Abstract: Disclosed herein is a power semiconductor device including a semiconductor body, a first load terminal, a second load terminal, an active region, an edge termination region, and a thin film layer that includes a bulk material and a laminar filler compound. Furthermore, a method of producing such a power semiconductor device is described herein, the method including: providing a thin film including a mixture of a bulk material component and a laminar filler compound onto a surface of at least parts of the edge termination region and/or over at least parts of the first load terminal; and curing the obtained mixture of the bulk material and laminar filler compound to generate a thin-film layer that includes a bulk material and a laminar filler compound.