Abstract: Disclosed herein is a method that combines two different hologram origination processes in a single photoresist layer by using an interlayer to transfer structures exposed by electron beam lithography into overlapped with dot-matrix hologram areas, and fabricated holographic structures are replicated in multilayer polymer films. Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection.

Abstract: An optical device with ordered scatterer arrays for secure identity and a method of producing the same This invention discloses a method for configurable spatial control and modification of optically active resonantly coupled scatterer arrays to produce identifiable security features and a corresponding photonic secure identity device. The invention comprises at least the steps of (i) producing a deposition template from said master stamp, (ii) synthesis of a plasmonic particle colloid, (iii) producing an optically active, two-dimensional security tag template using self-assembly of said particles on said deposition template, (iv) producing a customized secure identity device from said security tag template by selective removal or modification of optical properties using ultrashort laser pulses. The produced customized plasmonic-photonic device can then be used as secure identity and anti-counterfeiting means.

Abstract: The present invention discloses a method that combines two different hologram origination processes in a single photoresist layer by using an interlayer to transfer structures exposed by electron beam lithography into overlapped with dot-matrix hologram areas, and fabricated holographic structures are replicated in multilayer polymer films. Dot-matrix technique is low cost process, which has high origination speed and can be used for the patterning of large areas of holograms with high diffraction efficiency. Electron beam lithography allows the formation of high resolution structures. The proposed manufacturing method allows combining these two technologies so that the final security device could contain electron beam patterned high resolution diffraction gratings, computer generated holograms, as well as dot-matrix laser patterned large hologram areas with high diffraction efficiency, providing an increased level of protection.