Patents by Inventor Silvester De Graaf

Silvester De Graaf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cargo bike
    Patent number: 11975789
    Abstract: Cargo bike comprising a collapsible frame, the collapsible frame being adjustable between an elongate state in which the collapsible frame positions a front and rear wheel of the cargo bike at a first distance along a longitudinal axis of the cargo bike, and a collapsed state in which the collapsible frame positions the front and rear wheel at a second, smaller distance along the longitudinal axis of the cargo bike, a cargo holder for holding cargo that comprises a face that extends substantially transversely to the longitudinal axis, and wherein in the collapsed state of the collapsible frame at least one of the wheels extends transversely to the longitudinal axis of the cargo bike and at least partially overlaps with the transversely extending face.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: May 7, 2024
    Assignee: Cirade
    Inventor: Silvester De Graaf
  • CARGO BIKE
    Publication number: 20230097235
    Abstract: Cargo bike comprising a collapsible frame, the collapsible frame being adjustable between an elongate state in which the collapsible frame positions a front and rear wheel of the cargo bike at a first distance along a longitudinal axis of the cargo bike, and a collapsed state in which the collapsible frame positions the front and rear wheel at a second, smaller distance along the longitudinal axis of the cargo bike, a cargo holder for holding cargo that comprises a face that extends substantially transversely to the longitudinal axis, and wherein in the collapsed state of the collapsible frame at least one of the wheels extends transversely to the longitudinal axis of the cargo bike and at least partially overlaps with the transversely extending face.
    Type: Application
    Filed: November 19, 2019
    Publication date: March 30, 2023
    Inventor: Silvester DE GRAAF
  • Lithographic apparatus and device manufacturing method
    Patent number: 8634059
    Abstract: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the barrier member and the projection system, to help prevent escape of liquid.
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: January 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventor: Silvester De Graaf
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100149515
    Abstract: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the barrier member and the projection system, to help prevent escape of liquid.
    Type: Application
    Filed: March 2, 2010
    Publication date: June 17, 2010
    Applicant: ASML Netherlands B.V.
    Inventor: Silvester DE GRAAF
  • Lithographic apparatus and device manufacturing method
    Patent number: 7701551
    Abstract: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the barrier member and the projection system, to help prevent escape of liquid.
    Type: Grant
    Filed: April 14, 2006
    Date of Patent: April 20, 2010
    Assignee: ASML Netherlands B.V.
    Inventor: Silvester De Graaf
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070243329
    Abstract: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the barrier member and the projection system, to help prevent escape of liquid.
    Type: Application
    Filed: April 14, 2006
    Publication date: October 18, 2007
    Applicant: ASML Netherlands B. V.
    Inventor: Silvester De Graaf