Patents by Inventor Simon Hsieh

Simon Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230180131
    Abstract: A user equipment (UE) employing different radio access technologies (RATs) concurrently or successively provides the UE the opportunity to select a particular RAT to support an access service used by one or more software applications of the UE. A RAT operational control scheme provides for opportunistic enablement and disablement of a RAT and/or intra-RAT configuration so as to provide sufficient uplink and downlink throughput for supported software applications while reducing unnecessary power consumption by the UE, which often is battery powered.
    Type: Application
    Filed: June 2, 2021
    Publication date: June 8, 2023
    Inventors: Blake Kragten, Ning Zhang, Madhusudan Kinthada Venkata, Shivank Nayak, Jibing Wang, Siddharth Ray, Qin Zhang, Srinivas Vangaru, Sathish Karunakaran, Xiantao Sun, Simon Hsieh
  • Patent number: 10036960
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: July 31, 2018
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Publication number: 20180011409
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 20, 2017
    Publication date: January 11, 2018
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Patent number: 9715180
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: July 25, 2017
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Publication number: 20150070673
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 4, 2014
    Publication date: March 12, 2015
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Publication number: 20020154784
    Abstract: An earphone signal check device includes a pin inserted in an earphone hole of any electronic appliances, an electronic circuit, a signal indicating lamp lit up by the electronic circuit when it receives a signal coming through the earphone hole and the pin, and converting the signal into a type of signal to be perceived by a user, such as flickering of an indicating lamp(s) or vibration. Thus the earphone signal check device can be used as a signal indicating device, and a signal or use condition check device.
    Type: Application
    Filed: April 18, 2001
    Publication date: October 24, 2002
    Inventor: Simon Hsieh
  • Patent number: 6324086
    Abstract: A power source supplier usable in an automobile includes a body, a power supply terminal connected to a rear end of the body and able to insert in a cigarette lighter socket in an automobile. A tail base is fixed on a front side of the body, and a coupling member fixed on an end surface of t he tail base and having an intermediate hollow space for another components to couple with therein. Any other components having the size and specifications as the coupling member can be applied to couple with the couple member so that a user can choose one of them.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: November 27, 2001
    Inventor: Simon Hsieh