Patents by Inventor Sichen MI

Sichen MI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • NON-CONTACT POLISHING OF A CRYSTALLINE LAYER OR SUBSTRATE BY ION BEAM ETCHING
    Publication number: 20220275533
    Abstract: Polishing method comprising the steps of: —providing at least one crystalline layer or substrate, the at least one crystalline layer or substrate extending in at least one plane, and including at least one outer surface and at least one depression extending from the at least one outer surface; and —polishing the at least one outer surface using ion beam etching (IBE) or an accelerated inert gas ion beam, the ion beam being incident on the at least one outer surface at non-normal incidence or at a non-zero angle (?) with respect to the surface normal of the at least one plane of the crystalline layer or substrate.
    Type: Application
    Filed: July 26, 2019
    Publication date: September 1, 2022
    Inventors: Niels QUACK, Sichen MI, Teodoro GRAZIOSI, Adrien TOROS