Abstract: A silicon-containing molecular glass photoresist compound with high etching resistance, a preparation method therefor, and use thereof are provided. The compound has simple molecular structure, controllable molecular weight, simple synthesis steps, and relatively high thermal stability, resulting in no risk of precipitation in baking and less proneness to deformation in lithography; the negative molecular glass photoresist provided has relatively good film-forming property, relatively high thermal stability, resulting in less proneness to deformation during storage, and low viscosity without the use of additional solvents for dilution. The photoresist prepared by the compound can give a uniform film on a substrate by spin-coating, and the formula can be used in modern lithography technologies such as 365 nm lithography, 248 nm lithography, 193 nm lithography, extreme ultraviolet lithography, electron beam lithography, and the like.

Abstract: An acceleration compensation method includes obtaining traveling environment information and/or traveling parameter information of a vehicle running in a first mode, and switching the first mode of the vehicle to a second mode when the traveling environment information and/or the traveling parameter information meet/meets a preset condition. In a case of a steady speed and/or accelerator pedal input, an acceleration capability of the vehicle in the second mode is greater than an acceleration capability in the first mode.

Abstract: A speed limit value adjustment method includes obtaining an accelerator pedal opening and/or an accelerator pedal opening change rate of a vehicle running in a first mode, where a speed limit value of the vehicle in the first mode is a first speed limit value; and adjusting the speed limit value of the vehicle to a second speed limit value when it is detected that the accelerator pedal opening and/or the accelerator pedal opening change rate meet/meets a preset condition. The second speed limit value is greater than the first speed limit value.

Abstract: Disclosed in the present invention is complex-phase steel having high hole expansibility. The complex-phase steel has a microstructure of ferrite and bainite. The complex-phase steel having high hole expansibility comprises the following chemical elements in percentage by mass: C: 0.06-0.09%, Si: 0.05-0.5%, Al: 0.02-0.1%, Mn: 1.5-1.8%, Cr: 0.3-0.6%, Nb?0.03%, Ti: 0.05-0.12%, and the balance of Fe and inevitable impurities. In addition, also disclosed in the present invention is a manufacturing method for the foregoing complex-phase steel having high hole expansibility. The method comprises the following steps: (1) smelting and casting; (2) heating; (3) hot-rolling; (4) phosphorous removal; (5) laminar cooling: a relaxation time period is controlled to be 0-8 s, and a laminar cooling rate is 40-70° C./s; (6) coiling; (7) leveling; and (8) pickling. The complex-phase steel having high hole expansibility can simultaneously satisfy the requirements for hole expansibility and good plasticity.

Abstract: A biochemical reactor involves an online cell examination microscope thereon. The online cell examination microscope comprises a main body, an objective lens, an observation entrance window, a sampling device, an external light source system. Said observation entrance window lies in front of said main body and the sampling device lies in front of said observation entrance window. An objective lens and said external light source system lie behind the observation entrance window in the main body. A reflector prism is installed between the external light source system and the objective lens. A reflector lies behind the objective lens and in front of the observation entrance window. An annular diaphragm is placed in front of the reflecting prism. A CCD or an area image sensor is arranged on the upper side of the reflectance prism.

Abstract: A biochemical reactor involves an online cell examination microscope (4) thereon. Said online cell examination microscope (4) comprises a main body (43), an objective lens (24), an observation entrance window (22), a sampling device (40), an external light source system (60). Said observation entrance window (22) lies in front of said main body (43) and the sampling device (40) lies in front of said observation entrance window (22). An objective lens (24) and said external light source system (60) lie behind the observation entrance window (22) in the main body (43). A reflector prism (25) is installed between the external light source system (60) and the objective lens (24). A reflector (23) lies behind the objective lens (24) and in front of the observation entrance window (22). An annular diaphragm (26) is placed in front of the reflecting prism (25). A CCD or an area image sensor (30) is arranged on the upper side of the reflectance prism (25).