Patents by Inventor Simon Lloyd Thomas

Simon Lloyd Thomas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6617223
    Abstract: A method of forming an electrical isolation trench in a silicon-on-insulator (SOI) structure. The method comprises forming a first oxide layer on top of the upper silicon layer of the SOI structure, forming a polysilicon layer on top of said oxide layer, forming a second oxide layer on top of said polysilicon layer, patterning the first oxide layer, polysilicon layer, and second oxide layer to provide an etch mask, etching the upper silicon layer of the SOI structure to form said trench, and removing said second oxide layer and said polysilicon layer.
    Type: Grant
    Filed: February 21, 2002
    Date of Patent: September 9, 2003
    Assignee: Zarlink Semiconductor Limited
    Inventors: Martin Clive Wilson, Simon Lloyd Thomas
  • Publication number: 20020119638
    Abstract: A method of forming an electrical isolation trench in a silicon-on-insulator (SOI) structure. The method comprises forming a first oxide layer on top of the upper silicon layer of the SOI structure, forming a polysilicon layer on top of said oxide layer, forming a second oxide layer on top of said polysilicon layer, patterning the first oxide layer, polysilicon layer, and second oxide layer to provide an etch mask, etching the upper silicon layer of the SOI structure to form said trench, and removing said second oxide layer and said polysilicon layer.
    Type: Application
    Filed: February 21, 2002
    Publication date: August 29, 2002
    Inventors: Martin Clive Wilson, Simon Lloyd Thomas