Abstract: A process and apparatus for plasma-activated electron beam vaporization is rovided. The vaporizing material from at least two vaporizer crucibles is vaporized with electron beams. An electric voltage is applied to the vaporizer crucibles in such a way that the vapor-emitting areas serve as electrodes of an electric discharge. The vaporizing material acts as a cathode or anode. The process and apparatus are preferably intended for the reactive coating of large surfaces and for the reactive coating of components, tools and strip steel.

Abstract: Device for the vacuum coating of mass produced products. By means of the ice small parts, such as screws and bolts, as mass produced products are highly productively coated by vacuum deposition or sputtering, also under plasma action. In a container is located a drum rotatable at high speed about its horizontal axis and in which the parts to be coated are fixed to the inner wall by centrifugal force. The surface of the inner wall is geometrically constructed such that the parts to be coated are reliably held and moved with it. The coating devices are located in the drum. A stripping device, whose spacing with respect to the inner wall is adjustable at programmable time intervals, is located in the drum and has an abutment surface directed opposite to the rotation direction.

Abstract: Process and device for electron beam treatment of bulk material where the bulk material is fed into a continuous stream by means of compression stages (3) which can be evacuated. It is dispersed and directed into a dosed irradiation chamber (1), passing in this chamber through an irradiation field in a free-fall process, and discharged from the irradiation chamber through a compression stage system (4). The invention enables electron beam treatment of biological materials to be carried out to particularly good advantage, e.g. in combatting harmful organisms in seeds.

Abstract: A process for preparing copolymers of ethylene with acrylic esters by copolymerizing 100 parts by weight of ethylene with from 0.1 to 25.0 parts by weight of acrylic ester in a continuous tubular polymerization system at from 500 to 4000 bar and from 100.degree. to 400.degree. C. in the presence of free radical polymerization initiators, comprises controlling the temperature for the reaction mixture, comprising ethylene, the acrylic ester, the polymerization initiator and optionally a regulator, after entry into the reaction zone in such a way that the ratio dT/dt (temperature increase per unit time) is kept constant at a value within the range from 1.5.degree. to 2.5.degree. C. per second.

Abstract: Copolymers of ethylene with acrylates or acrylic acid are prepared by copolymerizing 100 parts by weight of ethylene with from 1.0 to 20.0 parts by weight of tert-butyl acrylate or tert-butyl methacrylate or acrylic acid or solutions of acrylic acid in acrylates in a continuously operated, tubular polymerization system at above 800 bar and at from 130.degree. to 320.degree. C. in the presence of a free radical polymerization initiator by feeding two gas streams into the polymerization system, by a process in which the first gas stream contains exclusively ethylene with a polymerization initiator and, if required, a polymerization regulator and the second gas stream contains a mixture of ethylene and tert-butyl acrylate or tert-butyl methacrylate or a mixture of ethylene with a solution of acrylic acid in acrylates and polymerization initiators and, if required, polymerization regulators.

Abstract: In a method for coating strip material by means of an electron beam line evaporator, deflecting in a time-invariant program the electron beam to a plurality of dwell points arranged along a path normal to the direction of strip travel, sensing film thickness in a time-variant programmed mode at a plurality of positions arranged along a course normal to said direction of strip travel and subsequent to said path in said direction of strip travel, controlling in accordance with said programmed mode the dwell of said electron beam at selected dwell points to provide uniform film thickness distribution on said strip.

Abstract: An electron beam line evaporator for coating heat-sensitive strips or substrates includes a magnetic trap overlying an evaporation crucible to prevent unpermissible heating and static electrification by back-scattered electrons, complemented with means to influence the injection angle of a dynamically deflected electron beam in such a manner that the beam enters the horizontal magnetic field of the trap at the same angle in each deflection phase independent of stray fields. Such means are arranged inside a gap of a pole shoe necessary for the horizontal magnetic field used by the trap and are operative to generate a vertical magnetic field variable in time and locally alongside the pole shoe.

Abstract: A high beam power electron gun of the axial type, particularly useful in large-scale vacuum metallurgy plants for melting, vaporizing and heat treating. The electron gun is controllable over its entire power range, i.e., from 10% to 100% of its nominal power, while the focal length of its beam guidance lens is maintained unchanged. This lens is downstream of a cathode, a focusing electrode and a movable anode, and is provided on its upstream side with a pole shoe to which the anode is fastened and which, together with the anode, is movable as a single unit in the axial direction for controlling the power.

Abstract: An apparatus and process for the disinfection of seeds, preferably those of grains, to prevent pathogenic organisms from being planted with the seeds, and to provide reliable disinfection without using toxic agents. The seed is irradiated by low-energy electrons with energy and dosage controlled so that the surface and regions close to the surface are exposed to the radiation with fungicidal effect. A beam of the low-energy electrons is provided by an electron gun aimed at a region within a seed-receiving chamber at which the seeds to be irradiated are caused to intercept the radiation repeatedly and on all sides. The chamber may be at atmospheric pressure or be evacuated, the latter condition requiring vacuum locks at seed inlet and outlet ports of the chamber.

Abstract: The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.

Abstract: The invention relates to a trimming capacitor which is used as a passive construction element in electronics. The purpose of the invention is to avoid utilization of the noble metals as electrode material. The task is to find an equivalent material with the same parameters. The task is solved when the structured electrodes comprise Cu/Ni of 30 to 60% Ni, affixed at a thickness of 1.5 to 3 .mu.m. The roughness depth of the stator surface here is .ltoreq.0.7 .mu.m. The electrodes are affixed to the stator and rotor in the vacuum step by spraying at a high rate with the aid of masks.