 4, 2013Applicant: Avago Technologies ECBU IP (Singapore) Pte. Ltd.Inventors: Hong Sia Tan, Chee Mang Wong, Yik Loong Leong
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Patent number: 8183883Abstract: A memory configuration circuit is provided. The memory configuration circuit may be integrated into a programmable logic device (PLD) and as such, may be used to configure and reconfigure specific elements in the PLD. The memory configuration circuit includes a comparator circuit and a counter. The comparator circuit is coupled to receive two data words from two different memory configuration sources. The comparator circuit compares the two data words received before writing one of the data words to a configuration memory. One of the data words may be written to the configuration memory if the two data words compared are not equal. The counter increments the address of the memory configuration sources so that a next data word can be processed after the current data word is processed.Type: GrantFiled: April 16, 2010Date of Patent: May 22, 2012Assignee: Altera CorporationInventors: Chee Seng Tan, Chai Sia Tan, Elden Chau, John Tse, Neville Carvalho
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Patent number: 7736070Abstract: Double mold opto-coupler and method for manufacture. A first subassembly is formed that includes a light detector. The first subassembly is molded with a first mold material to form a molded first subassembly. A light source is attached to the molded first sub-assembly to form a second sub-assembly. The second sub-assembly is molded with a second mold material to form a final assembly with predetermined dimensions.Type: GrantFiled: August 31, 2005Date of Patent: June 15, 2010Assignee: Avago Technologies ECBU IP (Singapore) Pte. Ltd.Inventors: Soo Kiang Ho, Hong Sia Tan, Thiam Siew Gary Tay
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Publication number: 20070128527Abstract: A method and structure for a phase shift mask having a light reducing layer with sloped sidewalls. In some embodiments, the sloped sidewalls can help improve the image imbalance. The mask comprising: a substrate having a first region, a second region and a third region; the third region position between the first region and the second regions; an light reducing layer over the substrate having a first opening over the first region and a second opening over the second region; the first opening and the second opening defined by light reducing layer sidewalls; the sidewalls of the opaque layer are slanted at an angle less than 90 degrees with the plane of the top surface of the substrate.Type: ApplicationFiled: December 7, 2005Publication date: June 7, 2007Inventors: Gek Chua, Sia Tan, Qunying Lin, Cho Tay, Chenggen Quan
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Patent number: 7146011Abstract: Apparatus is disclosed for steering a directional audio beam that is self-demodulated from an ultrasound carrier. The apparatus includes means for modulating a carrier signal with an audio signal and means for adjusting the amplitude and phase of at least one of the audio signal and/or the carrier signal to steer the audio beam to a desired direction. The apparatus also includes means for generating an ultrasound beam in the desired direction driven by the modulated carrier signal. The apparatus may include means for weighting the audio and/or carrier signal by a zeroth order Bessel function to synthesize a Bessel distribution source. A corresponding method for steering a directional audio beam is also disclosed. A harmonic generator may be used to generate harmonics of low frequencies in the audio signal. The harmonics may provide (upon demodulation) a psycho-acoustic impression of improved perception of low frequencies.Type: GrantFiled: February 28, 2004Date of Patent: December 5, 2006Assignee: Nanyang Technological UniversityInventors: Jun Yang, Woon Seng Gan, Meng Hwa Er, Chee Mun Kelvin Lee, Khim Sia Tan, Yew Hin Liew, Furi Andi Karnapi, Kan Sha, Yi Wang
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Publication number: 20060105520Abstract: Methods and structures for optical masks that have a liner on the trench sidewalls. An example embodiment comprises a mask structure for use with light at a wavelength comprising: a substrate having a first region, a second region and a third region; a first trench in the first region; a first region having a first thickness of a first material, the first material having a first amount of transmission of light at the wavelength, the second region having a second thickness of the first material, such that the second thickness is greater than the first thickness by a first difference, the first difference being equivalent to a phase shift of 180 degrees at the wavelength, and a third region located on the substrate, the third region having a third thickness of the first material, such that the third thickness is equal to or greater than the second thickness; a liner on the sidewalls of the trench. The liner reduces the reflections from the trench sidewall.Type: ApplicationFiled: November 18, 2004Publication date: May 18, 2006Inventors: Sia Tan, Qun Lin, Liang Hsia
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Publication number: 20060099518Abstract: A embodiment method for forming a layout for a phase shift mask. A embodiment comprises providing a layout comprising a first feature, a first shifter region and a second shifter region. The first feature preferably has a L-shape portion with an elbow region. The first shifter region is on the outside of the L-shaped portion and the second shifter region is on the inside of the L-shaped portion. The elbow region has an outside corner away from the second shifter region. We identify a phase conflict region caused by the L-shaped portion of the first feature, the first shifter region and the second shifter region. We resolve the phase conflict by modifying the elbow region by moving the outside corner of the elbow region away from the first shifter region and the phase conflict region. The modification of the elbow region further comprises forming a jog region in the line end section of the first feature.Type: ApplicationFiled: November 10, 2004Publication date: May 11, 2006Inventors: Sia Tan, Qunying Lin, Liang-Choo Hsia
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Publication number: 20060088771Abstract: A method for fabricating a phase shift mask is provided. A trenched phase shift mask having portions of a light-blocking layer thereon is formed. A layer of anti-reflective material is then formed on the trenched phase shift mask and the portions of the light-blocking layer. The anti-reflective material is then removed on horizontal surfaces of the trenched phase shift mask and of the portions of the light-blocking layer.Type: ApplicationFiled: October 25, 2004Publication date: April 27, 2006Applicant: Chartered Semiconductor Manufacturing, Ltd.Inventors: Sia Tan, Qunying Lin, Liang-Choo Hsia
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Publication number: 20060088770Abstract: A method for forming a contact hole unit cell is provided. A light transparent contact hole region of a first phase is positioned at a first plane. A light transparent phase-shifting region of a second phase is positioned at the first plane, the second phase being substantially out of phase with the first phase. The phase-shifting region substantially surrounds the contact hole region. A light transparent border region is positioned at the first plane outside and substantially surrounding the phase-shifting region. The border region has a phase substantially the same as that of the contact hole region. The contact hole region, the phase-shifting region, and the border region are positioned to cause light from the first plane to be reinforcing in a target contact hole configuration on a second plane and to be substantially neutralizing outside the target contact hole configuration on the second plane.Type: ApplicationFiled: October 25, 2004Publication date: April 27, 2006Applicant: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.Inventors: Soon Tan, Sia Tan, Qunying Lin, Huey Chong, Liang-Choo Hsia
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Publication number: 20060083994Abstract: A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation at a second plane to be neutralized in a first region, not to be neutralized in a second region, and to have a side lobe in a third region. Further, positioning a non-transparent region at the first plane to assure radiation at the second plane to be neutralized in the first region and positioning a third radiation transparent region of the first or second phase at the first plane to neutralize the side lobes in the third region at the second plane.Type: ApplicationFiled: October 20, 2004Publication date: April 20, 2006Applicant: Chartered Semiconductor manufacturing , Ltd.Inventors: Sia Tan, Soon Tan, Qunying Lin, Huey Chong, Liang-Choo Hsia
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Publication number: 20050089763Abstract: A reticle structure and a method of forming a photoresist profile on a substrate using the reticle having a multi-level profile. The reticle comprises (1) a transparent substrate, (2) a partially transmitting 180 degree phase shift film overlying predetermined areas of the transparent substrate to transmit approximately 20 to 70% of incident light, and (3) an opaque film overlying the predetermined areas of the partially transmitting 180 degree phase shift film. The method comprises the following steps: a) depositing a photoresist film over the substrate; b) directing light to the photoresist film through the reticle, and c) developing the photoresist film to form an opening in the resist layer where light only passed thru the substrate, and to remove intermediate thickness of the photoresist film, in the areas where the light passed through the partially transmitting 180 degree phase shift film. In an aspect, the photoresist film is comprised of a lower photoresist layer and an upper photoresist layer.Type: ApplicationFiled: October 24, 2003Publication date: April 28, 2005Inventors: Sia Tan, Qun Lin, Soon Tan, Huey Chong
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Publication number: 20050058912Abstract: A structure, a method of fabricating and a method of using a phase shift mask (PSM) having a first phase shifted section, a half tone section, and a second phase shifted section. The first phase shift section and the half tone section are shifted 180 degrees with the second phase shift region. Embodiments provide for (1) a half tone, single trench alternating phase shift mask and (2) a half tone, dual trench alternating phase shift mask. The half tone region provides advantages over conventional alternating phase shift masks.Type: ApplicationFiled: September 13, 2003Publication date: March 17, 2005Inventors: Qun Lin, Sia Tan, Soon Tan, Huey Chong
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Publication number: 20040264707Abstract: Apparatus is disclosed for steering a directional audio beam that is self-demodulated from an ultrasound carrier. The apparatus includes means for modulating a carrier signal with an audio signal and means for adjusting the amplitude and phase of at least one of the audio signal and/or the carrier signal to steer the audio beam to a desired direction. The apparatus also includes means for generating an ultrasound beam in the desired direction driven by the modulated carrier signal. The apparatus may include means for weighting the audio and/or carrier signal by a zeroth order Bessel function to synthesize a Bessel distribution source. A corresponding method for steering a directional audio beam is also disclosed. A harmonic generator may be used to generate harmonics of low frequencies in the audio signal. The harmonics may provide (upon demodulation) a psycho-acoustic impression of improved perception of low frequencies.Type: ApplicationFiled: February 28, 2004Publication date: December 30, 2004Inventors: Jun Yang, Woon Seng Gan, Meng Hwa Er, Chee Mun Kelvin Lee, Khim Sia Tan, Yew Hin Liew, Furi Andi Karnapi, Kan Sha, Yi Wang