Patents by Inventor Simon Hübner

Simon Hübner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PROCESS FOR MANUFACTURING A STARTING MATERIAL FOR A SILICON SOLAR CELL HAVING PASSIVATED CONTACTS
    Publication number: 20240339554
    Abstract: The present invention is directed to a process for manufacturing a starting material for a silicon solar cell having passivated contacts, a system for carrying out the process, and an intermediate product resulting from the process.
    Type: Application
    Filed: June 21, 2022
    Publication date: October 10, 2024
    Inventors: Benjamin MANDLMEIER, Philipp NOACK, Bianca WATTENBERG, Mirza CORDA, Peter WOHLFAHRT, Simon HÜBNER
  • SUBSTRATE CARRIER
    Publication number: 20240286235
    Abstract: The present invention relates to a substrate carrier for receiving and transporting several substrates.
    Type: Application
    Filed: April 7, 2022
    Publication date: August 29, 2024
    Inventors: Torsten DIPPELL, Simon HÜBNER, Stefan KEMPF, Emmerich Manfred NOVAK, Michael REISING, Reiner ROHRMANN
  • METHOD AND SYSTEM FOR THE PRODUCTION OF A STARTING MATERIAL FOR A SILICON SOLAR CELL WITH PASSIVATED CONTACTS
    Publication number: 20230246118
    Abstract: The present invention is directed to a method as well as to a machine for producing a starting material for a silicon solar cell with passivated contacts.
    Type: Application
    Filed: March 24, 2021
    Publication date: August 3, 2023
    Inventors: Benjamin Mandlmeier, Simon Hübner, Peter Wohlfart
  • PLASMA TREATMENT SYSTEM AND PLASMA TREATMENT METHOD
    Publication number: 20220336188
    Abstract: A treatment system (100) comprises a process chamber (101) for dynamic or static treatment of at least one substrate. An inductively coupled plasma source, ICP source (120, 120?), comprises at least one inductor (130a, 130b) extending along the longitudinal direction of the ICP source (120, 120?), a gas supply device (141, 142) for one or a plurality of process gases, and a gas directing arrangement (150) disposed in the process chamber (101), said gas directing arrangement (150) extending along the longitudinal direction of the ICP source (120, 120?) and partially surrounding the at least one inductor (130a, 130b).
    Type: Application
    Filed: August 11, 2020
    Publication date: October 20, 2022
    Inventors: Frank May, Bernhard Cord, Simon Hübner, Peter Wohlfart