Patents by Inventor Sil PARK

Sil PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10925933
    Abstract: The present disclosure relates to a method of preventing rheumatoid arthritis comprising administering a polynucleotide encoding Ssu72.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: February 23, 2021
    Assignee: CUROGEN TECHNOLOGY CO., LTD.
    Inventors: Mi-La Cho, Sung-Hwan Park, Seung-Ki Kwok, Jong-Young Choi, Seung-Hun Lee, Hyeon-Beom Seo, Young-Mee Moon, Jin-Sil Park, Min-Jung Park, Jin-Kwan Lee, Chang Woo Lee
  • Patent number: 10872398
    Abstract: The apparatus for removing haze from an image using a fuzzy membership function includes memory configured to store computer-readable instructions; and a processor configured to execute the instructions, wherein the processor calculates a hazy value and a transmission map using an input image including a hazy component and generates a restored image from which the hazy component has been removed using the hazy value and the transmission map, and wherein the processor selects a first area in the input image, calculates a fuzzy membership function of pixels of the input image with respect to the hazy value using brightness values of the pixels of the input image and brightness values of pixels of the first area, and calculates the transmission map using the brightness values of pixels of the first area and the fuzzy membership function.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: December 22, 2020
    Assignee: CHUNG ANG UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
    Inventors: Joon Ki Paik, Ha Sil Park, Jin Ho Park, Hee Gwang Kim
  • Patent number: 10792309
    Abstract: The present invention relates to a cell therapy composition for preventing or treating immune disease comprising mesenchymal stem cells and immunoregulatory T-cells as an active ingredient. By infusing mesenchymal stem cells and immunoregulatory T-cells, which are the cellular therapeutic agent of the present invention, into bone marrow transplant animals, rejection to the host is suppressed after the engraftment of the transplanted bone-marrow to thus obtain the effect of reducing graft-versus-host disease and immune disease. Moreover, the effect of such GVHD reduction is much greater than the one obtained when only mesenchymal stem cells are infused. Accordingly, the cell therapy composition of the present invention having the above-mentioned effects can be useful in the prevention or treatment of immune disease.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: October 6, 2020
    Assignee: CATHOLIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
    Inventors: Mi La Cho, Seok-Goo Cho, Jung-Yeon Lim, Hyun-Sil Park, Min-Jung Park
  • Publication number: 20200277298
    Abstract: The present disclosure provides a compound of Chemical Formula (1) or a pharmaceutically acceptable salt thereof, and a pharmaceutical composition comprising the same: wherein X, Z, R1 and R2 are as defined in the specification. The compound of Chemical Formula (1) or pharmaceutically acceptable salt thereof acts as a positive allosteric modulator of metabotropic glutamate receptor subtype 5 (mGluR5), thereby being useful in the prevention or treatment of disorder mediated by glutamate dysfunction and mGluR5.
    Type: Application
    Filed: April 17, 2020
    Publication date: September 3, 2020
    Inventors: Chun Eung PARK, Young Koo JANG, Yong Je SHIN, Ji Yeon KIM, Seung Mo HAM, Yong Gil KIM, Hye Kyung MIN, Soo Bong CHA, Hyo Jun JUNG, Ju Young LEE, Seung Nam HAN, Jin Yong CHUNG, Eun Ju CHOI, Chan Mi JOUNG, Jong Sil PARK, Ji Won LEE, Nahm Ryune CHO, Eun Ju RYU, Cheol Young MAENG
  • Publication number: 20200215040
    Abstract: One aspect of the present disclosure is a pharmaceutical composition which includes (R)—N-[1-(3,5-difluoro-4-methansulfonylamino-phenyl)-ethyl]-3-(2-propyl-6-trifluoromethyl-pyridin-3-yl)-acrylamide as a first component and a cellulosic polymer as a second component, wherein the composition of one aspect of the present disclosure has a formulation characteristic in which crystal formation is delayed for a long time.
    Type: Application
    Filed: August 10, 2018
    Publication date: July 9, 2020
    Applicant: AMOREPACIFIC CORPORATION
    Inventors: Joon Ho CHOI, Won Kyung CHO, Kwang-Hyun SHIN, Byoung Young WOO, Ki-Wha LEE, Min-Soo KIM, Jong Hwa ROH, Mi Young PARK, Young-Ho PARK, Eun Sil PARK, Jae Hong PARK
  • Publication number: 20190363085
    Abstract: A semiconductor device includes a fin type pattern extending in a first direction on a substrate, a first gate electrode extending in a second direction intersecting the first direction on the fin type pattern, a source/drain region on a side wall of the first gate electrode and in the fin type pattern, a separation structure extending in the first direction on the substrate, the separation structure including a first trench and being spaced apart from the fin type pattern and separating the first gate electrode, an interlayer insulating layer on a side wall of the separation structure and covering the source/drain region, the interlayer insulating layer including a second trench having a lower surface lower than a lower surface of the first trench, and a contact connected to the source/drain region and filling the first trench and the second trench.
    Type: Application
    Filed: December 13, 2018
    Publication date: November 28, 2019
    Inventors: Joong Gun OH, Sung Il PARK, Jae Hyun PARK, Hyung Suk LEE, Eun Sil PARK, Yun Il LEE
  • Publication number: 20190249328
    Abstract: A method for growing a crystalline composition, the first crystalline composition may include gallium and nitrogen. The crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1. In one embodiment, the composition ay have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the first crystalline composition.
    Type: Application
    Filed: January 11, 2019
    Publication date: August 15, 2019
    Inventors: Mark Philip D'Evelyn, Kristi Jean Narang, Dong-Sil Park, Huicong Hong, Xian-An Cao, Larry Qiang Zeng
  • Publication number: 20190147568
    Abstract: The apparatus for removing haze from an image using a fuzzy membership function includes memory configured to store computer-readable instructions; and a processor configured to execute the instructions, wherein the processor calculates a hazy value and a transmission map using an input image including a hazy component and generates a restored image from which the hazy component has been removed using the hazy value and the transmission map, and wherein the processor selects a first area in the input image, calculates a fuzzy membership function of pixels of the input image with respect to the hazy value using brightness values of the pixels of the input image and brightness values of pixels of the first area, and calculates the transmission map using the brightness values of pixels of the first area and the fuzzy membership function.
    Type: Application
    Filed: November 14, 2018
    Publication date: May 16, 2019
    Inventors: Joon Ki PAIK, Ha Sil PARK, Jin Ho PARK, Hee Gwang KIM
  • Patent number: 10236185
    Abstract: A method of forming patterns for a semiconductor device includes preparing a hardmask composition including a carbon allotrope, a spin-on hardmask (SOH) material, an aromatic ring-containing polymer, and a solvent, applying the hardmask composition to an etching target layer, forming a hardmask by heat-treating the applied hardmask composition, forming a photoresist pattern on the hardmask, forming a hardmask pattern by etching the hardmask using the photoresist pattern as an etching mask, and forming an etched pattern by etching the etching target layer using the hardmask pattern as an etching mask.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: March 19, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yool Kang, Kyoung-sil Park, Yun-seok Choi, Boo-deuk Kim, Ye-hwan Kim
  • Patent number: 10228383
    Abstract: A test apparatus for measuring the temperature of a reactor using a thermochromic pigment, and a method for controlling the test apparatus are disclosed, based on a technology for irradiating light of different wavelengths on a thermochromic pigment accommodated in a reactor and estimating temperature of the reactor using a difference between absorbance values corresponding to the light of the different wavelengths. The test apparatus includes at least one light emitter configured to irradiate light of different wavelengths onto a chamber included in the reactor, a light receiver configured to receive the light that propagates through the chamber, and a controller configured to measure absorbance values of the thermochromic pigment in correspondence to the different wavelengths of the light, to calculate a difference between the measured absorbance values, and to determine a temperature of the reactor in correspondence to the calculated difference between the absorbance values.
    Type: Grant
    Filed: November 25, 2016
    Date of Patent: March 12, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yeong Bae Yeo, Sil Park
  • Patent number: 10208396
    Abstract: A method for growing a crystalline composition, the first crystalline composition may include gallium and nitrogen. The crystalline composition may have an infrared absorption peak at about 3175 cm?1, with an absorbance per unit thickness of greater than about 0.01 cm?1. In one embodiment, the composition may have an amount of oxygen present in a concentration of less than about 3×1018 per cubic centimeter, and may be free of two-dimensional planar boundary defects in a determined volume of the first crystalline composition.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: February 19, 2019
    Assignee: Soraa, Inc.
    Inventors: Mark Philip D'Evelyn, Kristi Jean Narang, Dong-Sil Park, Huicong Hong, Xian-An Cao, Larry Qiang Zeng
  • Patent number: 10198092
    Abstract: According to various exemplary embodiments, there may be provided an electronic device including a housing having a first side and an opposite second side, a display disposed between the first side and the second side, an ElectroMagnetic Resonance (EMR) sensor pad disposed between the display and the second side, a pen placing space disposed between the first side and the second side to accommodate an electronic pen, and a detecting member disposed in vicinity of the electronic pen for detecting the electronic pen when the electronic pen is fully inserted into the pen placing space.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: February 5, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myeong Sil Park, Joohoon Lee
  • Publication number: 20190031669
    Abstract: The present disclosure provides a compound of Chemical Formula (1) or a pharmaceutically acceptable salt thereof, and a pharmaceutical composition comprising the same: wherein X, Z, R1 and R2 are as defined in the specification. The compound of Chemical Formula (1) or pharmaceutically acceptable salt thereof acts as a positive allosteric modulator of metabotropic glutamate receptor subtype 5 (mGluR5), thereby being useful in the prevention or treatment of disorder mediated by glutamate dysfunction and mGluR5.
    Type: Application
    Filed: September 28, 2018
    Publication date: January 31, 2019
    Inventors: Chun Eung PARK, Young Koo JANG, Yong Je SHIN, Ji Yeon KIM, Seung Mo HAM, Yong Gil KIM, Hye Kyung MIN, Soo Bong CHA, Hyo Jun JUNG, Ju Young LEE, Seung Nam HAN, Jin Yong CHUNG, Eun Ju CHOI, Chan Mi JOUNG, Jong Sil PARK, Ji Won LEE, Nahm Ryune CHO, Eun Ju RYU, Cheol Young MAENG
  • Patent number: 10100057
    Abstract: The present disclosure provides a compound of Chemical Formula (1) or a pharmaceutically acceptable salt thereof, and a pharmaceutical composition comprising the same: wherein X, Z, R1 and R2 are as defined in the specification. The compound of Chemical Formula (1) or pharmaceutically acceptable salt thereof acts as a positive allosteric modulator of metabotropic glutamate receptor subtype 5 (mGluR5), thereby being useful in the prevention or treatment of disorder mediated by glutamate dysfunction and mGluR5.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: October 16, 2018
    Assignee: SK BIOPHARMACEUTICALS CO., LTD.
    Inventors: Chun Eung Park, Young Koo Jang, Yong Je Shin, Ji Yeon Kim, Seung Mo Ham, Yong Gil Kim, Hye Kyung Min, Soo Bong Cha, Hyo Jun Jung, Ju Young Lee, Seung Nam Han, Jin Yong Chung, Eun Ju Choi, Chan Mi Joung, Jong Sil Park, Ji Won Lee, Nahm Ryune Cho, Eun Ju Ryu, Cheol Young Maeng
  • Publication number: 20180271923
    Abstract: The present invention relates to: a pharmaceutical composition for preventing or treating menopausal disorders, containing a Tetragonia tetragonoides (Pall.) Kuntze extract or a fraction thereof; a method for preventing or treating menopausal disorders, comprising a step of administering the pharmaceutical composition; and a food composition containing the extract or a fraction thereof. The Tetragonia tetragonoides (Pall.) Kuntze extract of the present invention shows effects of alleviating obesity, which is representative of glucose metabolism disorders and lipid metabolism disorders, osteoporosis, which is representative of bone homeostasis disorders, and flushing, which is representative of energy metabolism disorders, and thus the extract can be used in food, a medicine and the like so as to prevent, alleviate or treat menopausal disorders.
    Type: Application
    Filed: May 31, 2016
    Publication date: September 27, 2018
    Inventors: Byoung Seob Ko, Sun Min Park, Hye Won Lee, Jin Ah Ryuk, In Sil Park, Su Ran Kim
  • Publication number: 20180235912
    Abstract: The present invention relates to a novel use of a thiourea derivative and, more specifically, to a pharmaceutical composition for preventing or treating autoimmune diseases comprising a thiourea derivative as an active ingredient. The thiourea derivative according to the present invention can inhibit the transcription of inflammatory genes such as TNF-?, IL-1?, NOS2 and IL-6, and also can inhibit the activity or production of Th17 and increase the activity or production of a regulatory T cell (Treg). Thus, it is expected that the thiourea derivative may be usefully used in a pharmaceutical composition, a health food composition, etc. for the prevention, improvement or treatment of various autoimmune diseases including rheumatoid arthritis.
    Type: Application
    Filed: August 12, 2016
    Publication date: August 23, 2018
    Applicant: SEOUL NATIONAL UNIVERSITY R & DB FOUNDATION
    Inventors: Mi Ock LEE, Hyeung Geun PARK, Mi-La CHO, Yong-Hyun HAN, Hyeon-Ji KIM, Jin-Sil PARK
  • Publication number: 20180151362
    Abstract: A method of forming patterns for a semiconductor device includes preparing a hardmask composition including a carbon allotrope, a spin-on hardmask (SOH) material, an aromatic ring-containing polymer, and a solvent, applying the hardmask composition to an etching target layer, forming a hardmask by heat-treating the applied hardmask composition, forming a photoresist pattern on the hardmask, forming a hardmask pattern by etching the hardmask using the photoresist pattern as an etching mask, and forming an etched pattern by etching the etching target layer using the hardmask pattern as an etching mask.
    Type: Application
    Filed: August 25, 2017
    Publication date: May 31, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yool KANG, Kyoung-sil Park, Yun-seok Choi, Boo-deuk Kim, Ye-hwan Kim
  • Publication number: 20180140681
    Abstract: The present disclosure relates to a composition for preventing or treating an autoimmune disease, in which the composition includes Ssu72 as an active ingredient. According to the present invention, Ssu72 has an effect of effectively inhibiting STAT3 activity, thereby effectively preventing and treating, ultimately, an immune disease, and preferably, STAT3-mediated diseases through an action capable of inhibiting the expression of inflammatory cytokines when Ssu72 is overexpressed and simultaneously promoting the expression of IL-4 and IL-10, which are factors associated with immunoregulatory T cells.
    Type: Application
    Filed: March 31, 2015
    Publication date: May 24, 2018
    Applicant: THE CATHOLIC UNIVERSITY OF KOREA INDUSTRY- ACADEMIC COOPERATION FOUNDATION
    Inventors: Mi-La CHO, Sung-Hwan PARK, Seung-Ki KWOK, Jong-Young CHOI, Seung-Hun LEE, Hyeon-Beom SEO, Young-Mee MOON, Jin-Sil PARK, Min-Jung PARK
  • Publication number: 20180120290
    Abstract: A test device, test system, and control method of the test device, which defines a light irradiating area in a reactor to prevent a decrease in magnitude of a detected signal that may result due to scattering of light that has penetrated other area of the reactor than an area containing an object for detection and improve a dynamic range. A test device may include a light source configured to irradiate light; a reactor configured to include at least one first area to contain an object for detection; and a photo detector configured to receive light that has been irradiated from the light source and has passed the reactor that contains the object for detection, wherein the light source is configured to limitedly irradiate the light to the first area of the reactor.
    Type: Application
    Filed: August 25, 2017
    Publication date: May 3, 2018
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yeong Bae YEO, Sil PARK, Su Bong BAE
  • Patent number: 9892915
    Abstract: A manufacturing method of a semiconductor device includes forming a hard mask layer on a semiconductor substrate using a hard mask composition. Hard mask patterns are formed by patterning the hard mask layer. Semiconductor patterns are formed by etching the semiconductor substrate using the hard mask patterns. The hard mask composition includes a plurality of first carbon nanotubes (CNTs) having a first length, a plurality of second CNTs having a second length, which is at least 3 times the first length, and a dispersing agent in which the first CNTs and the second CNTs are dispersed. The total mass of the first CNTs is 1 to 2.5 times the total mass of the second CNTs.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: February 13, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung Yun Yang, Seung Hyun Lee, Kyoung Sil Park, Yool Kang, Yi Seul Kim, Yun Seok Choi