Patents by Inventor Siegfried Scheler

Siegfried Scheler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5834157
    Abstract: Compounds of the formula ##STR1## are suitable as photoinitiators in free-radical-polymerizable mixtures and are notable for a reduced tendency to diffusion and sublimation than comparable known compounds.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: November 10, 1998
    Assignee: Agfa-Gevaert AG
    Inventors: Siegfried Scheler, deceased, Klaus-Peter Bergmann, Gerhard Buhr
  • Patent number: 5563018
    Abstract: The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.
    Type: Grant
    Filed: March 17, 1993
    Date of Patent: October 8, 1996
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gerhard Buhr, Wolfgang Zahn, Fritz Erdmann, Siegfried Scheler
  • Patent number: 5413899
    Abstract: A light-sensitive mixture which contains a resinous binder which is insoluble in water but soluble or at least swellable in aqueous-alkaline solutions, and an o-naphthoquinonediazide-sulfonic acid ester, the o-naphthoquinonediazide-sulfonic acid ester being of the formula I ##STR1## in which R is hydrogen or an alkyl or aryl radical andR.sub.1 is hydrogen or a 1,2-naphthoquinone-2-diazide-4-sulfonyl, 1,2-naphthoquinone-2-diazide-5-sulfonyl or 7-methoxy-1,2-naphthoquinone-2-diazide-4-sulfonyl radical,and the number of the identical or different naphthoquinonediazide-sulfonyl radicals, defined as R.sub.1, in the molecule being 1 to 5; is useful in the preparation of light-sensitive resist materials. The resist material produced using the light-sensitive mixture has a high light sensitivity and very good developer resistance to alkaline developers and can be developed without any problems with aqueous, weakly alkaline solutions.
    Type: Grant
    Filed: June 6, 1994
    Date of Patent: May 9, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Andreas Elsaesser, Gerhard Buhr, Klaus Bergmann, Wolfgang Zahn
  • Patent number: 5306595
    Abstract: The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.
    Type: Grant
    Filed: April 1, 1992
    Date of Patent: April 26, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Wolfgang Zahn, Axel Schmitt, Gerhard Buhr
  • Patent number: 5268252
    Abstract: The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.
    Type: Grant
    Filed: April 1, 1992
    Date of Patent: December 7, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Wolfgang Zahn, Axel Schmitt, Gerhard Buhr
  • Patent number: 5192640
    Abstract: A process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof, of the general formula Z ##STR1## is disclosed in which X=hydrogen, a metal or an ammonium group, preferably an alkali metal or alkaline earth metal, especially sodium or potassium and the ammonium group.The compounds can be used as much or as intermediates or starting materials for the production of light-sensitive compounds and radiation-sensitive mixtures and materials.
    Type: Grant
    Filed: August 9, 1990
    Date of Patent: March 9, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Gerhard Buhr, Klaus Bergmann
  • Patent number: 5114816
    Abstract: The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.
    Type: Grant
    Filed: November 3, 1989
    Date of Patent: May 19, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Gerhard Buhr, Helmut Lenz, Klaus Bergmann, Herbert Siegel
  • Patent number: 5082932
    Abstract: The invention relates to a process for preparing 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid esters of the general formula I ##STR1## which are substituted in at least one of the positions 5, 6, 7 or 8 by R=halogen, alkoxy groups or alkoxycarbonyl groups and in which X denotes an aryl group. The process comprises steps in whicha) suitably substituted .beta.-naphthol is nitrosated,b) sulfonation with alkali hydrogensulfite and acid in position 4 and reduction are carried out,c) the naphthalenesulfonic acid derivative is oxidized,d) the 1,2-naphthoquinone-4-sulfonic acid formed is reacted with toluenesulfonohydrazide in an organic solvent at temperatures from 20.degree. to 100.degree. C.,e) the naphthoquinonediazide compound is converted with chlorosulfonic acid or chlorosulfonic acid/thionyl chloride into the sulfonyl chloride, and f) the sulfonyl chloride is condensed with a phenolic component, a purification of the respective intermediate product by reprecipitation or recrystallization being unnecessary.
    Type: Grant
    Filed: November 3, 1989
    Date of Patent: January 21, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Herbert Siegel, Siegfried Scheler
  • Patent number: 5077395
    Abstract: Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A ##STR1## in which R is an alkyl, epoxyalklyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group andX is hydrogen, a metal or an ammonium group.A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.
    Type: Grant
    Filed: August 9, 1990
    Date of Patent: December 31, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Gerhard Buhr, Klaus Bergmann
  • Patent number: 4590143
    Abstract: Disclosed is a two-component diazotype material comprising a support and a light-sensitive layer containing (a) at least one diazonium compound derived from p-phenylenediamine and carrying a basic heterocyclic radical in the 4-position and ether groups in the 2- and 5-positions, (b) a coupler component, and (c) an acid stabilizer, the diazonium compound being present in the form of a benzenesulfonate or toluenesulfonate. The disclosed materials have a good storability and are easily developed.
    Type: Grant
    Filed: February 28, 1984
    Date of Patent: May 20, 1986
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Siegfried Scheler
  • Patent number: 4540648
    Abstract: The present invention relates to a two-component diazotype material comprising a support and one or several light-sensitive layers, each of which contains at least one light-sensitive diazonium salt, a coupler component and an acid stabilizer, and at least one of the layers contains a compound which absorbs light in the ultraviolet spectral region. The light-absorbing compound is present in the form of a dye salt of at least one benzothiazole which is converted into its leuco base under the action of an alkaline medium. It thus partially or completely loses its absorptivity toward radiation in the long-wave ultraviolet and short-wave visible spectral regions. The light-absorbing compound comprises a benzothiazole, in particular according to the general formula: ##STR1## wherein R.sub.1 denotes hydrogen, alkyl or aralkyl,R.sub.2 denotes hydrogen or an optionally substituted alkyl, aralkyl, aryl, pyridylalkyl, carbalkyl, carboxyalkyl, carboxyaryl, carbamoyl, or sulfamoyl radical, orR.sub.1 and R.sub.
    Type: Grant
    Filed: February 28, 1984
    Date of Patent: September 10, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Siegfried Scheler
  • Patent number: 4492749
    Abstract: This invention relates to a derivative of 2-hydroxy-naphthalene of the general formula ##STR1## wherein A is ##STR2## and X is --OH or ##STR3## and R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are identical or different and are hydrogen, cycloalkyl having up to eight carbon atoms, which is optionally substituted by lower alkyl groups, aralkyl having up to 10 carbon atoms or aryl which is substituted by lower alkyl, lower alkoxy, halogenalkyl or alkyl-substituted amino groups or by halogen, or R.sub.1 and R.sub.2 or R.sub.3 and R.sub.4 in each case are, conjointly with the nitrogen atom to which they are attached, identical or different heterocyclic groups which are optionally substituted by lower alkyl.
    Type: Grant
    Filed: September 15, 1983
    Date of Patent: January 8, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Siegfried Scheler
  • Patent number: 4457997
    Abstract: A two-component diazotype material, composed of a support and a light-sensitive layer which is applied thereto and contains a polymeric binder, a diazonium salt, a coupler, an acid stabilizer and conventional additives, wherein the support is a biaxially oriented polyester film and the polymeric binder comprises a mixture of about 10-60 percent by weight of a polymer or copolymer of vinyl acetate, for example, a copolymer of vinyl acetate and crotonic acid, and about 40-90 percent by weight of a cellulose ester, such as cellulose acetopropionate, cellulose acetobutyrate, cellulose propionate or cellulose butyrate.
    Type: Grant
    Filed: January 5, 1982
    Date of Patent: July 3, 1984
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Klaus Thoese, Hans-Dieter Frommeld, Siegfried Scheler
  • Patent number: 4334004
    Abstract: This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group.
    Type: Grant
    Filed: March 16, 1979
    Date of Patent: June 8, 1982
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Siegfried Scheler
  • Patent number: 4321373
    Abstract: This invention relates to 2-hydroxy-3-naphthoic acid amides of the general formula: ##STR1## wherein R.sub.1 is hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, and R.sub.2 and R.sub.3 are identical or different and are hydrogen, a substituted or unsubstituted alkyl, cycloalkyl, aralkyl, or aryl group, or, together with the nitrogen atom to which they are attached, a substituted or unsubstituted heterocyclic group. The compounds are useful as coupling components for diazo printing.
    Type: Grant
    Filed: August 29, 1980
    Date of Patent: March 23, 1982
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Siegfried Scheler
  • Patent number: 4317875
    Abstract: This invention relates to a recording material containing diazo compounds, in particular a microfilm, comprising a film base which is at least partially pervious to visible radiation, a light-sensitive layer and, on the reverse side of the film base, a filter layer which absorbs light in the long-wave ultraviolet spectral range and in the short-wave visible spectral range, wherein the filter layer is composed of a polymer which is insoluble or has been rendered insoluble by cross-linking, and of at least one yellow to orange-colored dye which is compatible with the constituents of the polymer and absorbs light in the range between about 360 nm and about 500 nm. The invention also relates to a process for the manufacture of a recording material.
    Type: Grant
    Filed: October 27, 1980
    Date of Patent: March 2, 1982
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Klaus Thoese
  • Patent number: 4207110
    Abstract: This invention relates to an improvement in a diazotype material comprising, in the light-sensitive layer, a diazo component and a coupling component which yields a black dyestuff image, the improvement that the diazo component is a 2,5-dialkoxy-4-morpholino-benzene diazonium salt and the coupling component is a combination of(a) 6-methoxy-2-hydroxy-3-naphthoic acid-N(.omega.-aminoalkyl)-amide as a blue coupler,(b) a 2-alkyl- or 2-aryl-1,3-dihydroxybenzene or a cyanoacetoamide as a yellow coupler, and(c) at least one compound of the general formula ##STR1## wherein X is zero, =S, =SO, or =SO.sub.2, as a reddish-brown coupler, the molar ratio of blue coupler to yellow coupler being in the range of about (0.7 to 0.9):1, and the molar ratio of blue coupler to reddish-brown coupler being in the range of about (6 to 12):1.
    Type: Grant
    Filed: October 13, 1978
    Date of Patent: June 10, 1980
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Siegfried Scheler, Heinz Schafer