Patents by Inventor Silvia De Dea
Silvia De Dea has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10232413Abstract: A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of the optical element; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.Type: GrantFiled: August 30, 2017Date of Patent: March 19, 2019Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Chunguang Xia, Gregory James Wilson, Brandon Wilson Verhoff
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Patent number: 10185234Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.Type: GrantFiled: October 4, 2012Date of Patent: January 22, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Alexander I. Ershov, Norbert R. Bowering, Bruno M. La Fontaine, Silvia De Dea
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Publication number: 20170361359Abstract: A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of the optical element; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.Type: ApplicationFiled: August 30, 2017Publication date: December 21, 2017Inventors: Silvia De Dea, Chunguang Xia, Gregory James Wilson, Brandon Wilson Verhoff
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Patent number: 9844804Abstract: A carrier holds an extreme ultraviolet light source collector mirror. The carrier includes a front panel having an inner surface and an outer surface opposite the inner surface, and defining a through opening that has an edge having a plurality of scallops; a back panel having an inner surface that faces the front panel and an outer surface opposite the inner surface; and a plurality of posts that are configured to connect the back panel to the front panel and to sandwich a flat rim around the circular boundary of the collector mirror between the inner surface of one of the panels and flanges of the posts. The scallops are positioned around a circumference of the edge and being separated by arcs, where the arcs define a circle that has a diameter that is less than a diameter of the circular boundary of the reflective surface of the collector mirror.Type: GrantFiled: June 12, 2015Date of Patent: December 19, 2017Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Michael Varga, Alexander I. Ershov, Robert L. Morse
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Patent number: 9776218Abstract: A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of the optical element; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.Type: GrantFiled: November 11, 2015Date of Patent: October 3, 2017Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Chunguang Xia, Gregory James Wilson, Brandon Wilson Verhoff
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Patent number: 9632418Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.Type: GrantFiled: May 31, 2016Date of Patent: April 25, 2017Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Georgiy O. Vaschenko, Peter Baumgart, Norbert Bowering
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Publication number: 20170036252Abstract: A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optical element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of the optical element; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.Type: ApplicationFiled: November 11, 2015Publication date: February 9, 2017Inventors: Silvia De Dea, Chunguang Xia, Gregory James Wilson, Brandon Wilson Verhoff
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Patent number: 9560730Abstract: Free radicals that combine with debris that is created by converting a target mixture to plasma that emits EUV light are received at a first opening defined by a first end of a conduit, the conduit including a material that passes the free radicals and the conduit including a sidewall that extends away from the first opening and defines at least one other opening, the at least one other positioned to release the free radicals toward an element that accumulates the debris on a surface. The free radicals in the conduit are directed toward the at least one other opening. The free radicals are passed through the at least one other opening and to the surface of the element to remove the debris from the surface of the element without removing the element from the EUV light source.Type: GrantFiled: September 9, 2013Date of Patent: January 31, 2017Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Alexander I. Ershov, Brandon Verhoff, Gregory Wilson, Bruno M. La Fontaine
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Patent number: 9557650Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.Type: GrantFiled: June 16, 2015Date of Patent: January 31, 2017Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Alexander I. Ershov, Brandon Verhoff, Gregory Wilson, Bruno M. La Fontaine
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Publication number: 20160274466Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.Type: ApplicationFiled: May 31, 2016Publication date: September 22, 2016Inventors: Silvia De Dea, Georgiy O. Vaschenko, Peter Baumgart, Norbert Bowering
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Patent number: 9392678Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.Type: GrantFiled: October 16, 2012Date of Patent: July 12, 2016Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Georgiy O. Vaschenko, Peter Baumgart, Norbert Bowering
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Publication number: 20150273542Abstract: A carrier holds an extreme ultraviolet light source collector mirror. The carrier includes a front panel having an inner surface and an outer surface opposite the inner surface, and defining a through opening that has an edge having a plurality of scallops; a back panel having an inner surface that faces the front panel and an outer surface opposite the inner surface; and a plurality of posts that are configured to connect the back panel to the front panel and to sandwich a flat rim around the circular boundary of the collector mirror between the inner surface of one of the panels and flanges of the posts. The scallops are positioned around a circumference of the edge and being separated by arcs, where the arcs define a circle that has a diameter that is less than a diameter of the circular boundary of the reflective surface of the collector mirror.Type: ApplicationFiled: June 12, 2015Publication date: October 1, 2015Inventors: Silvia De Dea, Michael Varga, Alexander I. Ershov, Robert L. Morse
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Publication number: 20150282287Abstract: A system for an extreme ultraviolet (EUV) light source includes a radical transport system that includes one or more conduits, each of the one or more conduits comprising a sidewall, the sidewall comprising a linear portion and a second portion, the linear portion of the sidewall comprising a first end that defines a first opening, and the second portion of the sidewall comprising one or more openings from an interior of the conduit to an exterior of the conduit, where the second portion of at least one of the one or more conduits is positioned relative to a collector that is inside of a vacuum chamber of the EUV light source with a gap between the collector and the second portion; and a control system.Type: ApplicationFiled: June 16, 2015Publication date: October 1, 2015Inventors: Silvia De Dea, Alexander I. Ershov, Brandon Verhoff, Gregory Wilson, Bruno M. La Fontaine
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Patent number: 9073098Abstract: A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface.Type: GrantFiled: May 16, 2012Date of Patent: July 7, 2015Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Michael Varga, Alexander I. Ershov, Robert L. Morse
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Patent number: 9000404Abstract: An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.Type: GrantFiled: December 19, 2013Date of Patent: April 7, 2015Assignee: ASML Netherlands, B.V.Inventors: Alexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
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Publication number: 20150069273Abstract: Free radicals that combine with debris that is created by converting a target mixture to plasma that emits EUV light are received at a first opening defined by a first end of a conduit, the conduit including a material that passes the free radicals and the conduit including a sidewall that extends away from the first opening and defines at least one other opening, the at least one other positioned to release the free radicals toward an element that accumulates the debris on a surface. The free radicals in the conduit are directed toward the at least one other opening. The free radicals are passed through the at least one other opening and to the surface of the element to remove the debris from the surface of the element without removing the element from the EUV light source.Type: ApplicationFiled: September 9, 2013Publication date: March 12, 2015Inventors: Silvia De Dea, Alexander I. Ershov, Brandon Verhoff, Gregory Wilson, Bruno M. La Fontaine
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Patent number: 8816305Abstract: An apparatus supplies a target material to a target location. The apparatus includes a reservoir that holds a target mixture that includes the target material and non-target particles; a supply system that receives the target mixture from the reservoir and that supplies the target mixture to the target location, the supply system including a tube and a nozzle that defines an orifice through which the target mixture is passed; and a filter inside the tube through which the target mixture is passed.Type: GrantFiled: December 20, 2011Date of Patent: August 26, 2014Assignee: ASML Netherlands B.V.Inventors: Silvia De Dea, Sergei Kalynych, Peter Baumgart
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Publication number: 20140110609Abstract: An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.Type: ApplicationFiled: December 19, 2013Publication date: April 24, 2014Applicant: CYMER, LLCInventors: Alexander N. Bykanov, Silvia De Dea, Alexander I. Ershov, Vladimir B. Fleurov, Igor V. Fomenkov, William N. Partlo
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Publication number: 20140102875Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.Type: ApplicationFiled: October 16, 2012Publication date: April 17, 2014Inventors: Silvia De Dea, Georgiy O. Vaschenko, Peter Baumgart, Norbert Bowering
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Publication number: 20140098413Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.Type: ApplicationFiled: October 4, 2012Publication date: April 10, 2014Applicant: Cymer Inc.Inventors: Alexander I. ERSHOV, Norbert R. Bowering, Bruno M. La Fontaine, Silvia De Dea