Patents by Inventor Si-Han ZENG

Si-Han ZENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining root causes of events of a semiconductor manufacturing process and for monitoring a semiconductor manufacturing process
    Patent number: 11796978
    Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.
    Type: Grant
    Filed: October 21, 2019
    Date of Patent: October 24, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Chang-Wei Chen, Si-Han Zeng
  • Method and system for determining overlay
    Patent number: 11774869
    Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: October 3, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Ruud Hendrikus Martinus Johannes Bloks, Hendrik Cornelis Anton Borger, Frederik Eduard De Jong, Johan Gertrudis Cornelis Kunnen, Siebe Landheer, Chung-Hsun Li, Patricius Jacobus Neefs, Georgios Tsirogiannis, Si-Han Zeng
  • A METHOD AND SYSTEM FOR DETERMINING OVERLAY
    Publication number: 20220171299
    Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.
    Type: Application
    Filed: January 17, 2020
    Publication date: June 2, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ruud Hendrikus Martinus Johannes BLOKS, Hendrik Cornelis Anton BORGER, Frederik Eduard DE JONG, Johan Gertrudis Cornelis KUNNEN, Siebe LANDHEER, Chung-Hsun LI, Patricius Jacobus NEEFS, Georgios TSIROGIANNIS, Si-Han ZENG
  • METHOD FOR DETERMINING ROOT CAUSES OF EVENTS OF A SEMICONDUCTOR MANUFACTURING PROCESS AND FOR MONITORING A SEMICONDUCTOR MANUFACTURING PROCESS
    Publication number: 20210397152
    Abstract: A user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process, the user interface including: a library of control elements having at least a control element representing a task of simulation and each control element being selectable by a user; a control flow editor configured to organize the control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.
    Type: Application
    Filed: October 21, 2019
    Publication date: December 23, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Chang-Wei CHEN, Si-Han ZENG
  • Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method
    Patent number: 10474043
    Abstract: A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured Wt times, where Wt is an integer greater than 2 so as to obtain N*Wt measurement values; and determining R property values using Q equations and the N*Wt measurement values, where R<Q?N*Wt; wherein the optical measurement system has at least one changeable setting and, for each of the N targets, measurement values are obtained using different setting values of at least one changeable setting.
    Type: Grant
    Filed: December 14, 2017
    Date of Patent: November 12, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Patrick Warnaar, Maurits Van Der Schaar, Grzegorz Grzela, Erik Johan Koop, Victor Emanuel Calado, Si-Han Zeng
  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 10261427
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Method of Measuring a Property of a Substrate, Inspection Apparatus, Lithographic System and Device Manufacturing Method
    Publication number: 20180173105
    Abstract: A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured Wt times, where Wt is an integer greater than 2 so as to obtain N*Wt measurement values; and determining R property values using Q equations and the N*Wt measurement values, where R<Q?N*Wt; wherein the optical measurement system has at least one changeable setting and, for each of the N targets, measurement values are obtained using different setting values of at least one changeable setting.
    Type: Application
    Filed: December 14, 2017
    Publication date: June 21, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Patrick Warnaar, Maurits Van Der Schaar, Grzegorz Grzela, Erik Johan Koop, Victor Emanuel Calado, Si-Han Zeng
  • METROLOGY METHOD AND APPARATUS, COMPUTER PROGRAM AND LITHOGRAPHIC SYSTEM
    Publication number: 20180136570
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: January 12, 2018
    Publication date: May 17, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR
  • Metrology method and apparatus, computer program and lithographic system
    Patent number: 9869940
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: January 16, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Si-Han Zeng, Yue-Lin Peng, Jen-Yu Fang, Arie Jeffrey Den Boef, Alexander Straaijer, Ching-Yi Hung, Patrick Warnaar
  • Metrology Method and Apparatus, Computer Program and Lithographic System
    Publication number: 20160313654
    Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 27, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Si-Han ZENG, Yue-Lin PENG, Jen-Yu FANG, Arie Jeffrey DEN BOEF, Alexander STRAAIJER, Ching-Yi HUNG, Patrick WARNAAR