Patents by Inventor Sigeharu Abe

Sigeharu Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing semiconductor device
    Patent number: 4311546
    Abstract: A method of surface treatment of a layer grown on a semiconductor substrate by chemical vapor deposition technique for removing a projection appearing on the layer comprises the steps of forming a layer on the semiconductor substrate by chemical vapor deposition technique, forming a membrane of plastic material that resists etching on the layer, pressing a flat plate against the plastic membrane on a projection of the layer to expose the projection, and etching the projection.
    Type: Grant
    Filed: July 7, 1980
    Date of Patent: January 19, 1982
    Assignee: Fujitsu Limited
    Inventors: Sigeharu Abe, Hideo Tamura, Takayuki Murakami