Patents by Inventor Sicco Ian Schets

Sicco Ian Schets has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8139217
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: March 20, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Publication number: 20110128520
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Application
    Filed: December 23, 2010
    Publication date: June 2, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7880880
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7565219
    Abstract: A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: July 21, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Jeroen Huijbregstse, Sicco Ian Schets, Bart Luc Swinnen
  • Patent number: 7558643
    Abstract: A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object may include a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
    Type: Grant
    Filed: December 9, 2004
    Date of Patent: July 7, 2009
    Assignees: ASML Netherlands B.V., IMEC v.z.w.
    Inventors: Maurits Van Der Schaar, Jeroen Huijbregtse, Sicco Ian Schets, Bart Luc Swinnen
  • Patent number: 7439531
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: October 21, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7332732
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: February 19, 2008
    Assignee: ASML Netherlands, B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7329888
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: February 12, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7297971
    Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: November 20, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse, Andre Bernardus Jeunink, Henry Megens, Ramon Navarro Y Koren, Hoite Pieter Theodoor Tolsma, Hubertus Johannes Gertrudus Simons, Johny Rutger Schuurhuis, Sicco Ian Schets, Brian Young Bok Lee, Allan Reuben Dunbar
  • Patent number: 7288779
    Abstract: A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: October 30, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Sicco Ian Schets, Jeroen Huijbregstse, Allan Reuben Dunbar, Nicolaas Petrus Van Der Aa