Patents by Inventor Siddharth Mohapatra

Siddharth Mohapatra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7858513
    Abstract: A low-cost and efficient process produces self-aligned vias in dielectric polymer films that provides electrical connection between a top conductor and a bottom conductor. The process is achieved by printing conductive posts on the first patterned conductive layer, followed by the deposition of an unpatterned layer dielectric, followed by the deposition of a second patterned conductive layer. The vias are formed during the flash annealing of the post after the dielectric is deposited, but before the second conductive layer is deposited. In this process, the post material is annealed with a flash of light, resulting in a release of energy which removes the dielectric on the top of the post.
    Type: Grant
    Filed: June 18, 2007
    Date of Patent: December 28, 2010
    Assignee: OrganicID, Inc.
    Inventors: Siddharth Mohapatra, Klaus Dimmler, Patrick H Jenkins
  • Publication number: 20090239333
    Abstract: A low-cost and efficient process producing improved organic electronic devices such as transistors that may be used in a variety of applications is described. The applications may include radio frequency identification (RFID) devices, displays and the like. In one embodiment, the improved process is implemented by flash annealing a substrate with an energy having wavelengths ranging from about 250 nm to about 1100 nm or higher. In this flash annealing process energy having wavelengths from about 250 nm to about 350 nm or higher is substantially prevented from irradiating the substrate.
    Type: Application
    Filed: December 26, 2007
    Publication date: September 24, 2009
    Applicant: Weyerhaeuser Co.
    Inventors: Siddharth Mohapatra, Robert P. Wenz
  • Publication number: 20080311698
    Abstract: A low-cost and efficient process produces self-aligned vias in dielectric polymer films that provides electrical connection between a top conductor and a bottom conductor. The process is achieved by printing conductive posts on the first patterned conductive layer, followed by the deposition of an unpatterned layer dielectric, followed by the deposition of a second patterned conductive layer. The vias are formed during the flash annealing of the post after the dielectric is deposited, but before the second conductive layer is deposited. In this process, the post material is annealed with a flash of light, resulting in a release of energy which removes the dielectric on the top of the post.
    Type: Application
    Filed: June 18, 2007
    Publication date: December 18, 2008
    Applicant: Weyerhaeuser Co.
    Inventors: Siddharth Mohapatra, Klaus Dimmler, Patrick H. Jenkins