Patents by Inventor Sigrid Bauer

Sigrid Bauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions with a bis-benzotriazole
    Patent number: 4871644
    Abstract: Photoresist compositions which operate positively and contain at least one ocmpound of the formula I ##STR1## in which X is --C.sub.n H.sub.2n --, --O--, --S-- or --C(O)--, n being a number from 1 to 6. These compositions are particularly suitable for use as positively-operating copying lacquers.
    Type: Grant
    Filed: September 22, 1987
    Date of Patent: October 3, 1989
    Assignee: Ciba-Geigy Corporation
    Inventor: Sigrid Bauer
  • 1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound
    Patent number: 4835085
    Abstract: Compounds of the general formula (I) or (II) ##STR1## in which R is 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl and X is a straight-chain or branched C.sub.1 -C.sub.12 -alkylene group, which is unsubstituted or mono- or disubstituted by OH group or is --CH.dbd.CH--, are suitable as the light-sensitive component in photoresist materials. Both positive and negative images can be prepared with light-sensitive mixtures containing these compounds and a binder.
    Type: Grant
    Filed: October 7, 1987
    Date of Patent: May 30, 1989
    Assignee: Ciba-Geigy Corporation
    Inventor: Sigrid Bauer
  • Photopolymerizable coating agent, a photopolymerizable material and its use
    Patent number: 4693961
    Abstract: A photopolymerizable coating agent made of (a) a low molecular weight epoxy-containing epoxy resin, (b) a high-molecular weight epoxy resin based on aromatic polyols and epichlorohydrin, (c) a light-sensitive ethylenically unsaturated monomer having terminal ethylene groups and (d) a photoinitiator and/or sensitizer, and, if desired, hardeners for epoxy resins. It is used for preparing temporary or permanent protective coatings and photographic relief images.
    Type: Grant
    Filed: April 10, 1986
    Date of Patent: September 15, 1987
    Assignee: Ciba-Geigy Corporation
    Inventor: Sigrid Bauer
  • Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images
    Patent number: 4624912
    Abstract: A process for the production of a protective layer or a relief image on a substrate, wherein a radiation-sensitive layer, consisting of a solid film-forming epoxy resin containing a photoinitiator, which can be activated by radiation, for the polyaddition reaction, is transferred from a support to a substrate, then exposed directly or under a photomask and hardened by the action of heat, after which, if appropriate, the unexposed parts are developed with a solvent. The process is suitable, for example, for the production of printed circuits, solder resist masks and offset printing plates.
    Type: Grant
    Filed: February 6, 1985
    Date of Patent: November 25, 1986
    Assignee: Ciba-Geigy Corporation
    Inventors: Hans Zweifel, Sigrid Bauer, Kurt Meier
  • Photopolymerizable coating agent, a photopolymerizable material and its use
    Patent number: 4601973
    Abstract: A photopolymerizable coating agent made of (a) a low molecular weight epoxy-containing epoxy resin, (b) a high-molecular weight epoxy resin based on aromatic polyols and epichlorohydrin, (c) a light-sensitive ethylenically unsaturated monomer having terminal ethylene groups and (d) a photoinitiator and/or sensitizer, and, if desired, hardeners for epoxy resins. It is used for preparing temporary or permanent protective coatings and photographic relief images.
    Type: Grant
    Filed: January 14, 1985
    Date of Patent: July 22, 1986
    Assignee: Ciba-Geigy Corporation
    Inventor: Sigrid Bauer