Patents by Inventor Siming Chen

Siming Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220006264
    Abstract: A semiconductor device comprising a nominally or exactly or equivalent orientation silicon substrate on which is grown directly a <100 nm thick nucleation layer (NL) of a III-V compound semiconductor, other than GaP, followed by a buffer layer of the same compound, formed directly on the NL, optionally followed by further III-V semiconductor layers, followed by at least one layer containing III-V compound semiconductor quantum dots, optionally followed by further III-V semiconductor layers. The NL reduces the formation and propagation of defects from the interface with the silicon, and the resilience of quantum dot structures to dislocations enables lasers and other semiconductor devices of improved performance to be realized by direct epitaxy on nominally or exactly or equivalent orientation silicon.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 6, 2022
    Inventors: Mingchu TANG, Mengya LIAO, Siming CHEN, Jiang WU, Alwyn SEEDS, Huiyun LIU
  • Patent number: 11149115
    Abstract: Disclosed is a method for preparing polylactone by ring opening, belonging to the technical fields of organic catalysis and polymer materials. The invention proposes a new catalytic mechanism, wherein an organic alcohol is used as an initiator to initiate ring opening polymerization of a cyclic monomer under the catalysis of an organic catalyst to obtain a polylactone; and the catalyst is a pyridinium salt. The present invention has the advantages of non-toxic reaction, simple conditions and controllable process; further, the invention can obtain a narrow molecular weight distribution in the absence of solution polymerization, and can effectively inhibit the occurrence of the transesterification compared with the catalysis of 4-(N,N-dimethylamino)pyridine.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: October 19, 2021
    Assignee: NANJING TECH UNIVERSITY
    Inventors: Kai Guo, Hui Zhu, Zhenjiang Li, Fulan Wei, Siming Chen, Yu Gao
  • Patent number: 11015021
    Abstract: Disclosed in the present invention is a preparation method for a polyester, relating to the technical field of organic catalysis and polymeric materials. The preparation method in the present invention comprises: (1) using pyridine and saccharin in a ratio of 1:1 to prepare pyridine saccharin salt in tetrahydrofuran at 60° C. and separating the pyridine saccharin salt out in methanol and hexane. (2) Freeing out a small amount of pyridine from the pyridine saccharin salt in a heating state, catalyzing by the pyridine saccharin salt and pyridine a cyclic lactone or a carbonate to be ring-opened and polymerized to form the polyester; and the system has no other compound residues. (3) In the presence of an alcohol initiator, catalyzing by the pyridine saccharin salt the cyclic lactone to be ring-opened and polymerized to obtain the polyester. The catalytic system can efficiently synthesize a specific polylactone.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: May 25, 2021
    Assignee: NANJING TECH UNIVERSITY
    Inventors: Kai Guo, Fulan Wei, Zhenjiang Li, Hui Zhu, Siming Chen, Yu Gao
  • Publication number: 20200343069
    Abstract: A method may include obtaining a feedback or a reference value of a tube voltage applied to a radiation source of a radiation device for generating radiation rays. The method may also include determining, based on the feedback or the reference value of the tube voltage, a specific value of a focusing parameter associated with a focusing device of the radiation device. The method may further include causing the focusing device to shape a focus of the radiation rays according to the determined value of the focusing parameter. The focus of the radiation rays may satisfy an operational constraint under the specific value of the focusing parameter.
    Type: Application
    Filed: October 29, 2019
    Publication date: October 29, 2020
    Applicant: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Guoping ZHU, Jinglin WU, Tieshan ZHANG, Siming CHEN, Xu CHU
  • Publication number: 20200140608
    Abstract: Disclosed in the present invention is a preparation method for a polyester, relating to the technical field of organic catalysis and polymeric materials. The preparation method in the present invention comprises: (1) using pyridine and saccharin in a ratio of 1:1 to prepare pyridine saccharin salt in tetrahydrofuran at 60° C. and separating the pyridine saccharin salt out in methanol and hexane. (2) Freeing out a small amount of pyridine from the pyridine saccharin salt in a heating state, catalyzing by the pyridine saccharin salt and pyridine a cyclic lactone or a carbonate to be ring-opened and polymerized to form the polyester; and the system has no other compound residues. (3) In the presence of an alcohol initiator, catalyzing by the pyridine saccharin salt the cyclic lactone to be ring-opened and polymerized to obtain the polyester. The catalytic system can efficiently synthesize a specific polylactone.
    Type: Application
    Filed: April 24, 2018
    Publication date: May 7, 2020
    Inventors: Kai GUO, Fulan WEI, Zhenjiang LI, Hui ZHU, Siming CHEN, Yu GAO
  • Publication number: 20200048409
    Abstract: Disclosed is a method for preparing polylactone by ring opening, belonging to the technical fields of organic catalysis and polymer materials. The invention proposes a new catalytic mechanism, wherein an organic alcohol is used as an initiator to initiate ring opening polymerization of a cyclic monomer under the catalysis of an organic catalyst to obtain a polylactone; and the catalyst is a pyridinium salt. The present invention has the advantages of non-toxic reaction, simple conditions and controllable process; further, the invention can obtain a narrow molecular weight distribution in the absence of solution polymerization, and can effectively inhibit the occurrence of the transesterification compared with the catalysis of 4-(N,N-dimethylamino)pyridine.
    Type: Application
    Filed: April 24, 2018
    Publication date: February 13, 2020
    Inventors: Kai GUO, Hui ZHU, Zhenjiang LI, Fulan WEI, Siming CHEN, Yu GAO
  • Publication number: 20200028317
    Abstract: Disclosed herein is a semiconductor device comprising: a silicon substrate; a germanium layer; and a buffer layer comprised of at least one layer of III-V compound, formed directly on silicon; at least one layer containing III-V compound quantum dots wherein one or more facets are formed using focused ion beam etching such that the angle between the plane of the facet is normal to the plane of growth.
    Type: Application
    Filed: January 30, 2018
    Publication date: January 23, 2020
    Inventors: Siming CHEN, Mengya LIAO, Suguo HUO, Mingchu TANG, Jiang WU, Alwyn SEEDS, Huiyun LIU
  • Publication number: 20190326730
    Abstract: A semiconductor device comprising a nominally or exactly or equivalent orientation silicon substrate on which is grown directly a <100 nm thick nucleation layer (NL) of a III-V compound semiconductor, other than GaP, followed by a buffer layer of the same compound, formed directly on the NL, optionally followed by further III-V semiconductor layers, followed by at least one layer containing III-V compound semiconductor quantum dots, optionally followed by further III-V semiconductor layers. The NL reduces the formation and propagation of defects from the interface with the silicon, and the resilience of quantum dot structures to dislocations enables lasers and other semiconductor devices of improved performance to be realized by direct epitaxy on nominally or exactly or equivalent orientation silicon.
    Type: Application
    Filed: December 7, 2017
    Publication date: October 24, 2019
    Inventors: Mingchu TANG, Mengya LIAO, Siming CHEN, Jiang WU, Alwyn SEEDS, Huiyun LIU
  • Patent number: 9865771
    Abstract: A semiconductor light-emitting element includes: a lower clad layer 12 that is provided on a substrate 10; an active layer 20 that is provided on the lower clad layer 12 and includes a quantum well layer 24 and a plurality of quantum dots 28 sandwiching a second barrier layer 22b together with the quantum well layer 24; and an upper clad layer 14 that is provided on the active layer 20, wherein a distance D between the quantum well layer 24 and the plurality of quantum dots 28 is smaller than an average of distances X between centers of the plurality of quantum dots 28.
    Type: Grant
    Filed: January 7, 2015
    Date of Patent: January 9, 2018
    Assignees: QD LASER, INC., UNIVERSITY OF SHEFFIELD
    Inventors: Kenichi Nishi, Takeo Kageyama, Keizo Takemasa, Mitsuru Sugawara, Richard Hogg, Siming Chen
  • Publication number: 20160336480
    Abstract: A semiconductor light-emitting element includes: a lower clad layer 12 that is provided on a substrate 10; an active layer 20 that is provided on the lower clad layer 12 and includes a quantum well layer 24 and a plurality of quantum dots 28 sandwiching a second barrier layer 22b together with the quantum well layer 24; and an upper clad layer 14 that is provided on the active layer 20, wherein a distance D between the quantum well layer 24 and the plurality of quantum dots 28 is smaller than an average of distances X between centers of the plurality of quantum dots 28.
    Type: Application
    Filed: January 7, 2015
    Publication date: November 17, 2016
    Applicants: QD LASER, INC., UNIVERSITY OF SHEFFIELD
    Inventors: Kenichi NISHI, Takeo KAGEYAMA, Keizo TAKEMASA, Mitsuru SUGAWARA, Richard HOGG, Siming CHEN
  • Patent number: 8632827
    Abstract: Methods for preventing, ameliorating, or reducing dermatological signs of aging are provided which employ active agents, other than a retinoid, that stimulate thymosin beta-4 expression in the skin. Also provided are methods for screening for substances which stimulate thymosin beta-4 expression levels and the methods of using active agents identified by the screening protocol in the treatment of skin.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: January 21, 2014
    Assignee: Avon Products, Inc
    Inventors: Siming Chen, Qian Zheng, Satish Parimoo
  • Publication number: 20130149397
    Abstract: Methods for preventing, ameliorating, or reducing dermatological signs of aging are provided which employ active agents, other than a retinoid, that stimulate thymosin beta-4 expression in the skin. Also provided are methods for screening for substances which stimulate thymosin beta-4 expression levels and the methods of using active agents identified by the screening protocol in the treatment of skin.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 13, 2013
    Applicant: AVON PRODUCTS, INC.
    Inventors: Siming Chen, Qian Zheng, Satish Parimoo