Patents by Inventor Siebe Landheer
Siebe Landheer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11774869Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.Type: GrantFiled: January 17, 2020Date of Patent: October 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Ruud Hendrikus Martinus Johannes Bloks, Hendrik Cornelis Anton Borger, Frederik Eduard De Jong, Johan Gertrudis Cornelis Kunnen, Siebe Landheer, Chung-Hsun Li, Patricius Jacobus Neefs, Georgios Tsirogiannis, Si-Han Zeng
-
Publication number: 20220171299Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.Type: ApplicationFiled: January 17, 2020Publication date: June 2, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Ruud Hendrikus Martinus Johannes BLOKS, Hendrik Cornelis Anton BORGER, Frederik Eduard DE JONG, Johan Gertrudis Cornelis KUNNEN, Siebe LANDHEER, Chung-Hsun LI, Patricius Jacobus NEEFS, Georgios TSIROGIANNIS, Si-Han ZENG
-
Patent number: 10429741Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: November 19, 2018Date of Patent: October 1, 2019Assignee: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20190086814Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: November 19, 2018Publication date: March 21, 2019Applicant: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Patent number: 10151984Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: October 30, 2015Date of Patent: December 11, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Patent number: 10146139Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: GrantFiled: June 14, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Patent number: 10088755Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: GrantFiled: June 19, 2017Date of Patent: October 2, 2018Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen
-
Publication number: 20170285487Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: ApplicationFiled: June 14, 2017Publication date: October 5, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes THOMAS, Siebe LANDHEER, Arnout Johannes MEESTER, Marcio Alexandre Cano MIRANDA, Gheorghe TANASA
-
Publication number: 20170285489Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: ApplicationFiled: June 19, 2017Publication date: October 5, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Siebe LANDHEER, Marcel BECKERS, Jeroen Peter Johannes BRUIJSTENS, Ivo Adam Johannes THOMAS, Franciscus Johannes Joseph JANSSEN
-
Patent number: 9715179Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: GrantFiled: November 5, 2015Date of Patent: July 25, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen
-
Patent number: 9709901Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: GrantFiled: December 30, 2014Date of Patent: July 18, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Publication number: 20160124319Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: October 30, 2015Publication date: May 5, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20160054647Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: ApplicationFiled: November 5, 2015Publication date: February 25, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Siebe LANDHEER, Marcel BECKERS, Jeroen Peter Johannes BRUIJSTENS, Ivo Adam Johannes THOMAS, Franciscus Johannes Joseph JANSSEN
-
Patent number: 9182678Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: GrantFiled: July 6, 2012Date of Patent: November 10, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen
-
Patent number: 9176371Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: September 15, 2009Date of Patent: November 3, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
-
Publication number: 20150109592Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: ApplicationFiled: December 30, 2014Publication date: April 23, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Ivo Adam Johannes THOMAS, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Patent number: 8928857Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.Type: GrantFiled: April 29, 2010Date of Patent: January 6, 2015Assignee: ASML Netherlands B.V.Inventors: Ivo Adam Johannes Thomas, Siebe Landheer, Arnout Johannes Meester, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Patent number: 8730447Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.Type: GrantFiled: September 15, 2009Date of Patent: May 20, 2014Assignee: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
-
Patent number: 8462314Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.Type: GrantFiled: August 1, 2008Date of Patent: June 11, 2013Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maria Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle
-
Patent number: 8451423Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.Type: GrantFiled: June 17, 2009Date of Patent: May 28, 2013Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Siebe Landheer, Yücel Kök, Marcel Beckers, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda