Patents by Inventor Sicco OOSTERHOFF

Sicco OOSTERHOFF has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10852633
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: December 1, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Sicco Oosterhoff, Paul Janssen, Beatrijs Louise Marie-Joseph Katrien Verbrugge
  • Patent number: 10712656
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Zomer Silvester Houweling, Eric Willem Felix Casimiri, Tamara Druzhinina, Paul Janssen, Michael Alfred Josephus Kuijken, Martinus Hendrikus Antonius Leenders, Sicco Oosterhoff, Mária Péter, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen
  • Publication number: 20180321603
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
    Type: Application
    Filed: October 25, 2016
    Publication date: November 8, 2018
    Applicant: ASML NETHERLAND B.V.
    Inventors: Sicco OOSTERHOFF, Paul JANSSEN, Beltrijs Louise Marie-Joseph Katrie VERBRUGGE
  • Publication number: 20180239240
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
    Type: Application
    Filed: August 26, 2016
    Publication date: August 23, 2018
    Inventors: Zomer Silvester HOUWELING, Eric Willem Felix CASIMIRI, Tamara DRUZHININA, JANSSEN Paul, Michael Alfred Josephus KUIJKEN, Martinus Hendrikus Antonius LEENDERS, Sicco OOSTERHOFF, Mária PÉTER, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Beatrijs Louise Marie-Joseph Katrie VERBRUGGE, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN