Patents by Inventor Sidi Lanee

Sidi Lanee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for nanoscale feature imprint molding
    Patent number: 7736954
    Abstract: Methods for fabricating nanoscale features are disclosed. One technique involves depositing onto a substrate, where the first layer may be a silicon layer and may subsequently be etched. A second layer and third layer may be deposited on the etch first layer, followed by the deposition of a silicon cap. The second and third layer may be etched, exposing edges of the second and third layers. The cap and first layer may be removed and either the second or third layer may be etched, creating a nanoscale pattern.
    Type: Grant
    Filed: August 28, 2006
    Date of Patent: June 15, 2010
    Assignee: Sematech, Inc.
    Inventors: Muhammad Mustafa Hussain, Naim Moumen, Gabriel Gebara, Ed Labelle, Sidi Lanee, Barry Sassman, Raj Jammy
  • Methods for Nanoscale Feature Imprint Molding
    Publication number: 20100081278
    Abstract: Methods for fabricating nanoscale features are disclosed. One technique involves depositing onto a substrate, where the first layer may be a silicon layer and may subsequently be etched. A second layer and third layer may be deposited on the etch first layer, followed by the deposition of a silicon cap. The second and third layer may be etched, exposing edges of the second and third layers. The cap and first layer may be removed and either the second or third layer may be etched, creating a nanoscale pattern.
    Type: Application
    Filed: August 28, 2006
    Publication date: April 1, 2010
    Inventors: Muhammad Mustafa Hussain, Naim Moumen, Gabriel Gebara, Ed Labelle, Sidi Lanee, Barry Sassman, Raj Jammy