Patents by Inventor Siegfried Alexander TROMP
Siegfried Alexander TROMP has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11898601Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: GrantFiled: August 20, 2021Date of Patent: February 13, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Patent number: 11860552Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.Type: GrantFiled: June 12, 2017Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan Janssens, Bert Dirk Scholten, Sjoerd Nicolaas Lambertus Donders, Teunis Van Dam, Peter Mark Overschie, Theresa Mary Spaan-Burke, Siegfried Alexander Tromp
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Publication number: 20230260820Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: ApplicationFiled: April 24, 2023Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
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Patent number: 11664264Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: GrantFiled: December 22, 2016Date of Patent: May 30, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robby Franciscus Josephus Martens, Youssef Karel Maria De Vos, Ringo Petrus Cornelis Van Dorst, Gerhard Albert Ten Brinke, Dirk Jerome Andre Senden, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Jelmer Mattheüs Kamminga, Evelyn Wallis Pacitti, Thomas Poiesz, Arie Cornelis Scheiberlich, Bert Dirk Scholten, André Schreuder, Abraham Alexander Soethoudt, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver
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Publication number: 20230075771Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.Type: ApplicationFiled: January 25, 2021Publication date: March 9, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Coen Hubertus Matheus BALTIS, Nicolaas TEN KATE, Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN, Siegfried Alexander TROMP, Frank Pieter Albert VAN DEN BERKMORTEL, Niek Jacobus Johannes ROSET, Gijs KRAMER, Nicolaas Petrus Marcus BRANTJES, Michiel Theodorus Jacobus FONTEYN
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Patent number: 11579533Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: GrantFiled: January 18, 2021Date of Patent: February 14, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Coen Hubertus Matheus Baltis, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Daan Daniel Johannes Antonius Van Sommeren, Mark Johannes Hermanus Frencken
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Publication number: 20230004092Abstract: Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.Type: ApplicationFiled: November 20, 2020Publication date: January 5, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Michael Marinus Anna STEUR, Nicolaas TEN KATE, Siegfried Alexander TROMP, Koen Gerhardus WINKELS, Antonius Franciscus Johanne DE GROOT
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Patent number: 11385547Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: May 21, 2020Date of Patent: July 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20210381548Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: ApplicationFiled: August 20, 2021Publication date: December 9, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL
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Patent number: 11098759Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: GrantFiled: January 6, 2020Date of Patent: August 24, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Publication number: 20210141312Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: ApplicationFiled: January 18, 2021Publication date: May 13, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Günes NAKIBOGLU, Coen Hubertus Matheus BALTIS, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Daan Daniel Johannes Antonius VAN SOMMERE, Mark Johannes Hermanus FRENCKEN
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Patent number: 10895808Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: GrantFiled: November 2, 2016Date of Patent: January 19, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Coen Hubertus Matheus Baltis, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Daan Daniel Johannes Antonius Van Sommeren, Mark Johannes Hermanus Frencken
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Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20200183287Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: ApplicationFiled: November 2, 2016Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Günes NAKIBOGLU, Coen Hubertus Matheus BALTIS, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Daan Daniel Johannes Antonius VAN SOMMEREN, Mark Johannes Hermanus FRENCKEN
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Publication number: 20200141445Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.Type: ApplicationFiled: January 6, 2020Publication date: May 7, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Siegfried Alexander TROMP, Antonie Hendrik VERWEIJ, Abraham Alexander SOETHOUDT, Jan Pieter VAN DE POEL, Mark Constant Johannes BAGGEN
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Patent number: 10599049Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body (20) having a main body surface; and a plurality of burls (21) projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature (22, 22c, 22d) configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.Type: GrantFiled: August 24, 2016Date of Patent: March 24, 2020Assignee: ASML Netherlands B.V.Inventors: Bas Johannes Petrus Roset, Siegfried Alexander Tromp
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Patent number: 10527092Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.Type: GrantFiled: October 7, 2015Date of Patent: January 7, 2020Assignee: ASML Netherlands B.V.Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
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Patent number: 10481502Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: March 12, 2018Date of Patent: November 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Publication number: 20190187571Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.Type: ApplicationFiled: June 12, 2017Publication date: June 20, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan JANSSENS, Bert Dirk SCHOLTEN, Sjoerd Nicolaas Lambertus DONDERS, Teunis VAN DAM, Peter Mark OVERSCHIE, Theresa Mary SPAAN-BURKE, Siegfried Alexander TROMP