Patents by Inventor Siew Siew Yip

Siew Siew Yip has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6899997
    Abstract: A process for chemically amplifying structured resists includes applying a chemically amplified resist to a substrate and structuring it in a customary manner. Preferably, the amplification agent is applied in an aqueous phase to the structured resist and, after chemical amplification is complete, excess agent is removed by an aqueous wash medium. By using water as a solvent for the amplification agent and as a wash medium, it is possible to avoid organic solvents that constitute an explosion hazard. Furthermore, removal of partially exposed resist sections is suppressed.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: May 31, 2005
    Assignee: Infineon Technologies AG
    Inventors: Siew Siew Yip, Jörg Rottstegge, Ernst-Christian Richter, Gertrud Falk, Michael Sebald, Kerstin Seibold, Marion Kern
  • Publication number: 20030211422
    Abstract: A process for chemically amplifying structured resists includes applying a chemically amplified resist to a substrate and structuring it in a customary manner. Preferably, the amplification agent is applied in the aqueous phase to the structured resist and, after chemical amplification is complete, excess agent is removed by an aqueous wash medium. By using water as a solvent for the amplification agent and as a wash medium, it is possible to avoid organic solvents that constitute an explosion hazard. Furthermore, removal of partially exposed resist sections is suppressed.
    Type: Application
    Filed: February 28, 2003
    Publication date: November 13, 2003
    Inventors: Siew Siew Yip, Jorg Rottstegge, Ernst-Christian Richter, Gertrud Falk, Michael Sebald, Kerstin Seibold, Marion Kern