Patents by Inventor Sigurd Volker Zehner

Sigurd Volker Zehner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method of depositing a layer at atmospheric pressure
    Patent number: 11479854
    Abstract: A method of depositing a layer includes measuring a physical property that is related to an air pressure in a reactor chamber of a deposition apparatus. A main gas mixture including a source gas and an auxiliary gas is introduced into the reactor chamber at atmospheric pressure, the source gas including a precursor material and a carrier gas. A gas flow of at least one of the source gas and the auxiliary gas into the reactor chamber is controlled in response to a change of the air pressure in the reactor chamber.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: October 25, 2022
    Assignee: Infineon Technologies AG
    Inventors: Olaf Fiedler, Ullrich Hannemann, Andre Horn, Daniel Kai Simon, Sigurd Volker Zehner
  • Apparatus and Method of Depositing a Layer at Atmospheric Pressure
    Publication number: 20200063257
    Abstract: A method of depositing a layer includes measuring a physical property that is related to an air pressure in a reactor chamber of a deposition apparatus. A main gas mixture including a source gas and an auxiliary gas is introduced into the reactor chamber at atmospheric pressure, the source gas including a precursor material and a carrier gas. A gas flow of at least one of the source gas and the auxiliary gas into the reactor chamber is controlled in response to a change of the air pressure in the reactor chamber.
    Type: Application
    Filed: August 20, 2019
    Publication date: February 27, 2020
    Inventors: Olaf Fiedler, Ullrich Hannemann, Andre Horn, Daniel Kai Simon, Sigurd Volker Zehner